IP Library › Granted Patent US 9,878,399
Granted Patent B2
US 9,878,399 · App. 13/835,344 · Granted Jan 30, 2018

Method and apparatus for welding dissimilar material with a high energy high power ultrafast laser

Inventor: Jian Liu (Sunnyvale, CA)
B23K26/3233B23K26/032B23K26/046B23K26/0624B23K26/082B23K26/211B23K26/26B23K26/323B23K2203/04B23K2203/14B23K2203/15B23K2203/18B23K2203/20B23K2203/26
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Quick Facts
Patent No.
US 9,878,399
App. No.
13/835,344
Granted
Jan 30, 2018
Kind
B2
Abstract

Methods and systems for welding are disclosed, including generating electromagnetic radiation from an ultrashort pulse laser; coupling the electromagnetic radiation from the ultrashort pulse laser to a scanner comprising a scanning and focus range, wherein the scanner is configured to receive the electromagnetic radiation from the ultrashort laser and to scan and focus the electromagnetic radiation onto a joining interface of one or more materials; using a computer to adjust the pulse repetition rate and the average power of the ultrashort pulse laser; using one or more stages to position the joining interface; using a dichroic filter positioned between the scanner and the one or more materials; and focusing an imager and processor through the dichroic filter and onto the joining interface to monitor the joining interface of the one or more materials within the scanning and focus range of the electromagnetic radiation. Other embodiments are described and claimed.

Claims (14)

1. A method for welding dissimilar materials comprising:

generating electromagnetic radiation from an ultrashort pulse laser, wherein the electromagnetic radiation has a wavelength, a pulse repetition rate, a pulse width, a pulse energy, and an average power;

coupling the electromagnetic radiation from the ultrashort pulse laser to a scanner having a scanning and focus range, wherein the scanner is configured to receive the electromagnetic radiation from the ultrashort pulse laser and to scan and focus the electromagnetic radiation onto a joining interface of one or more materials;

bonding the one or more materials at the joining interface by scanning and focusing the electromagnetic radiation onto the joining interface in order to initiate an ionization process and a thermal process at the joining interface of the one or more materials, wherein the ionization process has ionizing and ablating the one or more materials, and wherein the thermal process has melting, thermally diffusing, and resolidifying the one or more materials; and

using a computer to adjust the pulse repetition rate and the average power of the ultrashort pulse laser;

wherein the wavelength of the electromagnetic radiation generated from the ultrashort pulse laser ranges from about 0.2 μm to 3 μm; and

wherein the pulse repetition rate and the pulse energy of the electromagnetic radiation range between about 1 MHz at about 1 μJ, about 1 MHz at about 1 mJ, about 500 MHz at about 1 mJ, and about 500 MHz at about 1 μJ.

2. The method of claim 1 further comprising using one or more stages to position the joining interface of the one or more materials within the scanning and focus range of the electromagnetic radiation.

3. The method of claim 1 further comprising using a dichroic filter positioned between the scanner and the one or more materials; and focusing an imager and processor through the dichroic filter and onto the joining interface of the one or more materials to monitor the joining interface of the one or more materials within the scanning and focus range of the electromagnetic radiation.

4. The method of claim 1 , wherein the ultrashort pulse laser comprises at least one of a Yb doped fiber laser, an Er doped fiber laser, a Tm doped fiber laser, a Ho doped fiber laser, an Er:ZBLAN fiber laser, a KGW thin disk laser, and a KYW thin disk laser.

5. The method of claim 1 , wherein the pulse width of the electromagnetic radiation generated from the ultrashort pulse laser ranges from about 0.1 ps to 10 ps.

6. The method of claim 1 , wherein the average power of the electromagnetic radiation generated from the ultrashort pulse laser ranges from about 1 W to 2000 W.

7. The method of claim 1 , wherein the electromagnetic radiation is circularly polarized.

8. The method of claim 1 further comprising rotationally scanning on a micron scale the electromagnetic radiation onto the joining interface of the one or more materials.

Continuity (1)
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