IP Library Granted Patent US 10,109,760
Granted Patent B2
US 10,109,760 · App. 15/095,001 · Granted Oct 23, 2018

Eliminating emissive sub-bandgap states in nanocrystals

Inventors: Gyuweon Hwang (Cambridge, MA); Donghun Kim (Cambridge, MA); Jose M. Cordero (Cambridge, MA); Mark W. B. Wilson (Somerville, MA); Chia-Hao M. Chuang (Cambridge, MA); Jeffrey C. Grossman (Brookline, MA); Moungi G. Bawendi (Cambridge, MA)
Assignee: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
H01L31/18H01L31/036H01L31/0324H01L31/035218H01L31/0445H01L51/0001H01L51/0077H01L51/42
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Quick Facts
Patent No.
US 10,109,760
App. No.
15/095,001
Granted
Oct 23, 2018
Kind
B2
Abstract

The size-dependent band-gap tunability and solution processability of nanocrystals (NCs) make them attractive candidates for optoelectronic applications. One factor that presently limits the device performance of NC thin films is sub-bandgap states, also referred to as trap states. Trap states can be controlled by surface treatment of the nanocrystals.

Claims (23)

1. A method of modifying a surface of nanocrystal including contacting a surface of the nanocrystal with an oxidizing agent, wherein the nanocrystal is a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, or a Group II-IV-V compound,

treating the surface with the oxidizing agent until a density of trap states for the nanocrystal having the oxidized surface compared to the nanocrystal having an untreated surface is reduced by at least 20-fold and

removing under-charged atoms on the surface.

2. The method of claim 1 , wherein the nanocrystal includes Pb.

3. The method of claim 1 , wherein the nanocrystal includes S.

4. The method of claim 1 , wherein the nanocrystal includes Se.

5. The method of claim 1 , wherein the oxidizing agent is selected from the group consisting of 1, 4-benzoquinone, dithiothreitol, 2,3-dichloro-5,6-dicyanobenzoquinone, 3,3′,5,5′-tetra-tert-butyldiphenoquinone, di-tert-butyl peroxide, I 2 , I 2 /I − (I 3 − ), chlorine gas, bromine, ozone, O 2 plasma treatment, and an acid, or combinations thereof.

6. The method of claim 1 , wherein the oxidizing agent is pyruvic acid and the method includes annealing.

7. The method of claim 1 , wherein contacting a surface of the nanocrystal with the oxidizing agent to oxidize metal atom of the nanocrystal atoms at the surface.

8. A method of treating a film that includes nanocrystal comprising contacting a surface of the nanocrystal with an oxidizing agent, wherein the nanocrystal is a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, or a Group II-IV-V compound,

forming a modified surface in which a density of trap states for the nanocrystal having the oxidized surface compared to the nanocrystal having an untreated surface is reduced by at least 20-fold and

removing under-charged atoms on the film with the oxidizing agent.

9. The method of claim 8 , wherein the nanocrystal includes Pb.

10. The method of claim 8 , wherein the nanocrystal includes S.

11. The method of claim 8 , wherein the nanocrystal includes Se.

12. The method of claim 8 , wherein the oxidizing agent is selected from the group consisting of 1, 4-benzoquinone, dithiothreitol, 2,3-dichloro-5,6-dicyanobenzoquinone, 3,3′,5,5′-tetra-tert-butyldiphenoquinone, di-tert-butyl peroxide, I 2 , I 2 /I − (I 3 − ), chlorine gas, bromine, ozone, O 2 plasma treatment, and an acid, or combinations thereof.

13. The method of claim 8 , wherein the oxidizing agent is pyruvic acid and the method includes annealing.

14. The method of claim 8 , wherein contacting a surface of the nanocrystal with the oxidizing agent to oxidize metal atom of the nanocrystal atoms at the surface.

15. The method of claim 8 , wherein contacting the surface of the nanocrystal with the oxidizing agent is dispensing the oxidizing agent onto the film.

16. The method of claim 1 , wherein the oxidizing agent is selected from the group consisting of H 2 SO 4 , HNO 3 , 1, 4-benzoquinone, dithiothreitol, 2,3-dichloro-5,6-dicyanobenzoquinone, 3,3′,5,5′-tetra-tert-butyldiphenoquinone, di-tert-butyl peroxide, I 2 , I 2 /I − (I 3 − ), and pyruvic acid.

17. The method of claim 8 , wherein the oxidizing agent is selected from the group consisting of H 2 SO 4 , HNO 3 , 1, 4-benzoquinone, dithiothreitol, 2,3-dichloro-5,6-dicyanobenzoquinone, 3,3′,5,5′-tetra-tert-butyldiphenoquinone, di-tert-butyl peroxide, I 2 , I 2 /I − (I 3 − ), and pyruvic acid.

18. The method of claim 1 , wherein the oxidizing agent is selected from the group consisting of 1, 4-benzoquinone, dithiothreitol, 2,3-dichloro-5,6-dicyanobenzoquinone, 3,3′,5,5′-tetra-tert-butyldiphenoquinone, di-tert-butyl peroxide, I 2 , I 2 /I − (I 3 − ), bromine, ozone, and an acid, or combinations thereof.

19. The method of claim 8 , wherein the oxidizing agent is selected from the group consisting of 1, 4-benzoquinone, dithiothreitol, 2,3-dichloro-5,6-dicyanobenzoquinone, 3,3′,5,5′-tetra-tert-butyldiphenoquinone, di-tert-butyl peroxide, I 2 , I 2 /I − (I 3 − ), bromine, ozone, and an acid, or combinations thereof.

Assignments (2)
CONFIRMATORY LICENSE Recorded Jun 5, 2020
From: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 052855/0609 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 19, 2018
From: HWANG, GYUWEON; KIM, DONGHUN; CORDERO, JOSE M.; WILSON, MARK W.B.; CHUANG, CHIA-HAO M.; GROSSMAN, JEFFREY C.; BAWENDI, MOUNGI G.
To: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
Reel/Frame 046591/0830 →
Continuity (2)
Provisional Application 62145373 · Apr 9, 2015
Related Publication 20160336477A1 · Nov 17, 2016