Poling treatment method, magnetic field poling device, and piezoelectric film
To perform poling treatment in a simple procedure by dry process. A magnetic field poling device includes a first holding part configured to hold a film-to-be-poled ( 2 ); a second holding part configured to hold a magnet generating a magnetic field B to the film-to-be-poled ( 2 ); and a moving mechanism configured to move the first holding part or the second holding part in a direction perpendicular to the direction of the magnetic field B.
1. A poling treatment method of a film-to-be-poled by using magnetism of a magnet generating a magnetic field,
providing said film-to-be-poled,
wherein said film-to-be-poled is any of a dielectric material film, an insulation material film, a piezoelectric material film, a pyroelectric material film, and a ferroelectric material film,
wherein said poling treatment is performed on a 90° domain in a direction perpendicular to the thickness direction of said film-to-be-poled, and the poling treatment on said 90° domain is performed by, while generating a magnetic field in a direction parallel to said film-thickness direction, moving said film-to-be-poled in a direction perpendicular to said film-thickness direction and relative to said magnetic field, and
wherein moving of said film-to-be-poled comprises rotatably moving said film-to-be-poled.
2. The poling treatment method according to claim 1 , wherein the poling treatment on said 90° domain is performed at the Curie temperature of said film-to-be-poled, or higher.
3. The poling treatment method according to claim 1 , wherein the poling treatment on said 90° domain is performed while cooling said film-to-be-poled from the Curie temperature or higher.
4. The poling treatment method according to claim 1 , wherein the intensity of said magnetic field is larger than 1000 G/100 mT.
5. The poling treatment method according to claim 1 , wherein said film-to-be-poled is formed on a substrate.