Scanning probe and electron microscope probes and their manufacture
Methods are described for the economical manufacture of Scanning Probe and Electron Microscope (SPEM) probe tips. In this method, multiple wires are mounted on a stage and ion milled simultaneously while the stage and mounted probes are tilted at a selected angle relative to the ion source and rotated. The resulting probes are also described. The method provides sets of highly uniform probe tips having controllable properties for stable and accurate scanning probe and electron microscope (EM) measurements.
1. A method of making SPEM probes, comprising:
mounting a plurality of wire pieces to a rotatable stage;
wherein an evacuation chamber houses an ion beam, the stage, and the plurality of wires;
wherein the plurality of wires have lengths of 0.5 cm to 3.0 cm;
rotating the stage with mounted wire pieces and simultaneously milling the wires with an ion beam having an ion energy in the range of 1 to 3500 eV to produce the probe tips mounted to the stage;
wherein the rotating stage has an axis of rotation;
wherein the angle between the axis of rotation and the ion beam is from 5° to 70°;
where the angle is defined with respect to the axis of rotation such that 0° is defined to be the angle if the ion beam originates from directly above the stage and is parallel to the axis of rotation;
and removing the wires from the stage.
2. The method of claim 1 wherein the ion beam comprises Ar ions.
3. The method of claim 1 wherein the angle between the axis of rotation and the ion beam is from 15° to 65°.
4. The method of claim 1 wherein the angle between the axis of rotation and the ion beam is from 45° to 65°.
5. The method of claim 1 wherein the wire pieces mounted to stage are not subjected to electropolishing prior to milling.
6. The method of claim 1 wherein the plurality of wire pieces are tungsten wires.
7. The method of claim 1 wherein the plurality of wire pieces comprise a material selected from the group consisting of beryllium copper (Be—Cu) alloy, platinum (Pt), iridium (Ir), platinum-iridium (Pt—Ir) alloy, tungsten (W), tungsten-rhenium (W—Re) alloy, palladium (Pd), palladium alloy, gold (Au), Pd along with small percentages of Ag, Au, Pt, Cu, and Zn, and Pd alloys with Pd, Ag, and Cu.
8. The method of claim 1 wherein the plurality of wires have a diameter between 0.15 mm and 1.00 mm.
9. The method of claim 1 wherein the plurality of wires have a length in the range of 1.5 to 2.5 cm.
10. The method of claim 1 wherein the wire pieces mounted to stage are subjected to electropolishing prior to milling.
11. A method of making SPEM probes, comprising:
mounting a plurality of wire pieces to a rotatable stage;
wherein the plurality of wire pieces are tungsten wires comprising a coating of HfB 2 ;
rotating the stage with mounted wire pieces and simultaneously milling the wires with an ion beam having an ion energy in the range of 1 to 3500 eV to produce the probe tips mounted to the stage;
wherein the rotating stage has an axis of rotation;
wherein the angle between the axis of rotation and the ion beam is from 5° to 70°;
where the angle is defined with respect to the axis of rotation such that 0° is defined to be the angle if the ion beam originates from directly above the stage and is parallel to the axis of rotation.
12. The method of claim 11 wherein the ion beam has an ion energy in the range of 500 eV to 2500 eV.
13. A method of making SPEM probes, comprising:
providing a broad beam ion source that generates an ion beam;
mounting a plurality of wire pieces to a rotatable stage;
providing an evacuation chamber housing the ion beam, stage and plurality of wires;
wherein the plurality of wires comprises a batch of 5 to 10,000 wire pieces;
wherein the stage is rotated at a rate of 1 to 100 rpm; and
rotating the stage with mounted wire pieces and simultaneously milling the wires with the ion beam having an ion energy in the range of 100 eV to 3500 eV to produce the probe tips mounted to the stage;
wherein the rotating stage has an axis of rotation;
wherein the angle between the axis of rotation and the ion beam is from 5° to 70°;
where the angle is defined with respect to the axis of rotation such that 0° is defined to be the angle if the ion beam originates from directly above the stage and is parallel to the axis of rotation.
14. The method of claim 13 wherein the ion flux from the source is in the range of 10 14 to 10 17 ions/cm 2 s; wherein the ion beam has an ion energy in the range of 1000 eV to 2000 eV; wherein the ion beam is conducted with a current density of 0.2 to 0.8 mA/cm 2 ; and wherein the exposure to the ion beam is conducted for 30 minutes to 120 minutes.
15. The method of claim 14 wherein at the end of the exposure the wires are removed from the stage and wherein at least 80% of the individual probes have the following features: a single tip on each probe body having cone angles of 5° to 30°, and a diameter of curvature in the range of 15 to 30 nm.
16. The method of claim 13 wherein the plurality of wires have a diameter between 0.15 mm and 1.00 mm and a length in the range of 0.5 to 3.0 cm.
17. The method of claim 13 wherein the angle between the axis of rotation and the ion beam is from 15° to 65°.
18. The method of claim 13 wherein the angle between the axis of rotation and the ion beam is from 40° to 55°.
19. The method of claim 13 wherein the ions in the ion beam are obtained from neon, argon, or krypton gases, or mixtures of these gases.
20. The method of claim 13 wherein the ion beam has an ion energy in the range of 500 eV to 2500 eV.