Organic light-emitting display apparatus and manufacturing method thereof

1. An organic light-emitting display apparatus, comprising:

a substrate;

a thin film transistor on the substrate;

a pixel electrode electrically connected to the thin film transistor;

a pixel defining layer having an opening exposing a center portion of the pixel electrode and covering an edge of the pixel electrode; and

a first low reflection layer between the pixel electrode and the pixel defining layer, the first low reflection layer including a metal, wherein

reflectivity of the first low reflection layer is equal to or less than 60%.

2. The apparatus as claimed in claim 1 , wherein the first low reflection layer is on the edge of the pixel electrode covered by the pixel defining layer.

3. The apparatus as claimed in claim 1 , wherein the first low reflection layer is on the pixel electrode except an opening of the pixel defining layer.

4. The apparatus as claimed in claim 3 , wherein the first low reflection layer includes a first etching surface covered by the pixel defining layer and a second etching surface exposed by the pixel defining layer.

5. The apparatus as claimed in claim 4 , wherein the first etching surface has a same etching surface as the pixel electrode.

6. The apparatus as claimed in claim 4 , wherein the second etching surface has a same etching surface as the pixel defining layer that exposes the center portion of the pixel electrode.

7. The apparatus as claimed in claim 1 , wherein the thin film transistor includes a semiconductor layer, a gate electrode, a source electrode, and a drain electrode, and the apparatus further comprises a second low reflection layer that is on the source electrode and the drain electrode and includes a metal.

8. The apparatus as claimed in claim 7 , further comprising an insulating film between the thin film transistor and the pixel electrode, the pixel electrode on the insulating film, wherein, the insulating film is between the pixel electrode and the source electrode and the drain electrode,

wherein the second low reflection layer is between the insulating film and the source electrode and the drain electrode.

9. The apparatus as claimed in claim 7 , wherein the second low reflection layer directly contacts the source electrode and the drain electrode.

10. The apparatus as claimed in claim 7 , wherein the second low reflection layer, the source electrode, and the drain electrode have a same etching surface.

11. An organic light-emitting display apparatus,

comprising:

a substrate;

a thin film transistor on the substrate;

a pixel electrode electrically connected to the thin film transistor;

a pixel defining layer having an opening exposing a center portion of the pixel electrode and covering an edge of the pixel electrode; and

a first low reflection layer between the pixel electrode and the pixel defining layer, the first low reflection layer including a metal, wherein the first low reflection layer includes one of TiN, Cr/CrO x , TaO x , MoO x , black resin, or a polarization material.

12. A method of manufacturing an organic light-emitting display apparatus, the method comprising:

forming a thin film transistor on a substrate;

forming a pixel electrode and a first low reflection layer by coating a conductive layer on the substrate to be electrically connected to the thin film transistor, coating a first low reflection layer including a metal material on the conductive layer, and simultaneously pattering the conductive layer and the first low reflection layer;

forming a pixel defining layer having an opening that exposes a center portion of the first low reflection layer and covers an edge of the first low reflection layer; and

etching the center portion of the first low reflection layer that is exposed by the opening of the pixel defining layer, wherein

reflectivity of the first low reflection layer is equal to or less than 60%.

13. The method as claimed in claim 12 , wherein, in etching the center portion of the first low reflection layer, the pixel electrode is exposed through the opening of the pixel defining layer as the first low reflection layer is etched.

14. The method as claimed in claim 12 , wherein the first low reflection layer is formed to have a first etching surface covered by the pixel defining layer and a second etching surface exposed by the pixel defining layer, and

forming the first low reflection layer is performed simultaneously with forming the pixel electrode and forming the second etching surface is performed simultaneously with etching the center portion of the first low reflection layer.

15. The method as claimed in claim 12 , wherein forming the thin film transistor includes:

forming a semiconductor layer;

forming a gate electrode; and

forming a source electrode and a drain electrode on which a second low reflection layer is formed.

16. The method as claimed in claim 15 , wherein forming the source electrode and the drain electrode includes:

forming a conductive layer to be electrically connected to the semiconductor layer;

forming the second low reflection layer including a metal material on the conductive layer; and

simultaneously pattering the conductive layer and the second low reflection layer.

17. The method as claimed in claim 16 , wherein the source electrode, the drain electrode, and the second low reflection layer have a same etching surface.

18. A method of manufacturing an organic light-emitting display apparatus, the method comprising:

forming a thin film transistor on a substrate;

forming an insulating film on the thin film transistor to cover the thin film transistor;

forming a pixel electrode and a first low reflection layer by coating a conductive layer on the insulating film to be electrically connected to the thin film transistor, coating a first low reflection layer including a metal material on the conductive layer, and simultaneously pattering the conductive layer and the first low reflection layer;

forming a pixel defining layer having an opening that exposes a center portion of the first low reflection layer and covers an edge of the first low reflection layer; and

etching the center portion of the first low reflection layer that is exposed by the opening of the pixel defining layer, wherein the first low reflection layer and the second low reflection layer each includes one of TiN, Cr/CrO x , TaO x , MoO x , black resin, or a polarization material.