Gas sensor and method of manufacturing the same
A gas sensor includes: a channel layer in which a F-terminated GNR, a H-terminated GNR, and a F-terminated GNR whose edge portions are terminated with different modifying groups are bonded to each other; a source electrode formed on one end of the channel layer; and a drain electrode formed on the other end of the channel layer, in which a surface of the H-terminated GNR is exposed, and this exposed portion is a gas sensing part.
1. A gas sensor comprising:
a channel layer formed of a plurality of graphene bonded to each other, among which adjacent graphene have edge portions terminated with modifying groups different from each other; and
a pair of electrodes formed on both ends of the channel layer, wherein
in the channel layer, a part of a surface thereof is exposed, and the exposed portion is a gas sensing part.
2. The gas sensor according to claim 1 , wherein the adjacent graphene have different Fermi levels in a state before being bonded to each other.
3. The gas sensor according to claim 1 , wherein the modifying groups are two kinds or three kinds or more selected from H, F, Cl, OH, NH 2 , and CH 3 .
4. The gas sensor according to claim 1 , wherein, in two kinds of the graphene bonded to each other, one is n-doped and the other is p-doped.
5. The gas sensor according to claim 1 , wherein the channel layer constitutes a pnp structure or an npn structure by the graphene being bonded to each other.
6. The gas sensor according to claim 1 , wherein the channel layer constitutes a p + n − (or i)n + structure or an n + p − (or i)p + structure by the graphene being bonded to each other.
7. The gas sensor according to claim 1 , wherein the channel layer has a 10 nm width or less in a short-side direction thereof.
8. The gas sensor according to claim 1 , comprising a back gate structure under the channel layer.
9. The gas sensor according to claim 1 , comprising a heater layer below the channel layer.
10. A method of manufacturing a gas sensor comprising:
forming a piece of graphene whose edge portion is terminated with one modifying group;
forming at least part of the piece of graphene into another piece of graphene whose edge portion is terminated with another modifying group different from the one modifying group to form a channel layer in which the piece of graphene and the other piece of graphene are bonded to each other; and
forming a pair of electrodes on both ends of the channel layer, wherein
a part of a surface of the channel layer is exposed, and the exposed portion is a gas sensing part.
11. The method of manufacturing the gas sensor according to claim 10 , wherein the other piece of graphene is two kinds or three kinds or more of graphene whose edge portions are terminated with modifying groups different from each other.
12. The method of manufacturing the gas sensor according to claim 10 , wherein the piece of graphene and the other piece of graphene have different Fermi levels in a state before being bonded to each other.
13. The method of manufacturing the gas sensor according to claim 10 , wherein the modifying groups are two kinds or three kinds or more selected from H, F, Cl, OH, NH 2 , and CH 3 .
14. The method of manufacturing the gas sensor according to claim 10 , wherein the channel layer has a 10 nm width or less in a short-side direction thereof.
15. The method of manufacturing the gas sensor according to claim 10 , wherein in the piece of graphene and the other piece of graphene bonded to each other, one is n-doped and the other is p-doped.
16. The method of manufacturing the gas sensor according to claim 10 , wherein the channel layer constitutes a pnp structure or an npn structure by the piece of graphene and the other piece of graphene being bonded to each other.
17. The method of manufacturing the gas sensor according to claim 10 , wherein the channel layer constitutes a p + n − (or i)n + structure or an n + p − (or i)p + structure by the piece of graphene and the other piece of graphene being bonded to each other.