Semiconductor device
A semiconductor device includes a substrate, an active layer, a transistor, and a capacitor. The active layer is disposed on the substrate, and the active layer is divided into a first portion and a second portion. The transistor and the capacitor are disposed on the substrate. The transistor includes the second portion, a source electrode, a drain electrode, and a gate electrode. The source electrode and the drain electrode are respectively and electrically connected to the second portion. The gate electrode is disposed on the second portion. The capacitor includes the first portion, a first electrode, a first insulating layer, and a second electrode. The first electrode is electrically connected to the first portion and the source electrode. The first insulating layer is disposed on the first portion. The second electrode is disposed on the first insulating layer and is electrically connected to the gate electrode.
1. A semiconductor device comprising:
a substrate;
an active layer disposed on the substrate, the active layer is divided into a first portion and a second portion;
a transistor disposed on the substrate, comprising:
the second portion of the active layer;
a source electrode and a drain electrode respectively and electrically connected to the second portion; and
a gate electrode disposed on the second portion and disposed between the source electrode and the drain electrode; and
a capacitor disposed on the substrate, comprising:
the first portion of the active layer;
a first electrode electrically connected to the first portion and the source electrode of the transistor;
a first insulating layer disposed on the first portion; and
a second electrode disposed on the first insulating layer and electrically connected to the gate electrode of the transistor;
wherein the first electrode, the source electrode, and the drain electrode are made of substantially the same material, and the second electrode and the gate electrode are made of substantially the same material.
2. The semiconductor device of claim 1 , wherein the first insulating layer is made of aluminum oxide.
3. The semiconductor device of claim 1 , wherein the transistor further comprises:
a second insulating layer disposed between the gate electrode and the second portion of the active layer.
4. The semiconductor device of claim 3 , wherein the first insulating layer and the second insulating layer are made of substantially the same material.
5. The semiconductor device of claim 1 , further comprising:
an isolation portion disposed in the active layer and between the first portion and the second portion.
6. The semiconductor device of claim 1 , wherein the active layer is further divided into a third portion, and the semiconductor device further comprises:
a resistor disposed on the substrate and electrically connected to the capacitor, and the resistor comprising:
the third portion of the active layer;
a third electrode electrically connected to the third portion; and
a fourth electrode electrically connected to the third portion.
7. The semiconductor device of claim 6 , wherein the third electrode is connected to the second electrode of the capacitor.
8. The semiconductor device of claim 6 , wherein the first electrode, the third electrode, and the fourth electrode are made of substantially the same material.