Manufacturing method for color film substrate and LCD apparatus
The invention provides a manufacturing method for color film substrate and LCD apparatus. The method utilizes the quantum dot (QD) material to form a color film layer having a red, green, cyan and blue filter layer on the bottom substrate to realize four-color display scheme, improve QD utilization and improve display color domain; the LCD apparatus comprises a color film layer and a blue backlight module, the color film layer comprises red, green, cyan and blue filter layer, the red filter layer comprises a red filter film and a red QD film on the red filter film; the green filter layer comprises a green filter film and a green QD film on the green filter film; the cyan filter layer comprises a green QD film; by using QD material to mix blue backlight and color film layer to realize four-color scheme, improve QD utilization and improve display color domain.
1. A manufacturing method for color film substrate, which comprises:
Step 1: providing a bottom substrate, forming a black matrix on the bottom substrate, the black matrix arranged to form a plurality of red sub-pixel areas, a plurality of green sub-pixel areas, a plurality of cyan sub-pixel areas, and a plurality of blue sub-pixel areas;
Step 2: forming red color filter films and green color films in the red sub-pixel areas and green sub-pixel areas respectively;
Step 3: forming red quantum dot films in the red sub-pixel areas on the bottom substrate, green quantum dot films in the green sub-pixel areas on the bottom substrate, and green quantum dot films in the cyan sub-pixel areas on the bottom substrate;
wherein after Steps 2-3, a color film layer being obtained on the bottom substrate, the color film layer comprising a plurality of red, green, cyan, and blue filter layers corresponding to the plurality of red, green, cyan, and blue sub-pixel areas; and
the red filter layer comprising the red filter film and the red quantum dot film on the red filter film; the green filter layer comprising the green filter film and the green quantum dot film on the green filter film; the cyan filter layer comprising the green quantum dot film; and the blue filter layer comprising no material or a transparent film.
2. The manufacturing method for color film substrate as claimed in claim 1 , wherein in Step 1, the black matrix formed on the bottom substrate has a thickness of 1-3 um.
3. The manufacturing method for color film substrate as claimed in claim 1 , wherein in Step 2, the red filter films and green filter films are formed by a lithography or sputter printing process; and in Step 3, the red quantum dot film and the green quantum dot film are formed by a lithography or sputter printing process.
4. The manufacturing method for color film substrate as claimed in claim 1 , wherein in Step 2 or Step 3, transparent layers are formed in the blue sub-pixel areas on the bottom substrate; the blue filter layer comprises the transparent layers in the blue sub-pixel areas.
5. The manufacturing method for color film substrate as claimed in claim 1 , wherein the red quantum dot film emits a red light with a 620-640 nm peak and a half wave width of 30-40 nm when excited by light; the green quantum dot film emits a green light with a 520-540 nm peak and a half wave width of 30-40 nm when excited by light; the transmittance of the red filter film is above 95.8% for light having wavelength within 620-780 nm, and below 0.2% for light having wavelength within 430-570 nm; the transmittance of the green filter film is above 90% for light having wavelength within 486-560 nm, and below 50% for light having wavelength within 640-730 nm.