Beam processor
A beam processor for processing a work surface of a workpiece W by irradiating the work surface with a beam, includes: an output source for outputting the beam, a beam moving device for moving the beam output from the output source; and a plurality of reflectors disposed on an optical path of the beam between the beam moving device and the work surface for reflecting the beam moved by the beam moving device and conducting the beam to the work surface, wherein the plurality of reflectors is inclined a predetermined angle corresponding to an incident direction of the beam so that the beam moved by the beam moving device is conducted nearly vertically to a different position of the work surface.
1. A beam processor for processing a work surface of a workpiece by irradiating the work surface with a beam, comprising:
an output source for outputting the beam;
a beam moving means having a mirror for moving the beam output from the output source; and
a plurality of reflectors disposed on an optical path of the beam between the beam moving means and the work surface for reflecting the beam moved by the beam moving means and conducting the beam to the work surface, wherein
the plurality of reflectors is inclined a predetermined angle corresponding to an incident direction of the beam so that the beam moved by the beam moving means is conducted nearly vertically to a different position of the work surface, the plurality of reflectors is disposed at positions where each optical path length from the output source to the work surface via the plurality of reflectors is nearly the same, an effective width Lw of each of the reflectors is determined by an equation using a deflecting angle Ra of the beam relative to a rotating center of the mirror, a distance R from the rotating center to the center of one of the reflectors, an angle La of the beam incident to the center of one of the reflectors based on the work surface, a beam diameter φLB of the beam:
Lw= 2 R ·sin((π/2+ La−Ra )/2)·sin Ra+φLB
2. The beam processor according to claim 1 , further comprising:
a processing pattern forming means disposed between the plurality of reflectors and the work surface for forming a processing pattern of the beam radiated onto the work surface.
3. The beam processor according to claim 1 , further comprising:
a plurality of distribution reflectors disposed between the beam moving means and the plurality of reflectors for reflecting the beam moved by the beam moving means and distributing the beam to the plurality of reflectors.
4. The beam processor according to claim 1 , further comprising:
an objective lens disposed between the plurality of reflectors and the work surface.
5. The beam processor according to claim 4 , further comprising:
a lens moving means for moving the objective lens along the work surface; and
a position control means for controlling the lens moving means and controlling a position of a focal point of the beam on the work surface.
6. The beam processor according to claim 1 , further comprising:
a control beam radiating means for radiating the work surface with a control beam with the same axis as the beam;
a control beam detecting means for detecting the control beam reflected by the work surface; and
a beam control means for controlling at least one of a radiation position of the beam on the work surface and an output of the beam on the basis of the control beam detected by the control beam detecting means.
7. The beam processor according to claim 1 , further comprising:
a camera for taking an image of the work surface; and
a beam control means for controlling a radiation position of the beam on the work surface on the basis of the image taken by the camera.