Facility for microwave treatment of a load
The invention relates to a facility ( 1 ) for microwave treatment of a load, including: at least one application device ( 30 ); at least one solid-state generator ( 4 ) in the field of microwaves, connected to at least one application device by a means for guiding ( 5 ) the electromagnetic wave; at least one frequency adjustment system ( 40 ) designed for adjusting the frequency of the wave produced by the corresponding generator ( 4 ); a measurement system ( 31 ) for the or each application device ( 30 ), designed for measuring the power reflected P R(i) by the application device ( 30 ); an automated control means ( 6 ) connected to each frequency adjustment system ( 40 ) and to each measurement system ( 31 ) in order to control the adjustment of the frequency f (i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power P R(i) and/or to adjust the transmitted power P T(i) .
1. A method for the microwave treatment of a plasma-type load for producing a plasma in a treatment chamber, comprising the following steps:
generating at least one electromagnetic wave in the microwave range using at least one solid-state generator;
providing several elementary plasma sources, each comprising one application device for applying an electromagnetic wave to the inside of the treatment chamber, and a measurement system for measuring a reflected powers P R(i) which is a power reflected on the corresponding application device due to impedance mismatch;
guiding the electromagnetic wave from the at least one solid-state generator to the application devices of the elementary plasma sources without using any matching device between the solid-state generator and each application device;
application by each application device of the electromagnetic wave on the plasma-type load to the inside of the treatment chamber;
wherein the method further comprises a step for automated adjustment of the frequency f (i) of the at least one electromagnetic wave so as to minimize the reflected powers P R(i) on the application devices measured by the measurement systems, with the following steps:
p1) measuring by the measurement systems, for the application devices, the reflected power P R(i) on the application devices; and
p2) varying the frequency f (i) of the electromagnetic wave produced by the generator, until the reflected powers P R(i) measured on the application devices reaches minimum so as to perform impedance matching on the application devices only by varying said frequency f (i) such as said method performs impedance matching without using any matching device.
2. The method according to claim 1 , wherein the generating step comprises generating at least two electromagnetic waves using at least two generators, the guiding step comprises guiding each electromagnetic wave intended for at least one application device, and the adjustment step comprises adjusting the frequency of each electromagnetic wave independently of one another.
3. The method according to claim 1 , wherein the generating step comprises generating N electromagnetic waves using N generators, the guiding step comprises guiding the N electromagnetic waves intended for N application devices, where N is an integer greater than 2, and the adjusting step comprises regulating the frequency of each electromagnetic wave independently of one another.
4. The method according to claim 1 , wherein the minimum of the measured reflected power P R(i) is equal or close to zero.