IP Library › Granted Patent US 9,871,046
Granted Patent B2
US 9,871,046 · App. 15/202,053 · Granted Jan 16, 2018

SRAM circuits with aligned gate electrodes

Inventors: Fang Chen (Hsin-Chu, TW); Jhon Jhy Liaw (Hsin-Chu, TW); Min-Chang Liang (Zhu-Dong Town, TW); Ren-Fen Tsui (Yungho, TW); Shih-Chi Fu (Zhudong Township, TW); Yen-Huei Chen (Jhudong Township, TW)
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
H01L27/1104G11C11/418H01L23/528H01L27/0207H01L27/1116
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Quick Facts
Patent No.
US 9,871,046
App. No.
15/202,053
Granted
Jan 16, 2018
Kind
B2
Abstract

A device includes a Static Random Access Memory (SRAM) array, and an SRAM cell edge region abutting the SRAM array. The SRAM array and the SRAM cell edge region in combination include first gate electrodes having a uniform pitch. A word line driver abuts the SRAM cell edge region. The word line driver includes second gate electrodes, and the first gate electrodes have lengthwise directions aligned to lengthwise directions of respective ones of the second gate electrodes.

Claims (29)

1. A device comprising:

a Static Random Access Memory (SRAM) array;

an SRAM cell edge region abutting the SRAM array, wherein the SRAM array and the SRAM cell edge region in combination comprise first gate electrodes having a uniform pitch; and

a word line driver abutting the SRAM cell edge region, wherein the word line driver comprises second gate electrodes, and the first gate electrodes have lengthwise directions aligned to lengthwise directions of respective ones of the second gate electrodes, and wherein first portions of the first gate electrodes are physically connected to second portions of the second gate electrodes.

2. The device of claim 1 , wherein the first gate electrodes and the second gate electrodes have the uniform pitch, a same width, and a same spacing.

3. The device of claim 1 , wherein the SRAM cell edge region comprises a first portion and a second portion on opposite sides of the SRAM array, and the first gate electrodes comprise a continuous gate electrode continuously extending from a first edge of the first portion to a second edge of the second portion.

4. The device of claim 3 , wherein the continuous gate electrode continuously extends into the SRAM array.

5. The device of claim 3 , wherein the continuous gate electrode continuously extends into a plurality of SRAM edge cells that share same columns as the SRAM array.

6. The device of claim 1 further comprising an Input-Output (IO) block comprising third gate electrodes parallel to the first gate electrodes, wherein the IO block and the SRAM cell edge region abut to each other with no additional spacing therebetween.

7. The device of claim 6 , wherein the first gate electrodes and the third gate electrodes are in combination form an integral unit having the uniform pitch.

8. The device of claim 6 , wherein the first gate electrodes comprise a first boundary gate electrode, the third gate electrodes comprise a second boundary gate electrode immediately neighboring the first boundary gate electrode, and the first boundary gate electrode and the second boundary gate electrode have a pitch equal to the uniform pitch.

9. The device of claim 6 , wherein the third gate electrodes have the uniform pitch.

10. A device comprising:

a Static Random Access Memory (SRAM) array comprising a plurality of SRAM cells;

an SRAM cell edge region abutting the SRAM array, wherein the SRAM array and the SRAM cell edge region in combination comprise first gate electrodes having a uniform pitch, and the first gate electrodes comprise a first boundary gate electrode; and

an Input-Output (IO) block comprising second gate electrodes parallel to the first gate electrodes and having the uniform pitch, wherein the second gate electrodes comprise a second boundary gate electrode immediately neighboring the first boundary gate electrode, and the first boundary gate electrode and the second boundary gate electrode have a pitch equal to the uniform pitch.

11. The device of claim 10 further comprising a word line driver abutting the SRAM cell edge region, wherein the word line driver comprises third gate electrodes, with each of the third gate electrodes having a lengthwise direction aligned to a lengthwise direction of one of the first gate electrodes, and the first gate electrodes and the third gate electrodes have a same pitch, a same width, and a same spacing.

12. The device of claim 11 , wherein some of the first gate electrodes are physically connected to some of the second gate electrodes.

13. The device of claim 10 , wherein the SRAM cell edge region comprises a first portion and a second portion on opposite sides of the SRAM array, and the first gate electrodes comprise a continuous gate electrode continuously extending from a first edge of the first portion to a second edge of the second portion.

14. The device of claim 10 , wherein the first boundary gate electrode is a dummy gate electrode continuously extending from a first edge of the SRAM edge cell region to a second edge of the SRAM edge cell region, with the first edge and the second edge being opposite edges of the SRAM edge cell region.

15. The device of claim 10 , wherein the second boundary gate electrode is a dummy gate electrode continuously extending from a first edge of the IO block to a second edge of the IO block, with the first edge and the second edge being opposite edges of the IO block.

16. A device comprising:

a Static Random Access Memory (SRAM) array comprising first gate electrodes having a uniform pitch, wherein the first gate electrodes comprise a first boundary gate electrode;

a word line driver abutting the SRAM array, wherein the word line driver comprises second gate electrodes, and the first gate electrodes have lengthwise directions aligned to lengthwise directions of respective ones of the second gate electrodes; and

an Input-Output (IO) block comprising third gate electrodes parallel to the first gate electrodes and having the uniform pitch, wherein the third gate electrodes comprise a second boundary gate electrode immediately neighboring the first boundary gate electrode, and a pitch of the first boundary gate electrode and the second boundary gate electrode is equal to a pitch of two neighboring ones of the first gate electrodes.

17. The device of claim 16 , wherein one of the first gate electrodes is physically connected to one of the second gate electrodes, and the one of the first gate electrodes is within an SRAM cell in the SRAM array.

18. The device of claim 16 , wherein the first boundary gate electrode is within an SRAM cell in the SRAM array, and the first boundary gate electrode forms gate electrodes of transistors in the SRAM cell.

19. The device of claim 16 , wherein the second boundary gate electrode is a portion of a transistor of the IO block.

20. The device of claim 1 , wherein each of the first portions of the first gate electrodes forms a continuous gate electrode with a corresponding one of the second portions of the second gate electrodes, and the continuous gate electrode extends from the SRAM cell edge region into the word line driver.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 5, 2016
From: CHEN, FANG; LIAW, JHON JHY; LIANG, MIN-CHANG; TSUI, REN-FEN; FU, SHIH-CHI; CHEN, YEN-HUEI
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 039075/0652 →
Continuity (2)
Provisional Application 62299247 · Feb 24, 2016
Related Publication 20170243872A1 · Aug 24, 2017