Contacting of electrochromic devices

1. A method for producing an electrochromic device, comprising the steps of:

providing a layered structure, having a first substrate sheet, a second substrate sheet, a first electron conducting layer at least partially covering said first substrate sheet, a second electron conducting layer at least partially covering said second substrate sheet, an electrochromic layer at least partially covering said first electron conducting layer, a counter electrode layer at least partially covering said second electron conducting layer, and an electrolyte layer laminated between and at least partially covering said first electrochromic layer and said counter electrode layer;

said layered structure having at least one of:

a first area in said layered structure in which said electrochromic layer is not covered by said electrolyte layer; and

a second area in said layered structure in which said counter electrode layer is not covered by said electrolyte layer; and

at least one of:

soldering, by ultra sound soldering, a first electrode, provided on top of said electrochromic layer in said first area, to said first electron conducting layer through said electrochromic layer; and

soldering, by ultra sound soldering, a second electrode, provided on top of said counter electrode layer in said second area, to said second electron conducting layer through said counter electrode layer.

2. The method according to claim 1 , wherein said soldering comprises soldering, by ultra sound soldering, of the first electrode, provided on top of said electrochromic layer in said first area, to said first electron conducting layer through said electrochromic layer and soldering, by ultra sound soldering, of the second electrode, provided on top of said counter electrode layer in said second area, to said second electron conducting layer in said second area through said counter electrode layer.

3. The method according to claim 2 , wherein said step of providing a layered structure, comprises:

providing of a layered structure without said first area and said second area; and at least one of:

removing a part of said second substrate sheet, said second electron conducting layer, said counter electrode layer and said electrolyte, thereby uncovering said first area; and

removing a part of said first substrate sheet, said first electron conducting layer, said electrochromic layer and said electrolyte, thereby uncovering said second area.

4. The method according to claim 1 , wherein said soldering is performed using a solder comprising In.

5. The method according to claim 4 , wherein said solder comprises In in an amount exceeding 10% by weight.

6. The method according to claim 5 , wherein said step of providing a layered structure, comprises:

providing of a layered structure without said first area and said second area; and at least one of:

removing a part of said second substrate sheet, said second electron conducting layer, said counter electrode layer and said electrolyte, thereby uncovering said first area; and

removing a part of said first substrate sheet, said first electron conducting layer, said electrochromic layer and said electrolyte, thereby uncovering said second area.

7. The method according to claim 4 , wherein said step of providing a layered structure, comprises:

providing of a layered structure without said first area and said second area; and at least one of:

removing a part of said second substrate sheet, said second electron conducting layer, said counter electrode layer and said electrolyte, thereby uncovering said first area; and

removing a part of said first substrate sheet, said first electron conducting layer, said electrochromic layer and said electrolyte, thereby uncovering said second area.

8. The method according to claim 1 , wherein at least one of said electrodes comprises a conducting tape.

9. The method according to claim 8 , wherein said step of providing a layered structure, comprises:

providing of a layered structure without said first area and said second area; and at least one of:

removing a part of said second substrate sheet, said second electron conducting layer, said counter electrode layer and said electrolyte, thereby uncovering said first area; and

removing a part of said first substrate sheet, said first electron conducting layer, said electrochromic layer and said electrolyte, thereby uncovering said second area.

10. The method according to claim 1 , wherein said step of providing a layered structure, comprises:

providing of a layered structure without said first area and said second area; and at least one of:

removing a part of said second substrate sheet, said second electron conducting layer, said counter electrode layer and said electrolyte, thereby uncovering said first area; and

removing a part of said first substrate sheet, said first electron conducting layer, said electrochromic layer and said electrolyte, thereby uncovering said second area.

11. An electrochromic device, comprising:

a layered structure, having:

a first substrate sheet;

a second substrate sheet;

a first electron conducting layer at least partially covering said first substrate sheet;

a second electron conducting layer at least partially covering said second substrate sheet;

an electrochromic layer at least partially covering said first electron conducting layer;

a counter electrode layer at least partially covering said second electron conducting layer; and

an electrolyte layer laminated between and at least partially covering said electrochromic layer and said counter electrode layer;

said layered structure having at least one of:

a first area in said layered structure in which said electrochromic layer is not covered by said electrolyte layer; and

a second in said layered structure area in which said counter electrode layer is not covered by said electrolyte layer; and

wherein at least one of:

a first electrode is provided on top of said electrochromic layer in said first area and is soldered to said first electron conducting layer through said electrochromic layer; and

a second electrode is provided on top of said counter electrode layer in said second area and is soldered to said second electron conducting layer through said counter electrode layer.

12. The electrochromic device according to claim 11 , wherein the first electrode is provided on top of said electrochromic layer in said first area and is soldered to said first electron conducting layer through said electrochromic layer, and the second electrode is provided on top of said counter electrode layer in said second area and is soldered to said second electron conducting layer through said counter electrode layer.

13. The electrochromic device according to claim 12 , wherein at least one of said first and second electrodes is soldered by a solder comprising In.

14. The electrochromic device according to claim 13 , wherein said solder comprises In in an amount exceeding 10% by weight.

15. The electrochromic device according to claim 12 , wherein at least one of said first electrode and said second electrode comprises a conducting tape.

16. The electrochromic device according to claim 11 , wherein at least one of said first and second electrodes is soldered by a solder comprising In.

17. The electrochromic device according to claim 16 , wherein said solder comprises In in an amount exceeding 10% by weight.

18. The electrochromic device according to claim 17 , wherein at least one of said first electrode and said second electrode comprises a conducting tape.

19. The electrochromic device according to claim 16 , wherein at least one of said first electrode and said second electrode comprises a conducting tape.

20. The electrochromic device according to claim 11 , wherein at least one of said first electrode and said second electrode comprises a conducting tape.