High-voltage supply unit and circuit arrangement for generating a high voltage for a particle beam apparatus
The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.
1. A high-voltage supply unit for providing an output voltage for a particle beam apparatus, comprising
at least one current source for providing a first current,
at least one first voltage source connected to the first current source by way of a first line,
at least one second current source for providing a second current, wherein the second current source is linked to the first current source by way of a second line,
at least one second voltage source linked to the second current source by way of a third line,
at least one adjustment and/or control loop for adjusting and/or regulating the output voltage, wherein the adjustment and/or control loop is linked to the first current source and/or the second current source by way of an optical and/or electronic coupling device, and comprising
at least one feedback resistor, through which a third current flows, wherein the feedback resistor is linked to the adjustment and/or control loop by way of a fourth line, the feedback resistor is linked to the first current source by way of a fifth line, the feedback resistor is linked to the second current source by way of a sixth line, and wherein the feedback resistor, the first current source, and the second current source are linked to a high-voltage connector by way of a seventh line, through which a fourth current flows.
2. The high-voltage supply unit as claimed in claim 1 , wherein the feedback resistor is embodied as a resistance sequence.
3. The high-voltage supply unit as claimed in claim 2 , wherein
the feedback resistor has n resistors, wherein n is an integer and the n resistors are switched in series,
the feedback resistor has a holder, on which the n resistors are arranged, and wherein
the feedback resistor has a cooling unit, wherein the cooling unit is thermally coupled to the n resistors for a temperature flow between the n resistors and the cooling unit such that a same temperature sets-in between each resistor and the cooling unit.
4. The high-voltage supply unit as claimed in claim 3 , wherein at least one thermally conductive insulation is arranged between the holder and the cooling unit, wherein the thermally conductive insulation is not electrically conductive.
5. The high-voltage supply unit as claimed in claim 4 , wherein the cooling unit is arranged at the thermally conductive insulation in such a way that the cooling unit touches the thermally conductive insulation.
6. The high-voltage supply unit as claimed in claim 4 , wherein the thermally conductive insulation touches each one of the n resistors.
7. The high-voltage supply unit as claimed in claim 3 , wherein each one of the n resistors has an identical embodiment.
8. A resistor circuit arrangement for a high-voltage supply unit of a particle beam apparatus, comprising:
n resistors, wherein n is an integer and the n resistors are switched in series,
a holder, on which the n resistors are arranged, and
a cooling unit, wherein the cooling unit is thermally coupled to the n resistors for a temperature flow between the n resistors and the cooling unit and wherein the cooling unit has a virtually identical thermal resistance to each one of the n resistors such that a same temperature sets-in between each resistor and the cooling unit.
9. The resistor circuit arrangement as claimed in claim 8 , wherein the holder is embodied as a printed circuit board or in the form of free wiring.
10. The resistor circuit arrangement as claimed in claim 8 , wherein at least one thermally conductive insulation is arranged between the holder and the cooling unit.
11. The resistor circuit arrangement as claimed in claim 10 , wherein the cooling unit is arranged at the thermally conductive insulation in such a way that the cooling unit touches the thermally conductive insulation.
12. The resistor circuit arrangement as claimed in claim 10 , wherein the thermally conductive insulation touches each one of the n resistors.
13. The resistor circuit arrangement as claimed in claim 8 , wherein each one of the n resistors has an identical embodiment.
14. A particle beam apparatus for analyzing and/or processing an object, comprising
at least one beam generator for generating a particle beam with charged particles,
at least one objective lens for focusing the particle beam onto the object,
at least one detector for detecting interaction particles and/or interaction radiation, wherein the interaction particles and/or the interaction radiation arise/arises due to an interaction of the particle beam with the object, and comprising
at least one high-voltage component at which a high voltage is present, wherein the particle beam apparatus furthermore comprises one of the following features:
(i) at least one high-voltage supply unit having at least one current source for providing a first current, at least one first voltage source connected to the first current source by way of a first line, at least one second current source for providing a second current, wherein the second current source is linked to the first current source by way of a second line, at least one second voltage source linked to the second current source by way of a third line, at least one adjustment and/or control loop for adjusting and/or regulating the output voltage, wherein the adjustment and/or control loop is linked to the first current source and/or the second current source by way of an optical and/or electronic coupling device, and comprising at least one feedback resistor, through which a third current flows, wherein the feedback resistor is linked to the adjustment and/or control loop by way of a fourth line, the feedback resistor is linked to the first current source by way of a fifth line, the feedback resistor is linked to the second current source by way of a sixth line, and wherein the feedback resistor, the first current source, and the second current source are linked to a high-voltage connector by way of a seventh line, through which a fourth current flows;
(ii) at least one circuit arrangement having at least one high-voltage supply unit for providing an output voltage, and comprising at least one noise suppression unit, which is linked to the high-voltage supply unit by way of at least one link line for guiding the output voltage of the high-voltage supply unit into the noise suppression unit, wherein the noise suppression unit comprises: at least one noise measurement device for registering noise of the output voltage, at least one amplifier-filter unit, wherein the amplifier-filter unit is linked to the noise measurement device by way of an eighth line, at least one control loop, wherein the control loop is linked to the amplifier-filter unit by a ninth line and wherein the control loop is linked to the noise measurement device by a tenth line, and comprises at least one high-voltage connector, at which the high voltage is present, wherein the high-voltage connector is linked to the control loop by way of an eleventh line; and
(iii) at least one resistor circuit arrangement having n resistors, wherein n is an integer and the n resistors are switched in series, a holder, on which the n resistors are arranged, and comprising a cooling unit, wherein the cooling unit is thermally coupled to the n resistors for a temperature flow between the n resistors such that a same temperature sets-in between each resistor and the cooling unit.
15. The particle beam apparatus as claimed in claim 14 , wherein the particle beam apparatus is embodied as an electron beam apparatus and/or ion beam apparatus.
16. The high-voltage supply unit as claimed in claim 7 , wherein the output voltage is given by:
U
a
=
U
f
·
(
-
(
R
m
+
1
+
R
m
+
2
+
…
+
R
n
)
R
1
+
R
2
+
…
+
R
m
)
=
-
U
f
·
(
n
-
m
m
)
where m is an integer less than n and U f is a predetermined voltage.
17. The high-voltage supply unit as claimed in claim 13 , wherein the output voltage is given by:
U
a
=
U
f
·
(
-
(
R
m
+
1
+
R
m
+
2
+
…
+
R
n
)
R
1
+
R
2
+
…
+
R
m
)
=
-
U
f
·
(
n
-
m
m
)
where m is an integer less than n and U f is a predetermined voltage.
18. The method of claim 8 , wherein the n resistors constitute a feedback resistor of a high voltage supply unit.