Liquid discharge apparatus, imprint apparatus and part manufacturing method

1. A liquid discharge apparatus, comprising:

a head including a discharge port surface on which a discharge port is formed to discharge a liquid;

a first reservoir that stores the liquid to be supplied to the head;

a flexible member, separating an inner space of the first reservoir into a first chamber that stores the liquid and a second chamber that stores an operation liquid;

a second reservoir communicating with the second chamber, the second reservoir storing the operation liquid to be supplied to the second chamber, the second reservoir being disposed in such a manner that a liquid surface of the operation liquid stored in the second reservoir is positioned below the discharge port surface; and

an adjustment unit that performs adjustment in such a manner that a position of the liquid surface of the operation liquid in the second reservoir is maintained within a predetermined range in a state where the second reservoir is opened to atmosphere.

2. A liquid discharge apparatus according to claim 1 ,

wherein the adjustment unit includes a liquid surface detection unit that detects a position of the liquid surface of the operation liquid in the second reservoir.

3. A liquid discharge apparatus according to claim 2 ,

wherein the adjustment unit includes a third reservoir that stores the operation liquid, a flow path that connects the second reservoir with the third reservoir, a pump that is disposed at the flow path and supplies the operation liquid from the third reservoir to the second reservoir.

4. A liquid discharge apparatus according to claim 1 ,

wherein the flexible member is disposed in the first reservoir in a direction along a vertical direction.

5. An imprint apparatus, comprising:

a head including a discharge port surface on which a discharge port is formed to discharge a liquid;

a first reservoir that stores the liquid to be supplied to the head;

a flexible member, separating an inner space of the first reservoir into a first chamber that stores the liquid and a second chamber that stores an operation liquid;

a second reservoir communicating with the second chamber, the second reservoir storing the operation liquid to be supplied to the second chamber, the second reservoir being disposed in such a manner that a liquid surface of the operation liquid stored in the second reservoir is positioned below the discharge port surface;

an adjustment unit that performs adjustment in such a manner that a position of the liquid surface of the operation liquid in the second reservoir is maintained within a predetermined range in a state where the second reservoir is opened to atmosphere; and

a forming unit configured to bring a surface of a substrate on which the liquid is discharged by the head and a surface of a mold on which an unevenness pattern is formed into contact with each other, so as to form a pattern corresponding to the unevenness pattern of the mold on the surface of the substrate.

6. An imprint apparatus according to claim 5 ,

wherein the liquid includes a photocurable liquid and

wherein the forming unit includes an irradiation unit that irradiates the pattern formed on the substrate so as to cure the pattern.

7. A part manufacturing method for manufacturing a part including a substrate by using an imprint apparatus including:

a head including a discharge port surface on which a discharge port is formed to discharge a liquid;

a first reservoir that stores the liquid to be supplied to the head;

a flexible member, separating an inner space of the first reservoir into a first chamber that stores the liquid and a second chamber that stores an operation liquid;

a second reservoir communicating with the second chamber, the second reservoir storing the operation liquid to be supplied to the second chamber, the second reservoir being disposed in such a manner that a liquid surface of the operation liquid stored in the second reservoir is positioned below the discharge port surface; and

an adjustment unit that performs adjustment in such a manner that a position of the liquid surface of the operation liquid in the second reservoir is maintained within a predetermined range in a state where the second reservoir is opened to atmosphere, the method comprising:

applying the liquid to a surface of a substrate by the head;

bringing the surface of the substrate on which the liquid is discharged by the head and a surface of a mold on which an unevenness pattern is formed into contact with each other, so as to form a pattern corresponding to the unevenness pattern of the mold on the surface of the substrate; and

treating the substrate on which the pattern is formed.

8. A liquid discharge apparatus according to claim 1 ,

wherein the liquid in the first chamber is filled and sealed in advance, and

the first reservoir is configured to be exchangeable in a case where the liquid in the first chamber has been consumed.

9. A liquid discharge apparatus according to claim 1 ,

wherein a volume of the first chamber decreases as the liquid is discharged from the head.

10. A liquid discharge apparatus according to claim 9 ,

wherein a volume of the second chamber increases as the liquid is discharged from the head.

11. A liquid discharge apparatus according to claim 3 ,

wherein the liquid surface detection unit includes an upper limit position sensor that detects an upper limit position of the liquid surface of the operation liquid in the second reservoir and a lower limit position sensor that detects a lower limit position of the liquid surface of the operation liquid in the second reservoir, and

wherein the pump is controlled based on a detection result of the upper limit position sensor and the lower limit position sensor.

12. A liquid discharge apparatus according to claim 4 ,

wherein the liquid is different in density from the operation liquid.