Semiconductor device with variable resistive element
A semiconductor device includes a semiconductor body including a drift zone that forms a pn junction with an emitter region. A first load electrode is at a front side of the semiconductor body. A second load electrode is at a rear side of the semiconductor body opposite to the front side. One or more variable resistive elements are electrically connected in a controlled path between the drift zone and one of the first and second load electrodes. The variable resistive elements activate and deactivate electronic elements of the semiconductor device in response to a change of the operational state of the semiconductor device.
1. A semiconductor device, comprising:
a semiconductor body comprising a drift zone forming a pn junction with an emitter region;
a first load electrode at a front side of the semiconductor body;
a second load electrode at a rear side of the semiconductor body opposite to the front side; and
one or more variable resistive elements electrically connected in a controlled path between the drift zone and one of the first and second load electrodes.
2. The semiconductor device of claim 1 , wherein the variable resistive element is a varistor.
3. The semiconductor device of claim 1 , wherein the variable resistive element is a resistive switching element.
4. The semiconductor device of claim 1 , wherein the variable resistive element is configured to change from a high-ohmic state to a low-ohmic state in response to a change of a load condition of the semiconductor device.
5. The semiconductor device of claim 1 , wherein the variable resistive element is configured to change from a high-ohmic state to a low-ohmic state in case a short-circuit condition occurs in the semiconductor body.
6. The semiconductor device of claim 1 , wherein the variable resistive element is configured to change from a high-ohmic state to a low-ohmic state in case an avalanche breakdown occurs in the semiconductor body or the semiconductor device changes from a conductive state to a blocking state.
7. The semiconductor device of claim 1 , wherein the variable resistive element includes an element matrix based on silicon and oxide.
8. The semiconductor device of claim 1 , further comprising a collector structure in the semiconductor body between the drift zone and the second load electrode, wherein the collector structure comprises at least first sections of a conductivity type opposite to a conductivity type of the drift zone.
9. The semiconductor device of claim 8 , wherein the variable resistive elements are electrically connected in a controlled path electrically connected in parallel with the first sections.
10. The semiconductor device of claim 8 , wherein the collector structure includes second sections of the conductivity type of the first sections, wherein a mean dopant concentration in the second sections is at least three times as high as a mean dopant concentration in the first sections and the variable resistive elements are electrically connected in series with the second sections.
11. The semiconductor device of claim 10 , further comprising auxiliary dielectrics separating the first and second sections.
12. The semiconductor device of claim 8 , wherein the collector structure includes third sections of the conductivity type of the drift zone and the variable resistive elements are electrically connected in series with the third sections.
13. The semiconductor device of claim 8 , wherein the collector structure includes self-confining shorts configured to be fully depleted in a reverse blocking state.
14. The semiconductor device of claim 8 , wherein the emitter region comprises idle doped zones forming pn junctions with the drift zone and the variable resistive elements are electrically connected in a controlled path electrically connected in series with the pn junctions.
15. The semiconductor device of claim 14 , wherein the variable resistive elements are electrically connected between the first load electrode and the idle doped zones.
16. The semiconductor device of claim 14 , wherein the variable resistive elements are electrically connected between the idle doped zones and the drift zone.
17. The semiconductor device of claim 14 , further comprising a reset line electrically connecting the idle doped zones with a reset terminal.
18. The semiconductor device of claim 1 , wherein the emitter region includes first sections and second sections extending between the first load electrode and the drift zone, respectively, wherein a mean dopant concentration in the second sections is at least three times as high as a mean dopant concentration in the first sections and the variable resistive elements are electrically connected in series with the second sections.
19. The semiconductor device of claim 18 , further comprising auxiliary dielectrics separating the first and second sections.
20. An insulated gate bipolar transistor, comprising:
a semiconductor body comprising a drift zone forming a pn junction with an emitter region;
a first load electrode at a front side of the semiconductor body;
a second load electrode at a rear side of the semiconductor body opposite to the front side; and
one or more variable resistive elements electrically connected in a controlled path between the drift zone and one of the first and second load electrodes.