Substrate support with multiple heating zones
Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a body having a support surface; and a first heater disposed within the body and having a first heating coil and multiple heating zones, wherein a pitch of windings of the first heating coil vary among each of the multiple heating zones to define a predetermined heating ratio between the multiple heating zones.
1. A substrate support, comprising:
a body having a support surface;
a first heater disposed within the body and having a first heating coil and multiple heating zones, wherein a pitch of windings of the first heating coil varies among each of the multiple heating zones to define a predetermined heating ratio between the multiple heating zones;
a plurality of vacuum channels disposed in the body and comprising a first circular vacuum channel, a second circular vacuum channel, and a third circular vacuum channel, wherein the first, second, and third circular vacuum channels are concentric;
a first plurality of radial channels extending between the first circular vacuum channel and the second circular vacuum channel, wherein the first plurality of radial channels intersects the second circular vacuum channel at a first plurality of intersection points;
a second plurality of radial channels extending between the second circular vacuum channel and the third circular vacuum channel, wherein the second plurality of radial channels intersects the second circular vacuum channel at a second plurality of intersection points different than the first plurality of intersection points; and
a plurality of openings disposed in the second circular vacuum channel to fluidly couple a vacuum chucking supply to the plurality of vacuum channels.
2. The substrate support of claim 1 , further comprising:
a second heater having a second heating coil, wherein the second heater is disposed outside of a diameter of a substrate to be processed.
3. The substrate support of claim 2 , wherein first heater is disposed radially inward of the second heater.
4. The substrate support of claim 2 , wherein the first heater and the second heater are independently controllable.
5. The substrate support of claim 1 , wherein the multiple heating zones includes a first heating zone, a second heating zone, and a third heating zone.
6. The substrate support of claim 5 , wherein the predetermined heating ratio of the first heating zone, the second heating zone, and the third heating zone is 1:0.4:0.3.
7. The substrate support of claim 5 , wherein a first pitch of windings within the first heating zone is greater than a second pitch of windings within the second heating zone, and wherein the second pitch of windings within the second heating zone is greater than a third pitch of windings within the third heating zone.
8. The substrate support of claim 1 , further comprising:
a support shaft to support the body; and
a reflective heat shield coupled to the shaft and disposed below the body to reflect heat emitted from a bottom of the body back toward the body.
9. A process chamber, comprising:
a chamber body defining an inner volume;
a substrate support disposed in the inner volume, comprising:
a body having a support surface;
a first heater disposed within the body and having a first heating coil and multiple heating zones, wherein a pitch of windings of the first heating coil varies among each of the multiple heating zones to define a predetermined heating ratio between the multiple heating zones;
a plurality of vacuum channels disposed in the support surface and comprising a first circular vacuum channel, a second circular vacuum channel, and a third circular vacuum channel, wherein the first, second, and third circular vacuum channels are concentric;
a first plurality of radial channels extending between the first circular vacuum channel and the second circular vacuum channel, wherein the first plurality of radial channels intersects the second circular vacuum channel at a first plurality of intersection points;
a second plurality of radial channels extending between the second circular vacuum channel and the third circular vacuum channel, wherein the second plurality of radial channels intersects the second circular vacuum channel at a second plurality of intersection points different than the first plurality of intersection points; and
a plurality of openings disposed in the second circular vacuum channel to fluidly couple a vacuum chucking supply to the plurality of vacuum channels.
10. The process chamber of claim 9 , wherein the substrate support further comprises:
a second heater having a second heating coil, wherein the second heater is disposed outside of a diameter of a substrate to be processed.
11. The process chamber of claim 10 , wherein first heater is disposed radially inward of the second heater.
12. The process chamber of claim 10 , wherein the first heater and the second heater are independently controllable.
13. The process chamber of claim 9 , wherein the multiple heating zones includes a first heating zone, a second heating zone, and a third heating zone.
14. The process chamber of claim 13 , wherein the predetermined heating ratio of the first heating zone, the second heating zone, and the third heating zone is 1:0.4:0.3.
15. The process chamber of claim 13 , wherein a first pitch of windings within the first heating zone is greater than a second pitch of windings within the second heating zone, and wherein the second pitch of windings within the second heating zone is greater than a third pitch of windings within the third heating zone.
16. The process chamber of claim 9 , wherein the substrate support further comprises:
a support shaft to support the body; and
a reflective heat shield coupled to the shaft and disposed below the body to reflect heat emitted from a bottom of the body back toward the body.