Semiconductor memory device
A semiconductor memory device includes a selection transistor on a semiconductor substrate, a lower contact plug connected to a drain region of the selection transistor, and a magnetic tunnel junction pattern on the lower contact plug, the magnetic tunnel junction pattern including a bottom electrode in contact with the lower contact plug, the bottom electrode being an amorphous tantalum nitride layer, a top electrode on the bottom electrode, first and second magnetic layers between the top and bottom electrodes, and a tunnel barrier layer between the first and second magnetic layers.
1. A semiconductor memory device, comprising:
a selection transistor on a semiconductor substrate;
a lower contact plug connected to a drain region of the selection transistor; and
a magnetic tunnel junction pattern on the lower contact plug, the magnetic tunnel junction pattern including:
a bottom electrode in contact with the lower contact plug, the bottom electrode being an amorphous tantalum nitride layer,
a top electrode on the bottom electrode,
first and second magnetic layers between the top and bottom electrodes, and
a tunnel barrier layer between the first and second magnetic layers,
wherein no magnetic layer is between the bottom electrode and the lower contact plug.
2. The semiconductor memory device as claimed in claim 1 , wherein the amorphous tantalum nitride layer has a thickness ranging from about 1 Å to about 10Å.
3. The semiconductor memory device as claimed in claim 1 , wherein a surface roughness of a top surface of the amorphous tantalum nitride layer is smaller than a surface roughness of a top surface of the lower contact plug.
4. The semiconductor memory device as claimed in claim 1 , wherein the lower contact plug includes a tungsten layer, and the amorphous tantalum nitride layer is in contact with the tungsten layer.
5. The semiconductor memory device as claimed in claim 1 , wherein the bottom electrode is between the lower contact plug and the first magnetic layer, and the first magnetic layer has a fixed magnetization direction.
6. The semiconductor memory device as claimed in claim 1 , wherein the top electrode includes a crystalline titanium nitride layer and a metal layer.
7. The semiconductor memory device as claimed in claim 1 , wherein a thickness of the bottom electrode is smaller than a thickness of the top electrode.
8. The semiconductor memory device as claimed in claim 1 , further comprising a seed layer between the bottom electrode and the first magnetic layer, the seed layer being in contact with a top surface of the bottom electrode.
9. The semiconductor memory device as claimed in claim 8 , wherein the seed layer includes ruthenium (Ru) or iridium (Ir).
10. The semiconductor memory device as claimed in claim 8 , further comprising a texture blocking layer between the bottom electrode and the seed layer, the texture blocking layer including a metallic material.
11. The semiconductor memory device as claimed in claim 1 , wherein:
the first magnetic layer is adjacent to the bottom electrode and includes a first magnetic pattern, a second magnetic pattern, and an exchange coupling pattern therebetween, and
the first and second magnetic patterns have magnetization directions that are fixed to be antiparallel to each other.
12. A semiconductor memory device, comprising:
a selection transistor on a semiconductor substrate;
a lower interconnection line electrically connected to the selection transistor;
a lower contact plug electrically connected to the lower interconnection line; and
a magnetic tunnel junction pattern coupled to the lower contact plug, the magnetic tunnel junction pattern including:
a bottom electrode in contact with the lower contact plug, the bottom electrode being an amorphous tantalum nitride layer,
a top electrode on the bottom electrode,
first and second magnetic layers between the top and bottom electrodes, and
a tunnel barrier layer between the first and second magnetic layers,
wherein a surface roughness of a top surface of the amorphous tantalum nitride layer is smaller than a surface roughness of a top surface of the lower contact plug.
13. The semiconductor memory device as claimed in claim 12 , wherein the lower interconnection line includes a first metal material, and the lower contact plug includes a second metal material that is different from the first metal material.
14. The semiconductor memory device as claimed in claim 13 , wherein the first metal material includes at least one of copper or copper alloys, and the second metal material comprises tungsten.
15. The semiconductor memory device as claimed in claim 12 , wherein the amorphous tantalum nitride layer has a thickness ranging from about 1 Å to about 10 Å.
16. A semiconductor memory device, comprising:
a selection transistor on a semiconductor substrate;
a lower contact plug connected to a drain region of the selection transistor; and
a magnetic tunnel junction pattern on the lower contact plug, the magnetic tunnel junction pattern including:
a bottom electrode in contact with the lower contact plug, the bottom electrode being an amorphous layer,
a top electrode on the bottom electrode,
first and second magnetic layers between the top and bottom electrodes, and
a tunnel barrier layer between the first and second magnetic layers,
wherein no magnetic layer is between the bottom electrode and the lower contact plug.
17. The semiconductor memory device as claimed in claim 16 , wherein a surface roughness of a top surface of the amorphous layer is smaller than a surface roughness of a top surface of the lower contact plug.
18. The semiconductor memory device as claimed in claim 16 , wherein the first magnetic layer, the tunnel barrier layer, and the second magnetic layer are stacked in the stated order directly on the bottom electrode.
19. The semiconductor memory device as claimed in claim 16 , wherein a surface of the bottom electrode contacting the first magnetic layer exhibits a surface roughness of less than about 1 Å.