Semiconductor device and method of manufacture

1. A method of manufacturing a semiconductor device, the method comprising:

applying a first polymer layer over a first redistribution layer, the first redistribution layer being located over a semiconductor substrate;

patterning the first polymer layer to expose at least a portion of the first redistribution layer;

forming a first conductive via through the first polymer layer and in electrical connection with the first redistribution layer;

encapsulating the semiconductor substrate with an encapsulant after the forming the first conductive via, wherein the encapsulant is not in physical contact with the first conductive via, and wherein a top surface of the first conductive via extends above a top surface of the encapsulant;

depositing a second polymer layer over the encapsulant and in physical contact with the first conductive via; and

forming a first fan-out redistribution layer over and through the second polymer layer.

2. The method of claim 1 , wherein the first conductive via comprises copper.

3. The method of claim 1 , wherein the first polymer layer comprises a polyimide layer.

4. The method of claim 3 , wherein the first polymer layer is a first polyimide layer deposited onto the semiconductor substrate.

5. The method of claim 1 , wherein the first fan-out redistribution layer extends over the encapsulant.

6. The method of claim 1 , wherein the encapsulating the semiconductor substrate comprises at least in part a transfer molding process.

7. The method of claim 1 , further comprising forming a first passivation layer onto the semiconductor substrate prior to the applying the first polymer layer, wherein the first passivation layer is in physical contact with both a top metal layer and also the first polymer layer after the applying the first polymer layer, wherein the first passivation layer has a constant composition throughout the first passivation layer.

8. A method of manufacturing a semiconductor device, the method comprising:

forming active devices onto a first side of a semiconductor substrate;

forming a plurality of metallization layers over the active devices, wherein the plurality of metallization layers has a top metal layer, the top metal layer being further away from the semiconductor substrate than a remainder of the plurality of metallization layers;

forming a first passivation layer in physical contact with the top metal layer, wherein the first passivation layer is the first passivation layer over the semiconductor substrate and wherein the first passivation layer comprises a first dielectric material throughout the first passivation layer;

forming a first redistribution layer in electrical connection with the top metal layer, wherein the first redistribution layer comprises a first material;

forming a first protective layer over the first redistribution layer and in physical contact with the first passivation layer;

forming a first conductive via through the first protective layer and in physical contact with the first redistribution layer, the first conductive via comprising a second material different from the first material and having a thickness of less than about 10 μm;

after forming the first conductive via, encapsulating the semiconductor substrate with an encapsulant such that a top surface of the encapsulant is below a top surface of the first conductive via, wherein after the encapsulating the first conductive via is free from contact with the encapsulant;

depositing a second protective layer over the first conductive via and the encapsulant; and

forming a post-passivation interconnect over the second protective layer, the post-passivation interconnect in electrical connection with the first conductive via and extending over the encapsulant.

9. The method of claim 8 , wherein the semiconductor substrate comprises a second side opposite the first side, the first protective layer comprises a first surface facing away from the semiconductor substrate, and wherein the encapsulant has a thickness that is no greater than a distance from the second side of the semiconductor substrate to the first surface.

10. The method of claim 8 , wherein the first protective layer is a non-polymer dielectric material.

11. The method of claim 10 , wherein the first protective layer comprises a composite material.

12. The method of claim ii, wherein the composite material comprises a layer of silicon oxide and a layer of silicon nitride.

13. The method of claim 8 , wherein the first redistribution layer has a first portion in physical connection with the top metal layer and a second portion in physical connection with the top metal layer, wherein the first portion and the second portion are separated from each other by the first passivation layer.

14. The method of claim 8 , further comprising forming first external connectors in electrical connection with the post-passivation interconnect.

15. A method of manufacturing a semiconductor device, the method comprising:

forming a top metal layer over a semiconductor substrate;

depositing a first passivation layer over and in physical contact with the top metal layer;

forming a first redistribution layer over and in physical contact with the first passivation layer;

depositing a first polymer layer over and in physical contact with the first redistribution layer;

forming a first conductive via extending through the first polymer layer and in electrical connection with the first redistribution layer, the first conductive via have a thickness of no greater than 10 μm; and

after forming the first conductive via, placing an encapsulant in physical contact with the semiconductor substrate, the first passivation layer, and the first polymer layer, wherein the first conductive via is laterally separated from the encapsulant and a top surface of the first conductive via is disposed higher than a top surface of the encapsulant.

16. The method of claim 15 , wherein the first redistribution layer comprises aluminum and the first conductive via comprises copper.

17. The method of claim 15 , wherein the first conductive via has a sidewall perpendicular to the semiconductor substrate and the sidewall is free from contact with the encapsulant.

18. The method of claim 15 , further comprising forming a second redistribution layer over and in electrical connection with the first conductive via, wherein the second redistribution layer extends over the encapsulant.

19. The method of claim 18 , further comprising forming a first external connection in electrical connection with the second redistribution layer.

20. The method of claim 15 , wherein a first portion and a second portion of the first redistribution layer extend to make contact with the top metal layer, wherein the first portion is separated from the second portion by the first passivation layer.