Direct metal bonding method

1. A direct metal bonding method comprising the following steps:

a) providing a first stack comprising a first substrate on which is a first metal layer comprising a first metal, and a first solubilization layer distinct from the first metal layer, the first solubilization layer being in direct contact with and covered by the first metal layer, the first solubilization layer including a first getter material configured to solubilize oxygen, the first metal layer being covered by a first native oxide;

b) providing a second stack comprising a second substrate on which is a second metal layer comprising a second metal, the second metal layer being covered by a second native oxide;

c) contacting the first metal layer and the second metal layer so as to obtain a direct metal bonding between the first metal layer and the second metal layer, the first and second native oxides being encapsulated at a bonding interface;

d) applying a heat treatment for annealing the bonding under a pressure less than or equal to about 0.1 MPa applied on either side of the first and second stacks; and

e) applying an activation heat treatment for solubilizing oxygen of the first and second native oxides by the first getter material so as to obtain a direct metal bonding between the first metal layer and the second metal layer.

2. The method according to claim 1 , wherein step e) is carried out by step d).

3. The method according to claim 1 , wherein step e) is carried out prior to step c).

4. The method according to claim 1 , further comprising:

j) depositing the first metal layer according to deposition conditions promoting presence of grain boundaries prior to step a).

5. The method according to claim 4 , wherein step j) includes depositing the first solubilization layer on the first substrate prior to deposition of the first metal layer.

6. The method according to claim 1 , further comprising:

jj) depositing the second metal layer according to deposition conditions promoting presence of grain boundaries prior to step b).

7. The method according to claim 1 , further comprising one of:

j) depositing the first metal layer in a columnar structure prior to step a); and

jj) depositing the second metal layer in the columnar structure prior to step b).

8. The method according to claim 1 , wherein the second stack further comprises a second solubilization layer distinct from the second metal layer, the second solubilization layer including a second getter material configured to solubilize oxygen.

9. The method according to claim 1 , wherein the first solubilization layer comprises an alloy of first metal and first getter material.

10. The method according to claim 1 , wherein the first solubilization layer is buried within the first metal layer.

11. The method according to claim 1 , wherein step a) includes application of an activation heat treatment under inert atmosphere, so as to activate the first getter material for solubilization of oxygen.

12. The method according to claim 1 , wherein step d) is performed at a temperature lower than or equal to 600° C. and a bonding energy between the first metal layer and the second metal layer reaches a value greater than or equal to 1 J/m 2 .

13. The method according to claim 1 , wherein the first solubilization layer is configured to solubilize oxygen greater than or equal to 20 atomic %.

14. The method according to claim 1 , wherein the first getter material is selected from: titanium, zirconium, palladium, hafnium, vanadium, and metal alloys thereof.

15. The method according to claim 1 , wherein the first metal and the second metal are selected from Ti, Al, Au, Ag, Cu, Co, Ni, Pt, Fe, Cr, Ru, Mo, Ta, Nb, Re, W, and metal alloys thereof.

16. The method according to claim 1 , wherein step a) or step b) comprises:

k) depositing a barrier layer forming a barrier for diffusing contaminating materials directly on the first substrate or the second substrate, the barrier layer comprising a material selected from: TiN, WN, and TaN.

17. The method according to claim 1 , wherein the first substrate or the second substrate is composed of a semi-conductive material.

18. A structure having a direct metal bonding interface for applications in 3D integration and obtained by the direct metal bonding method of claim 1 , the structure comprising, successively from its base to its surface:

the first substrate of a first semi-conductive material;

the first solubilization layer including the first getter material configured to solubilize oxygen;

the first metal layer of the first metal, distinct from the first solubilization layer and bonded by direct metal bonding to the second metal layer of the second metal, the first metal layer being covered by the first native oxide, the first and second native oxides being encapsulated at the bonding interface; and

the second metal layer, the second metal layer being covered by the second native oxide, the second metal layer having a second solubilization layer distinct from the second metal layer, including a second getter material configured to solubilize oxygen, and the second substrate of a second semi-conductive material.

19. A direct metal bonding method comprising the following steps:

a) providing a first stack comprising a first substrate on which is deposited a first metal layer comprising a first metal, and a first solubilization layer distinct from the first metal layer, the first solubilization layer being in direct contact with the first metal layer, the first solubilization layer including a first getter material configured to solubilize oxygen, the first metal layer being covered by a first native oxide;

b) providing a second stack comprising a second substrate on which is deposited a second metal layer comprising a second metal, and a second solubilization layer distinct from the second metal layer, the second solubilization layer being in direct contact with the second metal layer, the second solubilization layer including a second getter material configured to solubilize oxygen, the second metal layer being covered by a second native oxide;

c) applying an activation heat treatment for solubilizing oxygen of the first and second native oxides by the first getter material and the second getter material respectively, step c) being carried out prior to step d);

d) contacting the first metal layer and the second metal layer without new contact with air; and

e) applying a heat treatment for annealing the bonding, step e) being applied under a pressure less than or equal to about 0.1 MPa applied on either side of the first and second stacks.