MEMs frame heating platform for electron imagable fluid reservoirs or larger conductive samples
A heating device having a heating element patterned into a robust MEMs substrate, wherein the heating element is electrically isolated from a fluid reservoir or bulk conductive sample, but close enough in proximity to an imagable window/area having the fluid or sample thereon, such that the sample is heated through conduction. The heating device can be used in a microscope sample holder, e.g., for SEM, TEM, STEM, X-ray synchrotron, scanning probe microscopy, and optical microscopy.
1. A device comprising: (a) at least one observation region, (b) a thermally conductive structural frame which supports and flanks the observation region, and (c) at least one heat source element supported by the thermally conductive structural frame, wherein the at least one heat source element flanks but does not contact the at least one observation region, and wherein the thermally conductive structural frame is heated by the at least one heat source element.
2. The device of claim 1 , wherein the at least one observation region comprises at least one membrane, wherein the at least one membrane comprises one or more holes, comprises thinned dimples, or is a continuous membrane that is supported by the thermally conductive structural frame.
3. The device of claim 1 , wherein the at least one heat source element is electrically insulated from the thermally conductive structural frame by a dielectric layer positioned therebetween.
4. The device of claim 1 , wherein the at least one heat source element comprises a covering dielectric to electrically insulate the at least one heat source element from any one or more environmental conditions selected from the group consisting of liquid content, gas content and external supports.
5. The device of claim 1 , wherein the at least one heat source element is electrically insulated from the thermally conductive structural frame by a dielectric layer positioned therebetween and wherein the at least one heat source element comprises a covering dielectric to electrically insulate the heat source element(s) from any one or more environmental conditions selected from the group consisting of liquid content, gas content or external supports.
6. The device of claim 1 , where the at least one heat source element comprises at least one material selected from the group consisting of tungsten, platinum, tantalum, rhenium, molybdenum, titanium, nichrome, kanthal, cupronickel, polysilicon, silicide, silicon carbide, titanium carbide, molybdenum disilicide, molybdenum carbide, tungsten carbide, tungsten nitride, tantalum nitride, boron nitride, FeCrAl, NiCr, titanium silicide, tantalum silicide, cobalt silicide, titanium nitride, and aluminum nitride.
7. The device of claim 1 , wherein the thermally conductive structural frame heats the at least one observation region by thermal energy.
8. The device of claim 1 , further comprising at least two exposed conductive contacts that can be connected to a source of electricity.
9. The device of any one of claims 1 - 8 , wherein the at least one heat source element is positioned on the same side of the thermally conductive structural frame as the at least one observation region.
10. The device of any one of claims 1 - 8 , wherein the at least one heat source element is positioned on an opposite side of the thermally conductive structural frame as the at least one observation region.
11. The device of claim 1 , wherein the thickness of at least one observation region is in a range from about 0.00001 μm to about 1 μm.
12. The device of claim 4 , wherein the covering dielectric covers the entire device except over the at least one observation region.
13. The device of claim 4 , wherein the covering dielectric covers just the at least one heat source element, wherein the at least one heat source element is positioned around the perimeter of the device.
14. The device of claim 5 , wherein:
the dielectric layer comprises the same material as the covering dielectric;
the dielectric layer comprises a different material than the covering dielectric; or
the dielectric layer comprises the same material as the covering dielectric, and the dielectric layer and the covering dielectric have at least one of a different porosity and a different density.
15. A microscope device comprising the device of claim 1 mounted in a manner which permits microscopic imaging of a sample on the device wherein the at least one heat source element is coupled to a source of electricity.
16. A method of imaging a sample at one or more temperatures using an in situ microscope device, the method comprising providing the device of claim 15 , positioning the sample at the observation region, and controlling heating by the at least one heat source element during imaging.
17. An environmental cell comprising the device of claim 1 configured to permit control of: (a) heating of a sample on the observation region of the device through conduction from the thermally conductive structural frame; and (b) heating of one or more environmental conditions of the sample on the observation region of the device, wherein at least one of the one or more environmental conditions is selected from the group consisting of liquid content and gas content.
18. The environmental cell of claim 17 , further comprising at least one of a MEMS heating device and a window device.
19. The environmental cell of claim 17 , comprising at least one external thermal sensor to measure the at least one of the one or more environmental conditions.
20. The environmental cell of claim 19 , wherein the at least one external thermal sensor is a thermocouple or RTD sensor placed in proximity to the device.