Pellicle film including graphite-containing thin film for extreme ultraviolet lithography
A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
1. A pellicle film for extreme ultraviolet (EUV) lithography, the pellicle film comprising a graphite-containing thin film,
wherein the graphite-containing thin film comprises a graphite thin film.
2. The pellicle film of claim 1 , wherein the pellicle film has a transmittance of 60% or more with respect to EUV light having a wavelength of 13.5 nm.
3. The pellicle film of claim 1 , wherein a thickness of the pellicle film is 50 nm or less.
4. The pellicle film of claim 1 , wherein the graphite-containing thin film is a free-standing nano-thin film.
5. The pellicle film of claim 1 , wherein the pellicle film is used in photolithography using an incident beam having a wavelength of 190 nm or less.
6. The pellicle film of claim 1 , wherein the pellicle film is supported by a square frame having one side of 5 mm or more so that the pellicle film is free-standing.
7. The pellicle film of claim 1 , wherein the pellicle film is supported by a round frame having a diameter of 5 mm or more so that the pellicle film is free-standing.