IP Library Granted Patent US 9,698,072
Granted Patent B2
US 9,698,072 · App. 14/925,159 · Granted Jul 4, 2017

Low-stress dual underfill packaging

Inventors: Peter J. Brofman (Hopewell Junction, NY); Marie-Claude Paquet (Bromont, CA); Julien Sylvestre (Chambly, CA)
Assignee: International Business Machines Corporation
H01L23/3142H01L21/563H01L23/49838H01L24/17H01L24/27H01L24/83H01L25/0657H01L24/13H01L24/16H01L24/29H01L24/73H01L24/81H01L24/92H01L2224/0401H01L2224/131H01L2224/14131H01L2224/16145H01L2224/16148H01L2224/16225H01L2224/16227H01L2224/1703H01L2224/17181H01L2224/2732H01L2224/2755H01L2224/2919H01L2224/29036H01L2224/3201H01L2224/32145H01L2224/32225H01L2224/73104H01L2224/73204H01L2224/81191H01L2224/81203H01L2224/81801H01L2224/81815H01L2224/83102H01L2224/83191H01L2224/83947H01L2224/83951H01L2224/83986H01L2224/92125H01L2225/06513H01L2225/06517H01L2924/1431H01L2924/1434H01L2924/152H01L2924/15311H01L2924/182H01L2924/183H01L2924/351
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Quick Facts
Patent No.
US 9,698,072
App. No.
14/925,159
Granted
Jul 4, 2017
Kind
B2
Abstract

The present invention relates generally to flip chip technology and more particularly, to a method and structure for reducing internal packaging stresses, improving adhesion properties, and reducing thermal resistance in flip chip packages by using more than one underfill material deposited in different regions of the flip chip interface. According to one embodiment, a method of forming a first underfill in an interior region of an interface such that a periphery region of the interface remains open, and forming a second underfill in the periphery region is disclosed.

Claims (15)

1. A flip-chip structure comprising:

a substrate;

an interposer disposed above the substrate;

a first die disposed above the interposer;

a second die disposed above the first die;

and a third die disposed above the second die; wherein a first interface is formed between the substrate and the interposer, a second interface is formed between the interposer and the first die, and a third interface is formed between the second die and the third die;

wherein the first interface comprises an interior region and a periphery region, the periphery region extending from a perimeter of the interposer to an outermost solder connection between the substrate and the interposer;

a plurality of solder connections in the first interface;

a plurality of gaps between the plurality of solder connections;

a first underfill material occupying the plurality of gaps located in the interior region of the first interface, the first underfill material in direct contact with the substrate, and the interposer, and at least one of the plurality of solder connections; and

a second underfill material occupying the periphery region of the first interface, the second underfill material in direct contact with the first underfill, the substrate, the interposer, and wherein the second underfill material terminates at the outermost solder connection.

2. The structure of claim 1 , wherein the second underfill material extends beyond the perimeter of the interposer as a fillet, the fillet extending from the substrate to a side of the interposer above the interface.

3. The structure of claim 1 , wherein the first underfill material is comprised of an underfill material chosen for its ability to withstand higher thermal requirements than the second underfill material.

4. The structure of claim 1 , wherein the second underfill material is comprised of an underfill material chosen for its ability to withstand higher mechanical stresses than the first underfill material.

5. The structure of claim 1 , wherein the periphery region of the interface has a width ranging from approximately 1 mm to approximately 2 mm.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 28, 2015
From: BROFMAN, PETER J.; PAQUET, MARIE-CLAUDE; SYLVESTRE, JULIEN
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 036902/0922 →
Continuity (2)
Division 14197280 · Mar 5, 2014
Related Publication 20160049345A1 · Feb 18, 2016