IP Library › Granted Patent US 9,928,992
Granted Patent B2
US 9,928,992 · App. 15/169,768 · Granted Mar 27, 2018

Plasma generation device

Inventors: Yoshihiro Sakaguchi (Hyogo, JP); Shin-Ichi Imai (Osaka, JP)
Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
H01J37/32064A61L2/14H01J37/32036H01J37/32045H01J37/32816H01J37/32825H05H1/48C02F1/4608C02F2303/04H05H2001/4682
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,928,992
App. No.
15/169,768
Granted
Mar 27, 2018
Kind
B2
Abstract

A plasma generation device includes: a pair of electrodes that cause plasma to be generated in atmospheric pressure by a voltage being applied between the pair of electrodes; and a power source that includes a step-up transformer that has a coupling coefficient of 0.9 or greater and 0.9999 or less and generates the voltage.

Claims (31)

1. A plasma generation device comprising:

a pair of electrodes that cause plasma to be generated in atmospheric pressure by a voltage being applied between the pair of electrodes; and

a power source that includes a step-up transformer that has a coupling coefficient of 0.9 or greater and 0.9999 or less and generates the voltage,

wherein the voltage has a periodic voltage waveform having, in each period, a first voltage that generates discharge between the pair of electrodes, and a second voltage that causes the generated discharge to be maintained, and

the first voltage has an absolute value that is higher than an absolute value of the second voltage,

wherein the periodic voltage waveform has a first period and a second period that are two consecutive periods, and

the first voltage in the first period has a same polarity as the first voltage in the second period.

2. The plasma generation device according to claim 1 ,

wherein the power source further includes a rectification circuit that rectifies the voltage applied between the pair of electrodes.

3. The plasma generation device according to claim 1 ,

wherein the pair of electrodes are provided in a liquid, and cause the plasma to be generated in a gas-phase space in the liquid.

4. The plasma generation device according to claim 1 ,

wherein the coupling coefficient of the step-up transformer is 0.9 or greater and 0.99 or less.

5. The plasma generation device according to claim 1 ,

wherein the pair of electrodes cause the plasma to be generated in atmospheric pressure of 963 hPa or greater and 1063 hPa or less.

6. A plasma generation device comprising:

a pair of electrodes that cause plasma to be generated in atmospheric pressure by a voltage being applied between the pair of electrodes; and

a power source that includes a step-up transformer that generates the voltage that is applied between the pair of electrodes, and an inductor that is provided between a secondary side of the step-up transformer and the pair of electrodes, and has an inductance value of 0.01% or greater and 10% or less with respect to an inductance value of the secondary side of the step-up transformer,

wherein the voltage has a periodic voltage waveform having, in each period, a first voltage that generates discharge between the pair of electrodes, and a second voltage that causes the generated discharge to be maintained, and

the first voltage has an absolute value that is higher than an absolute value of the second voltage.

7. The plasma generation device according to claim 6 ,

wherein the power source further includes a rectification circuit that rectifies the voltage applied between the pair of electrodes.

8. The plasma generation device according to claim 6 ,

wherein the pair of electrodes are provided in a liquid, and cause the plasma to be generated in a gas-phase space in the liquid.

9. The plasma generation device according to claim 6 ,

wherein the pair of electrodes cause the plasma to be generated in atmospheric pressure of 963 hPa or greater and 1063 hPa or less.

10. The plasma generation device according to claim 1 ,

wherein the absolute value of the first voltage that generates discharge is a highest absolute value in the periodic voltage waveform in each period.

11. The plasma generation device according to claim 6 , wherein the absolute value of the first voltage that generates discharge is a highest absolute value in the periodic voltage waveform in each period.

12. The plasma generation device according to claim 6 , wherein the periodic voltage waveform has a first period and a second period that are two consecutive periods, and

the first voltage in the first period has a same polarity as the first voltage in the second period.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 16, 2016
From: SAKAGUCHI, YOSHIHIRO; IMAI, SHIN-ICHI
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 038937/0760 →
Priority Claims (1)
JP 2015-115185 · Jun 5, 2015 · national
Continuity (1)
Related Publication 20160358752A1 · Dec 8, 2016