Chemical mechanical polishing retaining ring with integrated sensor

1. A retaining ring for a carrier head having a mounting surface for a substrate comprising:

an annular body having a central opening;

a channel formed in the body, wherein a first end of the channel is proximate the central opening; and

a sensor disposed within the channel and proximate the first end, wherein the sensor is configured to detect acoustic and/or vibration emissions from processes performed on the substrate.

2. The retaining ring of claim 1 , further comprising:

a seal disposed within the channel between the sensor and the central opening.

3. The retaining ring of claim 2 , wherein the seal is a silicon membrane separating the central opening from the sensor.

4. The retaining ring of claim 2 , wherein the channel extends from an outer surface of the retaining ring to an inner surface of the retaining ring proximate the central opening.

5. The retaining ring of claim 2 , wherein the seal is about 1 mm to about 10 mm thick.

6. The retaining ring of claim 2 , further comprising:

a second sensor to detect if the seal has failed, wherein the second sensor is one of a humidity sensor or a pressure sensor.

7. The retaining ring of claim 1 , wherein the sensor is one of a microphone to detect acoustic emissions from processes performed on the substrate, or a micro electro-mechanical systems (MEMS) accelerometer to detect vibrations produced from processes performed on the substrate.

8. The retaining ring of claim 1 , wherein the sensor is coupled to a transmitter via one or more electrical leads.

9. The retaining ring of claim 8 , wherein the transmitter is a wireless transmitter configured to wirelessly transmit information associated with acoustic and/or vibration emissions obtained from the sensor.

10. The retaining ring of claim 8 , wherein the transmitter is disposed on an outer surface of the retaining ring.

11. A carrier head for a chemical mechanical polishing apparatus, comprising:

a base;

a retaining ring connected to the base, wherein the retaining ring comprises:

an annular body having a central opening,

a channel formed in the body, wherein a first end of the channel is proximate the central opening, and

a sensor disposed within the channel and proximate the first end, wherein the sensor is configured to detect acoustic and/or vibration emissions from chemical mechanical polishing processes;

a support structure connected to the base by a flexure to be moveable independently of the base and the retaining ring; and

a flexible membrane that defines a boundary of a pressurizable chamber, the membrane connected to the support structure and having a mounting surface for a substrate.

12. The carrier head of claim 11 , wherein the retaining ring further includes a seal disposed within the channel between the sensor and the central opening.

13. The carrier head of claim 12 , wherein the seal is a silicon membrane separating the central opening from the sensor.

14. The carrier head of claim 12 , wherein the channel extends from an outer surface of the retaining ring to an inner surface of the retaining ring proximate the central opening.

15. The carrier head of claim 12 , wherein the seal is about 1 mm to about 10 mm thick.

16. The carrier head of claim 11 , wherein sensor is coupled to a transmitter via one or more electrical leads.

17. The retaining ring of claim 16 , wherein the transmitter is a wireless transmitter configured to wirelessly transmit information associated with acoustic and/or vibration emissions obtained from the sensor.

18. The retaining ring of claim 16 , wherein the transmitter is disposed on an outer surface of the base.