Pellicle for reticle and multilayer mirror
A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
1. A pellicle module constructed and arranged for a substrate, the pellicle module comprising:
a pellicle frame, configured and arranged to hold a pellicle at a fixed distance from the substrate; and
wherein the pellicle comprises a layer of graphene.
2. The pellicle according to claim 1 , wherein the layer of graphene is formed from a single atomic layer of carbon.
3. The pellicle according to claim 1 , wherein the pellicle comprises a plurality of graphene layers.
4. The pellicle according to claim 1 , wherein the pellicle comprises graphene flakes.
5. The pellicle according to claim 1 , wherein the pellicle comprises a grid to support the graphene.
6. The pellicle according to claim 1 , wherein the pellicle does not comprise a grid.
7. The pellicle according to claim 1 , wherein the pellicle is doped.
8. The pellicle according to claim 1 , wherein the pellicle comprises a support member configured to be removable from a lithographic apparatus and/or the substrate.
9. The pellicle according to claim 1 , wherein the pellicle comprises alternating layers of graphene and supporting material.
10. The pellicle according to claim 1 , wherein the graphene is configured to function as an anti-diffusion barrier.
11. The pellicle according to claim 1 , wherein the graphene comprises graphene derivatives.
12. The pellicle according to claim 11 , wherein the graphene derivatives are selected from the group consisting of: graphane, graphene fluoride, graphene bromide, graphene chloride and graphene iodide.
13. A lithographic apparatus comprising:
a radiation source configured to produce a radiation beam and a support configured to support a substrate, wherein the support is provided with a pellicle comprising a layer of graphene.