IP Library › Granted Patent US 9,705,002
Granted Patent B2
US 9,705,002 · App. 14/610,383 · Granted Jul 11, 2017

Semiconductor device, module, and electronic device

Inventors: Shunpei Yamazaki (Tokyo, JP); Kenichi Okazaki (Tochigi, JP); Masataka Nakada (Tochigi, JP); Masahiro Katayama (Tochigi, JP)
Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
H01L29/7869H01L27/1225H01L27/1255H01L29/78648
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Quick Facts
Patent No.
US 9,705,002
App. No.
14/610,383
Granted
Jul 11, 2017
Kind
B2
Abstract

To provide a semiconductor device with small parasitic capacitance. Alternatively, to provide a semiconductor device with low power consumption. The semiconductor device includes a transistor and a capacitor. The transistor includes a first conductor, a first insulator over the first conductor, a semiconductor including a region overlapping with the first conductor with the first insulator interposed therebetween, a second insulator over the semiconductor, a second conductor including a region overlapping with the semiconductor with the second insulator interposed therebetween, and a third conductor and a fourth conductor including a region in contact with a top surface of the semiconductor. The capacitor includes a layer formed from the same layer as the first conductor and a layer formed from the same layer as the third conductor and the fourth conductor.

Claims (92)

1. A semiconductor device comprising:

a first conductor and a second conductor;

a first insulator in contact with a top surface of the first conductor and a top surface of the second conductor;

a second insulator over the first insulator;

an oxide semiconductor overlapping with the first conductor with the first insulator and the second insulator interposed therebetween;

a third insulator over the oxide semiconductor;

a third conductor overlapping with the oxide semiconductor with the third insulator interposed therebetween;

a fourth insulator over and in direct contact with the third conductor, a side surface of the third insulator, the oxide semiconductor, and the first insulator;

a fifth insulator over the fourth insulator;

a fourth conductor in contact with the oxide semiconductor;

a fifth conductor in contact with the oxide semiconductor; and

a sixth conductor overlapping with the second conductor with the first insulator and the fourth insulator interposed therebetween,

wherein the second insulator includes an opening overlapping with the second conductor, and

wherein the fourth insulator is in direct contact with the first insulator through the opening of the second insulator.

2. The semiconductor device according to claim 1 ,

wherein the oxide semiconductor includes a first region in contact with the third insulator, and a second region and a third region that are in contact with the fourth insulator,

wherein the second region and the third region each include a region with lower resistance than that of the first region,

wherein the fourth conductor is in contact with the oxide semiconductor in the second region, and

wherein the fifth conductor is in contact with the oxide semiconductor in the third region.

3. The semiconductor device according to claim 1 ,

wherein the oxide semiconductor includes a first oxide semiconductor and a second oxide semiconductor,

wherein the second oxide semiconductor is over and in contact with the first oxide semiconductor, and

wherein in a region where the fourth conductor overlaps with the oxide semiconductor, the first oxide semiconductor has higher conductivity than the second oxide semiconductor.

4. The semiconductor device according to claim 1 ,

wherein the oxide semiconductor includes a first oxide semiconductor and a second oxide semiconductor,

wherein the second oxide semiconductor is over and in contact with the first oxide semiconductor, and

wherein in a region where the fourth conductor overlaps with the oxide semiconductor, the second oxide semiconductor has higher conductivity than the first oxide semiconductor.

5. The semiconductor device according to claim 1 ,

wherein the oxide semiconductor includes a first oxide semiconductor, a second oxide semiconductor, and a third oxide semiconductor,

wherein the second oxide semiconductor is over and in contact with the first oxide semiconductor,

wherein the third oxide semiconductor is over and in contact with the second oxide semiconductor, and

wherein in a region where the fourth conductor overlaps with the oxide semiconductor, the second oxide semiconductor has higher conductivity than the first oxide semiconductor and the third oxide semiconductor.

6. The semiconductor device according to claim 1 ,

wherein an end portion of the third insulator extends beyond an end portion of the third conductor.

7. The semiconductor device according to claim 6 ,

wherein the end portion of the third insulator includes a region whose cross-sectional shape is a circular arc.

8. The semiconductor device according to claim 1 ,

wherein the third conductor includes a first conductive layer and a second conductive layer,

wherein the second conductive layer is over and in contact with the first conductive layer, and

wherein an end portion of the first conductive layer extends beyond an end portion of the second conductive layer.

9. The semiconductor device according to claim 1 ,

wherein the oxide semiconductor contains indium and zinc.

10. A module comprising the semiconductor device according to claim 1 and a printed board.

11. An electronic device comprising:

the module according to claim 10 ; and

at least one of a speaker, an operation key, and a battery.

12. A semiconductor device comprising:

a first conductor and a second conductor;

a first insulator in contact with a top surface of the first conductor and a top surface of the second conductor;

a second insulator over the first insulator;

an oxide semiconductor overlapping with the first conductor with the first insulator interposed therebetween;

a third insulator over the oxide semiconductor;

a third conductor overlapping with the oxide semiconductor with the third insulator interposed therebetween;

a fourth insulator over and in direct contact with the third conductor, a side surface of the third insulator, the oxide semiconductor, and the first insulator;

a fourth conductor in contact with the oxide semiconductor;

a fifth conductor in contact with the oxide semiconductor; and

a sixth conductor overlapping with the second conductor with the first insulator and the fourth insulator interposed therebetween,

wherein a material of the sixth conductor is the same as a material of the fourth conductor,

wherein the second insulator includes an opening overlapping with the second conductor, and

wherein the fourth insulator is in direct contact with the first insulator through the opening of the second insulator.

13. The semiconductor device according to claim 12 ,

wherein the oxide semiconductor includes a first region in contact with the third insulator, and a second region and a third region that are in contact with the fourth insulator,

wherein the second region and the third region each include a region with lower resistance than that of the first region,

wherein the fourth conductor is in contact with the oxide semiconductor in the second region, and

wherein the fifth conductor is in contact with the oxide semiconductor in the third region.

14. The semiconductor device according to claim 12 ,

wherein the oxide semiconductor includes a first oxide semiconductor and a second oxide semiconductor,

wherein the second oxide semiconductor is over and in contact with the first oxide semiconductor, and

wherein in a region where the fourth conductor overlaps with the oxide semiconductor, the first oxide semiconductor has higher conductivity than the second oxide semiconductor.

15. The semiconductor device according to claim 12 ,

wherein the oxide semiconductor includes a first oxide semiconductor and a second oxide semiconductor,

wherein the second oxide semiconductor is over and in contact with the first oxide semiconductor, and

wherein in a region where the fourth conductor overlaps with the oxide semiconductor, the second oxide semiconductor has higher conductivity than the first oxide semiconductor.

16. The semiconductor device according to claim 12 ,

wherein the oxide semiconductor includes a first oxide semiconductor, a second oxide semiconductor, and a third oxide semiconductor,

wherein the second oxide semiconductor is over and in contact with the first oxide semiconductor,

wherein the third oxide semiconductor is over and in contact with the second oxide semiconductor, and

wherein in a region where the fourth conductor overlaps with the oxide semiconductor, the second oxide semiconductor has higher conductivity than the first oxide semiconductor and the third oxide semiconductor.

17. The semiconductor device according to claim 12 ,

wherein an end portion of the third insulator extends beyond an end portion of the third conductor.

18. The semiconductor device according to claim 17 ,

wherein the end portion of the third insulator includes a region whose cross-sectional shape is a circular arc.

19. The semiconductor device according to claim 12 ,

wherein the third conductor includes a first conductive layer and a second conductive layer,

wherein the second conductive layer is over and in contact with the first conductive layer, and

wherein an end portion of the first conductive layer extends beyond an end portion of the second conductive layer.

20. The semiconductor device according to claim 12 ,

wherein the oxide semiconductor contains indium and zinc.

21. A module comprising the semiconductor device according to claim 12 and a printed board.

22. An electronic device comprising:

the module according to claim 21 ; and

at least one of a speaker, an operation key, and a battery.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 30, 2015
From: YAMAZAKI, SHUNPEI; OKAZAKI, KENICHI; NAKADA, MASATAKA; KATAYAMA, MASAHIRO
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 034857/0203 →
Priority Claims (2)
JP 2014-020542 · Feb 5, 2014 · national
JP 2014-050588 · Mar 13, 2014 · national
Continuity (1)
Related Publication 20150221775A1 · Aug 6, 2015