Elastic wave device

1. An elastic wave device, comprising:

a quartz crystal substrate cut out from a quartz crystal body having three-dimensional crystallite orientation comprised of an X-axis, a Y-axis, and a Z-axis, with both the Y-axis and the Z-axis rotated around the X-axis, the quartz crystal substrate being cut at rotation angles specified by right-handed Euler-angles (φ,θ,Ψ), and having a substrate-thickness H/λ in a range of 0.8<H/λ<1.4; and

at least one excitation-electrode on a front surface of the quartz crystal substrate, the at least one excitation-electrode being configured to generate a plurality of plate waves,

wherein the quartz crystal substrate is cut at rotation angles in a range of φ=0±10°, θ=110° to 140°, Ψ=30° to 50° and

wherein the vibration mode of the quartz crystal substrate is selected to be one of the plurality of plate waves having a primary temperature coefficient of frequency α×10 −6 /° C. in a range of −1.0<α<+1.0 and a secondary temperature coefficient of frequency β×10 −8 /°C. 2 in a range of −1.0<β<+1.0 with Taylor expansion performed at 25° C. as well as having a phase velocity of 3500 m/s to 4500 m/s.

2. The elastic wave device according to claim 1 , further including a back-electrode configured to adjust a frequency on a rear surface of the quartz crystal substrate.

3. The elastic wave device according to claim 1 , wherein the at least one excitation-electrode comprises a plurality of interdigital-transducer-electrodes comprising a plurality of electrode-fingers, and further including a back-electrode configured to adjust a frequency on a partial rear surface of the quartz crystal substrate, the partial rear surface corresponding with an area comprising the plurality of electrode-fingers.

4. An elastic wave device, comprising:

a quartz crystal substrate cut out from a quartz crystal body having three-dimensional crystallite orientation comprised of an X-axis, a Y-axis, and a Z-axis, with both the Y-axis and the Z-axis rotated around the X-axis, the quartz crystal substrate being cut at rotation angles specified by right-handed Euler-angles (φ, θ, Ψ), and having a substrate-thickness H/λ equal to or less than 1.25; and

at least one excitation-electrode on a front surface of the quartz crystal substrate, the at least one excitation-electrode being configured to generate a plurality of plate waves,

wherein the quartz crystal substrate is cut at rotation angles in a range of φ=0±10°, θ=35° to 40°, Ψ=0°±10°,

wherein the vibration mode of the quartz crystal substrate is selected to be one of the plurality of plate waves having a primary temperature coefficient of frequency α×10 −6 /° C. in a range of −1.0<α<+1.0 and a secondary temperature coefficient of frequency β×10 −8 /° C. 2 in a range of −1.0<β<+1.0 with Taylor expansion performed at 25° C. as well as having a phase velocity of 4500 m/s to 6000 m/s,

wherein the at least one excitation-electrode comprises a plurality of interdigital-transducer-electrodes comprising a plurality of electrode-fingers, and

wherein an abnormal oscillation caused by an unnecessary vibration other than the vibration mode is reduced by setting a metallization ratio η in a range of 0.6<η<0.9 wherein the η is specified by a ratio of a pitch between each of the plurality of electrode-fingers to a width of one of the plurality of electrode-fingers.

5. The elastic wave device according to claim 4 , further including a back-electrode configured to adjust a frequency on a rear surface of the quartz crystal substrate, and wherein an abnormal oscillation caused by an unnecessary vibration other than the vibration mode is reduced by setting a film-thickness of the back-electrode in a range of 0.001<Hb/λ<0.005.

6. The elastic wave device according to claim 4 , wherein the at least one excitation-electrode comprises a plurality of interdigital-transducer-electrodes comprising a plurality of electrode-fingers, and further including a back-electrode configured to adjust a frequency on a partial rear surface of the quartz crystal substrate, the partial rear surface corresponding with an area comprising the plurality of electrode-fingers.

7. An elastic wave device, comprising:

a quartz crystal substrate cut out from a quartz crystal body having three-dimensional crystallite orientation comprised of an X-axis, a Y-axis, and a Z-axis, with both the Y-axis and the Z-axis rotated around the X-axis, the quartz crystal substrate being cut at rotation angles specified by right-handed Euler-angles (φ,θ,Ψ,) in a range of φ=0±10°, θ=35° to 40°, Ψ=0°±10°, the vibration mode of the quartz crystal substrate being set as a plate wave having a primary temperature coefficient of frequency α×10 −6 /° C. in a range of −0.5<α<+0.5 and a secondary temperature coefficient of frequency β×10 −8 /° C. 2 in a range of −1.0<β<+1.0 with Taylor expansion performed at 25° C., as well as having a phase velocity of 4500 m/s to 6000 m/s, the quartz crystal substrate having a substrate-thickness H/λ in a range of 1.00<H/λ<1.35;

wherein the elastic wave device further comprises a thin plate-like vibration-unit and a holding-unit,

wherein the vibration-unit, having an Y′-axis as a normal direction, wherein the Y′-axis represents the Y-axis after the rotation, and an X′-axis, which represents the X-axis after the rotation, comprises at least one excitation-electrode configured to generate the plate wave,

wherein the holding-unit, having the X-axis and a Z′-axis as a normal direction, having a thickness greater than the vibration-unit, and holding a periphery of the vibration-unit, is integrated with the vibration-unit,

wherein the elastic wave device obtains a vibration mode comprising at least a longitudinal wave component,

wherein the at least one excitation-electrode comprises a plurality of interdigital-transducer-electrodes comprising a plurality of electrode-fingers, and

wherein an abnormal oscillation caused by an unnecessary vibration other than the vibration mode is reduced by setting a metallization ratio η in a range of 0.6<η<0.9 wherein the η is specified by a ratio of a pitch between each of the plurality of electrode-fingers to a width of one of the plurality of electrode-fingers.

8. The elastic wave device according to claim 7 , wherein the holding-unit comprises an opening in at least one direction facing the X-axis or the Z′-axis, and wherein the elastic wave device obtains the vibration mode comprising at least a longitudinal wave component.

9. The elastic wave device according to claim 7 , further including a back-electrode configured to adjust a frequency on a rear surface of the quartz crystal substrate, and wherein a frequency temperature behavior of the vibration mode is adjusted by adjusting a thickness of the back-electrode.

10. The elastic wave device according to claim 7 , wherein the vibration-unit and the holding-unit are formed by recessing the quartz crystal substrate in a direction of the Y′-axis.

11. The elastic wave device according to claim 7 , wherein the at least one excitation-electrode comprises a plurality of interdigital-transducer-electrodes comprising a plurality of electrode-fingers, and further including a back-electrode configured to adjust a frequency on a partial rear surface of the quartz crystal substrate, the partial rear surface corresponding with an area comprising the plurality of electrode-fingers.