Apparatus and method for treating a substrate
In apparatus and method according to example embodiments of the inventive concept, a substrate may be treated using two or more treatment solutions. The substrate treating apparatus may include a treatment vessel providing a treatment space, a substrate supporting unit provided in the treatment vessel to support a substrate, and a solution supplying unit supplying a treatment solution on the substrate supported by the substrate supporting unit. The solution supplying unit may include an etching solution supplying nozzle supplying an etching solution on an edge region of the substrate supported by the substrate supporting unit and an etch prevention solution (EPS) supplying nozzle supplying an etch prevention solution on a center region of the substrate supported by the substrate supporting unit. Accordingly, it is possible to prevent the center region of the substrate from being dried.
1. A substrate treating apparatus, comprising:
a treatment vessel having a treatment space therein;
a substrate supporting device in the treatment vessel, the substrate supporting device configured to support a substrate; and
a solution supplying device configured to supply a treatment solution on the substrate supported by the substrate supporting unit, the solution supplying device including,
an etching solution supplying nozzle configured to supply an etching solution on an edge region of the substrate supported by the substrate supporting device,
an etch prevention solution (EPS) supplying nozzle configured to supply an etch prevention solution on a center region of the substrate supported by the substrate supporting device;
a rotating axis;
a driving unit configured to rotate the rotating axis; and
a supporting arm configured to support the etching solution supplying nozzle and the EPS supplying nozzle, the supporting arm including,
a first arm coupled to the rotating axis, the first arm having a longitudinal direction that is parallel to a specific direction, and
a second arm coupled to the first arm, the second arm having a longitudinal direction that is different from the specific direction, in a plan view, the etching solution supplying nozzle and the EPS supplying nozzle being provided on the second arm, the second arm being fixed at 90 degrees with respect to the first arm such that a junction therebetween corresponds to the center region of the substrate, and wherein
the substrate treating apparatus first supplies, via the etching solution supplying nozzle, the etch prevention solution on the center region of the substrate and thereafter subsequently supplies, via the etching solution supplying nozzle, the etching solution on the edge region of the substrate such that the center region of the substrate is pre-treated with the etch prevention solution prior to applying the etching solution to the substrate.
2. The apparatus of claim 1 , wherein the second arm has a plurality of connection ports that allows the etching solution supplying nozzle and the EPS supplying nozzle to be connected thereto, and
the connection ports are arranged along the longitudinal direction of the second arm.
3. The apparatus of claim 1 , wherein the second arm is movable relative to the first arm.
4. The apparatus of claim 1 , wherein the etch prevention solution (EPS) supplying nozzle is configured to,
supply the etch prevention solution on the center region of the substrate before the etching solution supplying nozzle supplies the etching solution on the edge region of the substrate such that the center region of the substrate is pre-treated by a layer is formed on the substrate prior to the etching solution being supplied on the edge region of the substrate, and
supply the etch prevention solution on the center region of the substrate at a same time as the etching solution supplying nozzle supplies the etching solution on the edge region of the substrate after the center region of the substrate is pre-treated.
5. The apparatus of claim 1 , wherein the first arm includes a first end and a second end, the first end of the first arm being coupled to the rotating axis, and the second end of the first arm being coupled to the second arm.