IP Library Granted Patent US 9,825,219
Granted Patent B2
US 9,825,219 · App. 15/136,875 · Granted Nov 21, 2017

Magnetic memory devices

Inventor: Sungmin Ahn (Hwaseong-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
H01L43/08G11C11/161H01L43/02H01L43/10
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Quick Facts
Patent No.
US 9,825,219
App. No.
15/136,875
Granted
Nov 21, 2017
Kind
B2
Abstract

Embodiments of the inventive concepts provide magnetic memory devices. The magnetic memory device includes a magnetic tunnel junction including a free layer, a pinned layer, and a tunnel barrier layer between the free layer and the pinned layer. The free layer includes a perpendicular magnetic material doped with non-magnetic impurities.

Claims (49)

1. A magnetic memory device comprising:

a magnetic tunnel junction comprising a free layer, a pinned layer, and a tunnel barrier layer between the free layer and the pinned layer,

wherein the free layer includes a perpendicular magnetic material doped with non-magnetic impurities,

wherein the non-magnetic impurities include a transition metal or a rare-earth element,

wherein the perpendicular magnetic material has a crystal lattice, and

wherein the transition metal of the non-magnetic impurities or the rare-earth element of the non-magnetic impurities is located at interstitial sites of the crystal lattice of the perpendicular magnetic material.

2. The magnetic memory device of claim 1 ,

wherein the non-magnetic impurities have an atomic number equal to or greater than 30 and smaller than 60.

3. The magnetic memory device of claim 2 ,

wherein a concentration of the non-magnetic impurities included in the free layer ranges from 1 at % to 10 at %.

4. The magnetic memory device of claim 1 ,

wherein the non-magnetic impurities have an atomic number equal to or greater than 60.

5. The magnetic memory device of claim 4 ,

wherein a concentration of the non-magnetic impurities included in the free layer ranges from 1 at % to 5 at %.

6. The magnetic memory device of claim 1 ,

wherein the non-magnetic impurities have a spin-orbit coupling constant equal to or greater than 250 cm −1 and smaller than 1000 cm −1 .

7. The magnetic memory device of claim 6 ,

wherein a concentration of the non-magnetic impurities included in the free layer ranges from 1 at % to 10 at %.

8. The magnetic memory device of claim 1 ,

wherein the non-magnetic impurities have a spin-orbit coupling constant equal to or greater than 1000 cm −1 .

9. The magnetic memory device of claim 8 ,

wherein a concentration of the non-magnetic impurities included in the free layer ranges from 1 at % to 5 at %.

10. The magnetic memory device of claim 1 ,

wherein the free layer has a magnetization direction tilted at an acute angle from a direction perpendicular to a top surface of the free layer.

11. The magnetic memory device of claim 10 ,

wherein the acute angle increases as a concentration of the non-magnetic impurities increases.

12. The magnetic memory device of claim 1 ,

wherein the free layer includes a plurality of magnetic domains, and

wherein each of the magnetic domains has a magnetization direction tilted at an acute angle from a direction perpendicular to a top surface of the free layer.

13. The magnetic memory device of claim 1 ,

wherein the pinned layer has a magnetization direction perpendicular to a top surface of the free layer.

14. The magnetic memory device of claim 1 ,

wherein spin-orbit interaction occurs between the perpendicular magnetic material and the non-magnetic impurities.

15. The magnetic memory device of claim 14 ,

wherein the spin-orbit interaction is Dzyaloshinskii-Moriya interaction.

16. A magnetic memory device comprising:

a magnetic tunnel junction comprising a free layer, a pinned layer, and a tunnel barrier layer between the free layer and the pinned layer,

wherein the free layer has a magnetization direction tilted at an acute angle from a direction perpendicular to a top surface of the free layer,

wherein the pinned layer has a magnetization direction perpendicular to the top surface of the free layer,

wherein the free layer is a perpendicular magnetic material doped with non-magnetic impurities,

wherein the non-magnetic impurities include a transition metal or a rare-earth element,

wherein the perpendicular magnetic material has a crystal lattice, and

wherein the transition metal of the non-magnetic impurities or the rare-earth element of the non-magnetic impurities is located at interstitial sites of the crystal lattice of the perpendicular magnetic material.

17. The magnetic memory device of claim 16 ,

wherein the free layer includes a perpendicular magnetic material doped with non-magnetic impurities, and

wherein the acute angle increases as a concentration of the non-magnetic impurities increases.

18. The magnetic memory device of claim 16 ,

wherein the free layer includes a plurality of magnetic domains, and

wherein each of the magnetic domains has a magnetization direction tilted at an acute angle from the direction perpendicular to the top surface of the free layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 16, 2016
From: AHN, SUNGMIN
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 040348/0644 →
Priority Claims (1)
KR 10-2015-0082711 · Jun 11, 2015 · national
Continuity (1)
Related Publication 20160365506A1 · Dec 15, 2016