Measuring method, measurement apparatus, lithographic apparatus and device manufacturing method
View Patent ↗A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.
1. A measurement apparatus comprising:
an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system comprising:
a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and
a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass; and
a radiation detector, downstream of the optical system, to receive the non-zero order radiation.
2. The measurement apparatus of claim 1 , wherein the first stop comprises a mirror.
3. The measurement apparatus of claim 2 , further comprising a radiation input to provide the illumination radiation to the mirror, the mirror configured to provide the illumination radiation toward the spot on the periodic structure.
4. The measurement apparatus of claim 1 , wherein the first stop is part of, in, or on a prism.
5. The measurement apparatus of claim 4 , wherein the second stop is part of, in, or on the prism.
6. The measurement apparatus of claim 1 , wherein the second stop is part of, in, or on a prism.
7. The measurement apparatus of claim 1 , wherein the second stop is a part of, in, or on a plate.
8. The measurement apparatus of claim 7 , wherein the plate is mounted on a hinge.
9. The measurement apparatus of claim 1 , wherein the second stop is a part of, in, or on a support arm structure that is releasably supported by a frame.
10. The measurement apparatus of claim 1 , wherein the second stop is an opaque feature.
11. The measurement apparatus of claim 1 , wherein the second stop is a scattering or reflective feature.
12. The measurement apparatus of claim 1 , wherein the second stop is movable into and out of the path of the redirected radiation.
13. The measurement apparatus of claim 1 , wherein the detector is configured to determine alignment from the received non-zero order radiation.
14. A lithographic apparatus comprising:
a patterning subsystem configured to transfer a pattern to a substrate;
a measuring subsystem configured to measure a position of the substrate in relation to the patterning subsystem,
wherein the patterning subsystem is arranged to use the position measured by the measuring subsystem to apply the pattern at a desired position on the substrate and wherein the measuring subsystem comprises the apparatus as claimed in claim 1 .
15. A method of measuring, the method comprising:
providing radiation into a spot on a periodic structure;
receiving radiation redirected by the periodic structure, the redirected radiation including zero order and non-zero order radiation;
blocking zero order radiation of the redirected radiation using a first stop, while allowing non-zero order radiation to pass the first stop;
blocking zero order radiation passing the first stop using a second stop, while allowing non-zero order radiation to pass the second stop; and
receiving the non-zero order radiation at a radiation detector downstream of the first and second stops.
16. The method of claim 15 , wherein the first stop comprises a mirror and further comprising providing illumination radiation to the mirror, the mirror providing the illumination radiation toward the spot on the periodic structure.
17. The method of claim 15 , wherein the first stop is part of, in, or on a prism.
18. The method of claim 17 , wherein the second stop is part of, in, or on the prism.
19. The method of claim 15 , wherein the second stop is part of, in, or on a prism.
20. The method of claim 15 , further comprising moving the second stop into and out of the path of the redirected radiation.
21. The method of claim 20 , wherein the second stop is a part of, in, or on a plate mounted on a hinge and wherein moving the second stop comprises rotating the plate about the hinge.
22. The method of claim 20 , wherein the second stop is a part of, in, or on a support arm structure that is releasably supported by a frame.
23. The method of claim 15 , wherein the second stop is a scattering or reflective feature.
24. A method of manufacturing a device wherein a device pattern is applied to a substrate using a lithographic process, the method including positioning the applied pattern by reference to a measured position of a periodic structure formed on the substrate, the measured position being obtained by the method as claimed in claim 15 .