Plasma processing apparatus
A plasma processing apparatus for exciting a processing gas by a microwave, includes a focus ring extending in an annular shape, a first tubular member being wrapped around a central axis to extend along an outer periphery of the lower electrode below the focus ring, an annular member made of a dielectric material provided between the focus ring and the first tubular member a second tubular member extending along an outer periphery of the first tubular member and a choke portion suppressing a microwave propagating through the first tubular member via the focus ring and the annular member. And the choke portion protrudes outward in a diametrical direction of the first tubular from the outer periphery of the first tubular member and extends in an annular shape along the periphery of the first tubular member, the choke portion is covered by the second tubular member.
1. A plasma processing apparatus for exciting a processing gas by a microwave, comprising:
a processing chamber;
a mounting table provided in the processing chamber, the mounting table including a lower electrode and an electrostatic chuck provided on the lower electrode;
a focus ring made of a dielectric material, extending in an annular shape so as to surround the electrostatic chuck;
a first tubular member made of a dielectric material, the first tubular member being wrapped around a central axis to extend along an outer periphery of the lower electrode below the focus ring;
an annular member made of a dielectric material, provided between the focus ring and the first tubular member;
a conductive second tubular member extending along an outer periphery of the first tubular member; and
a choke portion made of a dielectric material, serving to suppress a microwave propagating through the first tubular member via the focus ring and the annular member,
wherein the first tubular member and the choke portion are formed as one unit,
wherein the choke portion protrudes outward in a diametrical direction of the first tubular member from the outer periphery of the first tubular member and extends in an annular shape,
wherein the second tubular member includes an upper portion and a lower portion which are separable from each other, and
wherein the choke portion is interposed between the upper portion and the lower portion so as to be covered by the second tubular member.
2. The plasma processing apparatus of claim 1 , wherein a length of the choke portion in the diametrical direction is ¼ of a wavelength of the microwave in the choke portion.
3. The plasma processing apparatus of claim 1 , wherein the upper and the lower portion are fixed to each other at a diametrically outer side of the choke portion.
4. The plasma processing apparatus of claim 1 , further comprising:
one or more other choke portions made of a dielectric material, said one or more other choke portions serving to suppress the microwave propagating through the first tubular member via the focus ring and the annular member, protruding outward in the diametrical direction from the periphery of the first tubular member, and extending in an annular shape,
wherein the choke portion and said one or more other choke portions are protruded from respective parts of the periphery of the first tubular member, the respect parts arranged along an extension direction of the central axis.
5. The plasma processing apparatus of claim 4 , wherein the choke portion and said one or more other choke portions have different lengths in the diametrical direction respectively.