Nanowire-based mechanical switching device
Nanowire-based mechanical switching devices are described. For example, a nanowire relay includes a nanowire disposed in a void disposed above a substrate. The nanowire has an anchored portion and a suspended portion. A first gate electrode is disposed adjacent the void, and is spaced apart from the nanowire. A first conductive region is disposed adjacent the first gate electrode and adjacent the void, and is spaced apart from the nanowire.
1. A semiconductor device, comprising:
a source region and a drain region fixed to an underlying substrate;
a semiconductor beam suspended over the substrate, between and coupled to the source region and the drain region, wherein the semiconductor beam comprises a semiconductor material and an insulator material disposed on the semiconductor material; and
a gate electrode disposed between the source and drain electrode regions and proximate to but spaced apart from the semiconductor beam, wherein the semiconductor beam is buckled and is non-strained when a gate bias of the gate electrode is zero, and wherein the gate electrode is free from a permanent gate dielectric layer.
2. The semiconductor structure of claim 1 , wherein the semiconductor beam is substantially linear and is compressively strained when a gate bias of the gate electrode is greater than zero.
3. The semiconductor structure of claim 1 , wherein the semiconductor beam is buckled away from the gate electrode when the gate bias of the gate electrode is zero.
4. The semiconductor device of claim 1 , wherein the semiconductor beam is a single-crystalline nanowire.
5. The semiconductor device of claim 4 , wherein the single-crystalline nanowire comprises a material selected from the group consisting of silicon, germanium, and silicon germanium.
6. The semiconductor device of claim 4 , wherein the single-crystalline nanowire comprises a Group III-V material.
7. The semiconductor device of claim 4 , wherein the single-crystalline nanowire is a silicon nanowire having an outer <100> plane.
8. The semiconductor device of claim 4 , wherein the single-crystalline nanowire has a smallest dimension less than 20 nanometers.
9. The semiconductor device of claim 4 , wherein the single-crystalline nanowire has square or rounded corners.
10. A semiconductor device, comprising:
a source region and a drain region fixed to an underlying substrate;
a semiconductor beam suspended over the substrate, between and coupled to the source region and the drain region, wherein the semiconductor beam comprises a material selected from the group consisting of silicon, germanium, and silicon germanium, and an insulator material disposed on the material; and
a gate electrode disposed between the source and drain electrode regions and proximate to but spaced apart from the semiconductor beam, wherein the semiconductor beam is buckled and is non-strained when a gate bias of the gate electrode is zero, and wherein the gate electrode is free from a permanent gate dielectric layer.
11. The semiconductor device of claim 10 , wherein the semiconductor beam has square or rounded corners.
12. The semiconductor structure of claim 10 , wherein the semiconductor beam is substantially linear and is compressively strained when a gate bias of the gate electrode is greater than zero.
13. The semiconductor structure of claim 10 , wherein the semiconductor beam is buckled away from the gate electrode when the gate bias of the gate electrode is zero.
14. The semiconductor device of claim 10 , wherein the semiconductor beam has a smallest dimension less than 20 nanometers.
15. A semiconductor device, comprising:
a source region and a drain region fixed to an underlying substrate;
a semiconductor beam suspended over the substrate, between and coupled to the source region and the drain region, wherein the semiconductor beam comprises a Group III-V material, and an insulator material disposed on the Group III-V material; and
a gate electrode disposed between the source and drain electrode regions and proximate to but spaced apart from the semiconductor beam, wherein the semiconductor beam is buckled and is non-strained when a gate bias of the gate electrode is zero, and wherein the gate electrode is free from a permanent gate dielectric layer.
16. The semiconductor structure of claim 15 , wherein the semiconductor beam is substantially linear and is compressively strained when a gate bias of the gate electrode is greater than zero.
17. The semiconductor structure of claim 15 , wherein the semiconductor beam is buckled away from the gate electrode when the gate bias of the gate electrode is zero.
18. The semiconductor device of claim 15 , wherein the semiconductor beam has a smallest dimension less than 20 nanometers.
19. The semiconductor device of claim 15 , wherein the semiconductor beam has square or rounded corners.