Wafer holder and method for manufacturing the same
A wafer holder 10 includes a resin adhesive layer 16 between a ceramic electrostatic chuck 12 and a metal cooling plate 14 . The adhesive layer 16 includes a first layer 16 a in contact with the electrostatic chuck 12 , a second layer 16 b in contact with the cooling plate 14 , and an intermediate layer 16 c located between the first layer 16 a and the second layer 16 b . Heat resistance of each of the first layer 16 a and the intermediate layer 16 c is higher than heat resistance of the second layer 16 b , flexibility of the second layer 16 b is higher than flexibility of each of the first layer 16 a and the intermediate layer 16 c , and the layers are in hermetic contact with each other.
1. A wafer holder comprising a resin adhesive layer between a ceramic electrostatic chuck and a metal cooling plate,
wherein the adhesive layer includes a first layer in contact with the electrostatic chuck, a second layer in contact with the cooling plate, and an intermediate layer located between the first layer and the second layer, heat resistance of each of the first layer and the intermediate layer is higher than heat resistance of the second layer, flexibility of the second layer is higher than flexibility of each of the first layer and the intermediate layer, and the layers are in hermetic contact with each other.
2. The wafer holder according to claim 1 ,
wherein a modulus of elasticity of the second layer at room temperature is smaller than a modulus of elasticity of each of the first layer and the intermediate layer.
3. The wafer holder according to claim 1 ,
wherein the second layer is an epoxy-acryl mixed resin layer and has a shear modulus of elasticity Z (MPa) at room temperature satisfying 0.048≤Z≤2.350.
4. The wafer holder according to claim 1 ,
wherein the first layer and the intermediate layer are each a polyimide resin layer, an epoxy resin layer, or a PEEK resin layer exhibiting heat resistance at 200° C., and
the second layer is an epoxy-acryl mixed resin layer.
5. The wafer holder according to claim 4 ,
wherein the first layer and the intermediate layer are each a polyimide resin layer, an epoxy resin layer, or a PEEK resin layer exhibiting heat resistance at 250° C.
6. The wafer holder according to claim 1 ,
wherein a thickness of the second layer is smaller than a total thickness of the first layer and the intermediate layer and is 150 to 400 μm.
7. A method for manufacturing the wafer holder according to claim 1 , comprising
forming a layer of first layer precursor, which becomes the first layer through thermal curing, on one surface of the electrostatic chuck, forming a layer of second layer precursor, which becomes the second layer through thermal curing, on one surface of the cooling plate, forming a laminate by sandwiching a thermally cured flat resin sheet, which corresponds to the intermediate layer, between the layer of first layer precursor on the electrostatic chuck and the layer of second layer precursor on the cooling plate, and thermally curing the layer of first layer precursor and the layer of second layer precursor by putting the laminate into a bag, decompressing the inside of the bag, and pressurizing and heating the bag from the outside.
8. The method for manufacturing the wafer holder, according to claim 7 ,
wherein the layer of second layer precursor is a layer of an adhesive material containing (A) an epoxy resin capable of performing hydrogen transfer polyaddition, (B) a polymer of acrylic acid ester or methacrylic acid ester, and (C) a curing agent.