Resistive random access memory device with a solid electrolyte including a region made of a first metal oxide and doped by a second element distinct from the first metal

1. A Resistive random access memory device comprising:

a first electrode made of inert material;

a second electrode made of soluble material, and

a solid electrolyte, the first and second electrodes being respectively in contact with one of the faces of the solid electrolyte on either side of the solid electrolyte, the second electrode being configured to supply mobile ions circulating in the solid electrolyte to the first electrode to form a conductive filament between the first and second electrodes when a voltage is applied between the first and second electrodes,

wherein the solid electrolyte comprises a region made of an oxide of a first metal element that forms a first metal oxide, and wherein the region is doped by a second element, distinct from the first metal and able to form a second oxide, the second element being selected such that a band gap energy of the second oxide is strictly greater than the band gap energy of the first metal oxide, an atomic percentage of the second element within the region of the solid electrolyte being comprised between 5% and 20%, and

wherein the second element is selected such that an electrical permittivity of the material of the doped region is less than or equal to the electrical permittivity of the first metal oxide.

2. The device according to claim 1 , wherein the second element is a metal distinct from the first metal and able to form a second metal oxide.

3. The device according to claim 1 , wherein the atomic percentage of the second element within the region of the solid electrolyte is substantially equal to 10%.

4. The device according to claim 1 , wherein the first metal oxide is gadolinium oxide and wherein the second element is aluminium.

5. The device according to claim 1 , wherein the solid electrolyte comprises:

a first sub-layer in contact with the first electrode made of inert material, and

a second sub-layer in contact with the second electrode made of soluble material;

the region of the solid electrolyte made of the first metal oxide doped by the second element being a central sub-layer comprised between the first and second sub-layers.

6. The device according to claim 1 , wherein the solid electrolyte comprises:

a first sub-layer in contact with the first electrode made of inert material;

a second sub-layer in contact with the second electrode made of soluble material, and

a central sub-layer comprised between the first and second sub-layers,

the region of the solid electrolyte made of first metal oxide doped by the second element being the first sub-layer and/or the second sub-layer.

7. The device according to claim 1 , wherein the solid electrolyte is entirely formed by the region made of the first metal oxide doped by the second element.

8. A Resistive random access memory device comprising:

a first electrode made of inert material;

a second electrode made of soluble material, and

a solid electrolyte, the first and second electrodes being respectively in contact with one of the faces of the solid electrolyte on either side of the solid electrolyte, the second electrode being configured to supply mobile ions circulating in the solid electrolyte to the first electrode to form a conductive filament between the first and second electrodes when a voltage is applied between the first and second electrodes,

wherein the solid electrolyte comprises a region made of an oxide of a first metal element that forms a first metal oxide, and wherein the region is doped by a second element, distinct from the first metal and able to form a second oxide, the second element being selected such that a band gap energy of the second oxide is strictly greater than the band gap energy of the first metal oxide, an atomic percentage of the second element within the region of the solid electrolyte being comprised between 5% and 20%, and

wherein the second element is selected such that an electrical permittivity of the second oxide is strictly less than the electrical permittivity of the first metal oxide.

9. A Resistive random access memory device comprising:

a first electrode made of inert material;

a second electrode made of soluble material, and

a solid electrolyte, the first and second electrodes being respectively in contact with one of the faces of the solid electrolyte on either side of the solid electrolyte, the second electrode being configured to supply mobile ions circulating in the solid electrolyte to the first electrode to form a conductive filament between the first and second electrodes when a voltage is applied between the first and second electrodes,

wherein the solid electrolyte comprises a region made of an oxide of a first metal element that forms a first metal oxide, and wherein the region is doped by a second element, distinct from the first metal and able to form a second oxide, the second element being selected such that a band gap energy of the second oxide is strictly greater than the band gap energy of the first metal oxide, an atomic percentage of the second element within the region of the solid electrolyte being comprised between 5% and 20%, and

wherein the second element is selected such that the first metal oxide doped by the second element has a band gap energy substantially equal to the band gap energy of the first metal oxide not doped by the second element.

10. A Resistive random access memory device comprising:

a first electrode made of inert material;

a second electrode made of soluble material, and

a solid electrolyte, the first and second electrodes being respectively in contact with one of the faces of the solid electrolyte on either side of the solid electrolyte, the second electrode being configured to supply mobile ions circulating in the solid electrolyte to the first electrode to form a conductive filament between the first and second electrodes when a voltage is applied between the first and second electrodes,

wherein the solid electrolyte comprises a region made of an oxide of a first metal element that forms a first metal oxide, and wherein the region is doped by a second element, distinct from the first metal and able to form a second oxide, the second element being selected such that a band gap energy of the second oxide is strictly greater than the band gap energy of the first metal oxide, an atomic percentage of the second element within the region of the solid electrolyte being comprised between 5% and 20%, and

wherein the second element is selected such that a length of a bond between the second element and oxygen is less than the length of the bond between the first metal element and oxygen.