Nanostructured material and method of making the same
Nanostructured material exhibiting a random anisotropic nanostructured surface, and exhibiting an average reflection at 60 degrees off angle less than 1 percent. The nanostructured materials are useful, for example, for optical and optoelectronic devices, displays, solar, light sensors, eye wear, camera lens, and glazing.
1. A method of making a nanostructured layer comprising a polymeric matrix and a nanoscale dispersed phase, the layer having a random anisotropic nanostructured surface, the random anisotropic nanostructured surface having an average reflection at 60 degrees off angle less than 1 percent, the layer having a thickness of at least 500 nm, and the layer having a visible light transmission through the thickness of the layer at 90 degrees to the random anisotropic nanostructured surface of at least 94 percent, the method comprising:
providing the polymeric matrix comprising the nanodispersed phase; and
anisotropically etching the polymeric matrix using plasma to form the random nanostructured surface.
2. A method of making a nanostructured layer comprising a polymeric matrix and a nanoscale dispersed phase, the layer having a random anisotropic nanostructured surface, the random anisotropic nanostructured surface having an average reflection at 60 degrees off angle less than 1 percent, the layer having a thickness of at least 500 nm, and the layer having a visible light transmission through the thickness of the layer at 90 degrees to the random anisotropic nanostructured surface of at least 94 percent, the method comprising:
providing the polymeric matrix comprising the nanodispersed phase; and
etching at least a portion of the polymeric matrix using plasma to form the random nanostructured surface.
3. The method of claim 1 , wherein the nanoscale phase is present in a range from 60 nm to 90 nm in size, in a range from 30 nm to 50 nm in size, and less than 25 nm in size, and wherein the nanoscale phase is present in a range from 0.25 wt. % to 50 wt. % for sizes in the range from 60 nm to 90 nm, 1 wt. % to 50 wt. % for sizes in a range from for sizes in the range from 30 nm to 50 nm, and 0.25 wt. % to 25 wt. % for sizes less than 25 nm, based on the total weight of the polymeric matrix and nanoscale phase.
4. The method of claim 1 , wherein the nanoscale phase is present in a range from 60 nm to 90 nm in size, in a range from 30 nm to 50 nm in size, and less than 25 nm in size, and wherein the nanoscale phase is present in the range from 0.1 vol. % to 35 vol. % for sizes in the range from 60 nm to 90 nm, 0.1 vol. % to 25 vol. % for sizes in a range from 30 nm to 50 nm, and 0.1 vol. % to 10 vol. % for sizes less than 25 nm, based on the total volume of the polymeric matrix and nanoscale phase.
5. The method of claim 1 , wherein the nanoscale phase comprises submicrometer particles.
6. The method of claim 1 , wherein the submicrometer particles are covalently bonded to the polymeric matrix.
7. The method of claim 2 , wherein the nanoscale phase is present in a range from 60 nm to 90 nm in size, in a range from 30 nm to 50 nm in size, and less than 25 nm in size, and wherein the nanoscale phase is present in a range from 0.25 wt. % to 50 wt. % for sizes in the range from 60 nm to 90 nm, 1 wt. % to 50 wt. % for sizes in a range from for sizes in the range from 30 nm to 50 nm, and 0.25 wt. % to 25 wt. % for sizes less than 25 nm, based on the total weight of the polymeric matrix and nanoscale phase.
8. The method of claim 2 , wherein the nanoscale phase is present in a range from 60 nm to 90 nm in size, in a range from 30 nm to 50 nm in size, and less than 25 nm in size, and wherein the nanoscale phase is present in the range from 0.1 vol. % to 35 vol. % for sizes in the range from 60 nm to 90 nm, 0.1 vol. % to 25 vol. % for sizes in a range from 30 nm to 50 nm, and 0.1 vol. % to 10 vol. % for sizes less than 25 nm, based on the total volume of the polymeric matrix and nanoscale phase.
9. The method of claim 2 , wherein the nanoscale phase comprises submicrometer particles.
10. The method of claim 2 , wherein the submicrometer particles are covalently bonded to the polymeric matrix.