Semiconductor device
A power MOSFET and a sense MOSFET for detecting a current of the power MOSFET are formed in a semiconductor chip, and a source pad and a Kelvin pad are formed of a source electrode for the power MOSFET. The source pad is a pad for outputting the current flowing to the power MOSFET, and the Kelvin pad is a pad for detecting a source potential of the power MOSFET. The source electrode has a slit, and at least a part of the slit is arranged between the source pad and the Kelvin pad when seen in a plan view.
1. A semiconductor device comprising:
a semiconductor substrate;
a first MOSFET formed in a first region of a main surface of the semiconductor substrate;
a second MOSFET formed in a second region of the main surface of the semiconductor substrate;
a first source electrode formed over the first region and electrically connected to a source of the first MOSFET;
a second source electrode formed over the main surface of the semiconductor substrate and electrically connected to a source of the second MOSFET;
a gate electrode formed over the main surface of the semiconductor substrate and electrically connected to a gate of the first MOSFET and a gate of the second MOSFET;
a drain electrode formed on a back surface on an opposite side of the main surface of the semiconductor substrate and electrically connected to a drain of the first MOSFET and a drain of the second MOSFET;
an insulating film formed over the main surface of the semiconductor substrate and covering the first source electrode, the second source electrode and the gate electrode;
a first source pad formed of the first source electrode exposed from a first opening portion of the insulating film;
a second source pad formed of the first source electrode exposed from a second opening portion of the insulating film;
a third source pad formed of the second source electrode exposed from a third opening portion of the insulating film; and
a gate pad formed of the gate electrode exposed from a fourth opening portion of the insulating film,
wherein the second MOSFET is an element for detecting a current flowing to the first MOSFET,
wherein the second region is an area which is smaller than the first region on the main surface of the semiconductor substrate,
wherein the first source pad and the second source pad are arranged over the first region,
wherein the first source pad is a pad for outputting the current flowing to the first MOSFET,
wherein the second source pad is a pad for detecting a source potential of the first MOSFET,
wherein the first source electrode has a slit, and
wherein at least a part of the slit is arranged between the first source pad and the second source pad when seen in a plan view.
2. The semiconductor device according to claim 1 ,
wherein a shortest path between the first source pad and the second source pad is blocked by the slit when seen in a plan view.
3. The semiconductor device according to claim 2 ,
wherein the slit is arranged closer to the second source pad than to the first source pad when seen in a plan view.
4. The semiconductor device according to claim 2 ,
wherein the second source pad is arranged closer to a first corner of the semiconductor device than to other corners of the semiconductor device other than the first corner when seen in a plan view, and
wherein the slit is formed so that the second source pad is surrounded by two sides which form the first corner of the semiconductor device and the slit when seen in a plan view.
5. The semiconductor device according to claim 1 ,
wherein the first MOSFET is formed of a plurality of unit transistor cells which are formed in the first region of the main surface of the semiconductor substrate and are connected in parallel to each other.
6. The semiconductor device according to claim 5 ,
wherein the unit transistor cell is not formed under the slit in the main surface of the semiconductor substrate.
7. The semiconductor device according to claim 1 ,
wherein the second source pad and the third source pad are electrically connected to a current detection circuit unit for detecting a current flowing to the second MOSFET, and
wherein the current detection circuit unit is provided outside the semiconductor device.
8. The semiconductor device according to claim 7 ,
wherein the current detection circuit unit includes a differential amplifier,
wherein the second source pad is electrically connected to a first input node of the differential amplifier of the current detection circuit unit, and
wherein the third source pad is electrically connected to a second input node of the differential amplifier of the current detection circuit unit.
9. A semiconductor device comprising:
a semiconductor substrate;
a first MOSFET formed in a first region of a main surface of the semiconductor substrate;
a second MOSFET formed in a second region of the main surface of the semiconductor substrate;
a first source electrode formed over the first region and electrically connected to a source of the first MOSFET;
a second source electrode formed over the main surface of the semiconductor substrate and electrically connected to a source of the second MOSFET;
a third source electrode formed over the main surface of the semiconductor substrate and electrically connected to the first source electrode via a first wiring;
a gate electrode formed over the main surface of the semiconductor substrate and electrically connected to a gate of the first MOSFET and a gate of the second MOSFET;
a drain electrode formed on a back surface on an opposite side of the main surface of the semiconductor substrate and electrically connected to a drain of the first MOSFET and a drain of the second MOSFET;
an insulating film formed over the main surface of the semiconductor substrate and covering the first source electrode, the second source electrode and the gate electrode;
a first source pad formed of the first source electrode exposed from a first opening portion of the insulating film;
a second source pad formed of the third source electrode exposed from a second opening portion of the insulating film;
a third source pad formed of the second source electrode exposed from a third opening portion of the insulating film; and
a gate pad formed of the gate electrode exposed from a fourth opening portion of the insulating film,
wherein the second MOSFET is an element for detecting a current flowing to the first MOSFET,
wherein the second region is an area which is smaller than the first region on the main surface of the semiconductor substrate,
wherein the first source pad is arranged over the first region,
wherein the second source pad is arranged over a region other than the first region,
wherein the first source pad is a pad for outputting the current flowing to the first MOSFET,
wherein the second source pad is a pad for detecting a source potential of the first MOSFET,
wherein the first source electrode has a slit, and
wherein at least a part of the slit is arranged between a connection portion between the first wiring and the first source electrode and the first source pad when seen in a plan view.
10. The semiconductor device according to claim 9 ,
wherein a shortest path between the connection portion and the first source pad is blocked by the slit when seen in a plan view.
11. A semiconductor device comprising:
a semiconductor substrate;
a first MOSFET formed in a first region of a main surface of the semiconductor substrate;
a second MOSFET formed in a second region of the main surface of the semiconductor substrate;
a current detection circuit unit formed in a third region of the main surface of the semiconductor substrate;
a first source electrode formed over the first region and electrically connected to a source of the first MOSFET;
a drain electrode formed on a back surface on an opposite side of the main surface of the semiconductor substrate and electrically connected to a drain of the first MOSFET and a drain of the second MOSFET;
an insulating film formed over the main surface of the semiconductor substrate and covering the first source electrode; and
a first source pad formed of the first source electrode exposed from a first opening portion of the insulating film,
wherein the drains the first MOSFET and the second MOSFET are electrically connected to each other, and gates thereof are electrically connected to each other,
wherein the second MOSFET is an element for detecting a current flowing to the first MOSFET,
wherein the second region is an area which is smaller than the first region on the main surface of the semiconductor substrate,
wherein the first source pad is a pad for outputting the current flowing to the first MOSFET and is arranged over the first region,
wherein the current detection circuit unit is a circuit for detecting a current flowing to the second MOSFET,
wherein the first source electrode is electrically connected to the current detection circuit unit via a first wiring,
wherein a source of the second MOSFET is electrically connected to the current detection circuit unit,
wherein the first source electrode has a slit, and
wherein at least a part of the slit is arranged between a connection portion between the first wiring and the first source electrode and the first source pad when seen in a plan view.
12. The semiconductor device according to claim 11 ,
wherein a shortest path between the connection portion and the first source pad is blocked by the slit when seen in a plan view.
13. The semiconductor device according to claim 11 ,
wherein the current detection circuit unit includes a differential amplifier,
wherein the first source electrode is electrically connected to a first input node of the differential amplifier of the current detection circuit unit via the first wiring, and
wherein the source of the second MOSFET is electrically connected to a second input node of the differential amplifier of the current detection circuit unit.