Pellicles and methods of manufacturing the same
A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.
1. A method of manufacturing a pellicle, the method comprising:
forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst;
forming a protective pattern on a second surface of the substrate;
immersing the substrate in an etchant solution in a container, such that a portion of the substrate exposed through the protective pattern is removed to form a frame;
replacing the etchant solution with a first solvent including water in the same container; and
replacing the first solvent with a second solvent including alcohol to remove the protective pattern in the same container.
2. The method as claimed in claim 1 , wherein the substrate is formed of at least one of iron (Fe), nickel (Ni), cobalt (Co), copper (Cu), and silicon (Si).
3. The method as claimed in claim 1 , wherein the membrane is formed of at least one of graphite, carbon nano tube (CNT), and graphene.
4. The method as claimed in claim 1 , wherein replacing the first solvent with the second solvent is performed using a dropping pipette.
5. The method as claimed in claim 1 , wherein removing the second solvent is performed by evaporation.
6. The method as claimed in claim 1 , wherein:
the protective pattern is formed on a peripheral portion of the substrate, and
the frame supports a peripheral portion of the membrane.
7. The method as claimed in claim 1 , wherein the etchant solution has a relatively high etching rate with respect to the substrate, and has a relatively low etching rate with respect to the protective pattern and the membrane.
8. The method as claimed in claim 1 , wherein the protective pattern is formed of a photoresist material, a polymer material, or an adhesive material.