Pattern inspection apparatus
A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a stage to mount the substrate thereon and to be movable, a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams, and a drive mechanism to move the detector in order to follow movement of the stage.
1. A pattern inspection apparatus comprising:
a column configured to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams;
a stage configured to mount the substrate thereon and to be movable;
a detector configured to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams; and
a drive mechanism configured to move the detector in order to follow movement of the stage.
2. The apparatus according to claim 1 , wherein the stage performs a step and repeat operation, and the drive mechanism moves the detector in order to follow vibration of the stage until the stage is settled in a case where the stage is stopped in the step and repeat operation.
3. The apparatus according to claim 2 , further comprising:
a laser interference apparatus configured to measure the vibration of the stage,
wherein the drive mechanism moves the detector by using vibration data measured by the laser interference apparatus.
4. The apparatus according to claim 1 , wherein a detection surface of the detector is arranged to be inclined with respect to a surface of the substrate.
5. The apparatus according to claim 1 , further comprising:
a detector stage configured to mount the detector thereon,
wherein the drive mechanism moves the detector stage on which the detector has been placed.
6. A pattern inspection apparatus comprising:
a column configured to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams;
a stage configured to mount the substrate thereon and to be movable;
a plurality of detectors each configured to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams;
a plurality of drive mechanisms each configured to move a corresponding detector of the plurality of detectors in order to follow movement of the stage; and
an image generation processing circuitry configured to combine each data detected by the plurality of detectors and to generate an image of the pattern.
7. The apparatus according to claim 6 , wherein the stage performs a step and repeat operation, and the plurality of drive mechanisms move the plurality of detectors in order to follow vibration of the stage until the stage is settled in a case where the stage is stopped in the step and repeat operation.
8. The apparatus according to claim 7 , further comprising:
a laser interference apparatus configured to measure the vibration of the stage,
wherein each of the plurality of drive mechanisms moves the corresponding detector of the plurality of detectors by using vibration data measured by the laser interference apparatus.
9. The apparatus according to claim 6 , wherein a detection surface of each of the plurality of detectors is arranged to be inclined with respect to a surface of the substrate.
10. The apparatus according to claim 6 , further comprising:
a plurality of detector stages each configured to mount a corresponding detector of the plurality of detectors thereon,
wherein each of the plurality of drive mechanisms moves a corresponding detector stage in the plurality of detector stages in a state where the corresponding detector in the plurality of detectors has been placed on the corresponding detector stage of the plurality of detector stages.