Curable composition for nanoimprinting and cured product
Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically polymerizable monomers occupy 90 percent by weight or more of the one or more polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher. The one or more monofunctional radically polymerizable monomers are preferably at least one compound selected from (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds.
1. A cured product obtained through curing of a curable composition for nanoimprinting,
wherein the curable composition for nanoimprinting comprises two or more polymerizable monomers,
the two or more polymerizable monomers include 90 percent by weight or more of two or more monofunctional radically polymerizable monomers,
the two or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher,
the two or more monofunctional radically polymerizable monomers are at least two compounds selected from the group consisting of (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds,
the two or more monofunctional radically polymerizable monomers include at least one radically polymerizable monomer intramolecularly having a cyclic structure as the monofunctional radically polymerizable monomers,
the at least one radically polymerizable monomer intramolecularly having a cyclic structure is at least one compound selected from the group consisting of compounds represented by following Formulae (1) to (3):
wherein R 41 , R 42 , and R 43 are the same as or different from one another and each represent —H or —CH 3 ,
the at least one radically polymerizable monomer intramolecularly having a cyclic structure occupies 40 percent by weight or more of the total weight of the polymerizable monomers in the curable composition,
with the proviso that the at least one radically polymerizable monomer intramolecularly having a cyclic structure includes a compound represented by Formula (1), the compound represented by Formula (1) occupies 40 percent by weight or more of the total weight of the polymerizable monomers, and at least one of the following conditions A, B, and C is met:
[A] the total weight of the compound represented by Formula (1) and the compound represented by Formula (3) occupies 90 percent by weight or more of the total weight of the polymerizable monomers;
[B] the total weight of the compound represented by Formula (1) and (meth)acrylic acid alkyl esters whose alkyl moiety has 1 to 10 carbon atoms occupies 90 percent by weight or more of the total weight of the polymerizable monomers;
[C] the total weight of the compound represented by Formula (1) and/or (3) and phenolic-hydroxyl-containing monofunctional radically polymerizable monomers and/or carboxyl-containing monofunctional radically polymerizable monomers occupies 90 percent by weight or more of the total weight of the polymerizable monomers, and the total weight of the phenolic-hydroxyl-containing monofunctional radically polymerizable monomers and the carboxyl-containing monofunctional radically polymerizable monomers occupies 10 percent by weight or more of the total weight of the polymerizable monomers.
2. The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 ,
wherein the curable composition further comprises at least one polymer being obtained through polymerization of one or more monofunctional radically polymerizable monomers and having a glass transition temperature of 25° C. or higher.
3. The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 ,
wherein the curable composition further comprises at least one radical-polymerization initiator.
4. The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 ,
wherein the at least one radically polymerizable monomer intramolecularly having a cyclic structure includes at least one compound represented by Formula (2) or (3).
5. The cured product obtained through curing of a curable composition for nanoimprinting according to claim 1 ,
wherein one or more monomers selected from the group consisting of phenolic-hydroxyl-containing monofunctional radically polymerizable monomers, carboxyl-containing monofunctional radically polymerizable monomers, and heterocyclic-group-containing monofunctional radically polymerizable monomers occupies 10 percent by weight or more of the total weight of polymerizable monomers in the curable composition.
6. A method for producing a fine structure, comprising nanoimprinting a curable composition for nanoimprinting to give a fine structure,
wherein the curable composition for nanoimprinting comprises two or more polymerizable monomers,
the two or more polymerizable monomers include 90 percent by weight or more of two or more monofunctional radically polymerizable monomers,
the two or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher,
the two or more monofunctional radically polymerizable monomers are at least two compounds selected from the group consisting of (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds,
the two or more monofunctional radically polymerizable monomers include at least one radically polymerizable monomer intramolecularly having a cyclic structure as the monofunctional radically polymerizable monomers,
the at least one radically polymerizable monomer intramolecularly having a cyclic structure is at least one compound selected from the group consisting of compounds represented by following Formulae (1) to (3):
wherein R 41 , R 42 , and R 43 are the same as or different from one another and each represent —H or —CH 3 ,
the at least one radically polymerizable monomer intramolecularly having a cyclic structure occupies 40 percent by weight or more of the total weight of the polymerizable monomers in the curable composition,
with the proviso that the at least one radically polymerizable monomer intramolecularly having a cyclic structure includes a compound represented by Formula (1), the compound represented by Formula (1) occupies 40 percent by weight or more of the total weight of the polymerizable monomers, and at least one of the following conditions A, B, and C is met:
[A] the total weight of the compound represented by Formula (1) and the compound represented by Formula (3) occupies 90 percent by weight or more of the total weight of the polymerizable monomers;
[B] the total weight of the compound represented by Formula (1) and (meth)acrylic acid alkyl esters whose alkyl moiety has 1 to 10 carbon atoms occupies 90 percent by weight or more of the total weight of the polymerizable monomers;
[C] the total weight of the compound represented by Formula (1) and/or (3) and phenolic-hydroxyl-containing monofunctional radically polymerizable monomers and/or carboxyl-containing monofunctional radically polymerizable monomers occupies 90 percent by weight or more of the total weight of the polymerizable monomers, and the total weight of the phenolic-hydroxyl-containing monofunctional radically polymerizable monomers and the carboxyl-containing monofunctional radically polymerizable monomers occupies 10 percent by weight or more of the total weight of the polymerizable monomers.
7. The method for producing a fine structure, according to claim 6 comprising
(1) forming on a substrate a film from the curable composition for nanoimprinting;
(2) stamping an imprint stamp onto the film to transfer a pattern to the film; and
(3) curing the pattern-transferred film to give a fine structure.
8. The method for producing a fine structure, according to claim 7 ,
wherein the imprint stamp used in (2) comprises at least one selected from the group consisting of a silicone, glass, and silica glass as a material.
9. The method for producing a fine structure, according to claim 7 , wherein the method comprises, as (2) and (3), stamping the imprint stamp onto the film at a pressure of 10 kPa to 100 MPa for 0.01 to 300 seconds to transfer the pattern to the film and simultaneously applying heating and/or ultraviolet irradiation to the film to cure the film, to thereby give a fine structure.
10. The method for producing a fine structure, according to claim 7 , further comprising (4) etching the cured film.
11. The method for producing a fine structure, according to claim 7 , further comprising (5) forming, on the resulting fine structure, a second structure from another material than that of the fine structure and subsequently removing the fine structure to give a three-dimensional fine structure.
12. The method for producing a fine structure, according to claim 11 , wherein the removal of the fine structure is performed by dissolving the fine structure in a solvent or alkaline developer which dissolves not the second structure but the fine structure.
13. The method for producing a fine structure according to claim 6 ,
wherein the curable composition further comprises at least one polymer being obtained through polymerization of one or more monofunctional radically polymerizable monomers and having a glass transition temperature of 25° C. or higher.
14. The method for producing a fine structure according to claim 6 ,
wherein the curable composition further comprises at least one radical-polymerization initiator.
15. The method for producing a fine structure according to claim 6 ,
wherein the at least one radically polymerizable monomer intramolecularly having a cyclic structure includes at least one compound represented by Formula (2) or (3).
16. The method for producing a fine structure according to claim 6 ,
wherein one or more monomers selected from the group consisting of phenolic-hydroxyl-containing monofunctional radically polymerizable monomers, carboxyl-containing monofunctional radically polymerizable monomers, and heterocyclic-group-containing monofunctional radically polymerizable monomers occupies 10 percent by weight or more of the total weight of polymerizable monomers in the curable composition.
17. The method for producing a fine structure according to claim 7 ,
wherein the curable composition further comprises at least one polymer being obtained through polymerization of one or more monofunctional radically polymerizable monomers and having a glass transition temperature of 25° C. or higher.
18. The method for producing a fine structure according to claim 7 ,
wherein the curable composition further comprises at least one radical-polymerization initiator.
19. A fine structure produced by the method according to claim 6 .
20. The fine structure according to claim 19 , as a material for semiconductor devices, a material for micro-electric-mechanical systems (MEMS), a flat screen, a hologram, a waveguide, a precision machinery component, a sensor, or a mold for the production of a replica mold.