Systems, methods, and apparatus for improved finFETs
To avoid the problems associated with low density spin on dielectrics, some examples of the disclosure include a finFET with an oxide material having different densities. For example, one such finFET may include an oxide material located in a gap between adjacent fins, the oxide material directly contacts the adjacent fins of the plurality of fins with a first density proximate to a top layer of the oxide material and a second density proximate to a bottom layer of the oxide material and wherein the first density is greater than the second density.
1. A finFET comprising:
a plurality of fins separated from each other to form a plurality of gaps between adjacent fins of the plurality of fins;
an oxide material located in the plurality of gaps, the oxide material directly contacts the adjacent fins of the plurality of fins with a first density proximate to a top layer of the oxide material and a second density proximate to a bottom layer of the oxide material; and
wherein the first density is greater than the second density.
2. The finFET of claim 1 , wherein the oxide material has a first ion concentration near the top layer of the oxide material that is greater than a second ion concentration near the bottom layer of the oxide material.
3. The finFET of claim 2 , wherein ions of the first ion concentration are one of a silicon ions, carbon ions, nitrogen ions, fluorine ions, or helium ions.
4. The finFET of claim 1 , further comprising a plurality of gate structures, one of the plurality of gate structures surrounding each of the plurality of fins, and wherein a portion of the oxide material is located under each of the plurality of gate structures.
5. The finFET of claim 4 , further comprising:
a source proximate to the plurality of gate structures; and
a drain proximate to the plurality of gate structures opposite the source.
6. The finFET of claim 1 , wherein the finFET is incorporated into a device selected from a group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle, and further including the device.
7. A finFET comprising:
a silicon substrate;
a plurality of fins on a surface of the silicon substrate;
an oxide material on the surface of the silicon substrate, the oxide material located between each of the plurality of fins and directly contacts the plurality of fins, wherein the oxide material has a first density that directly contacts the plurality of fins and a second density that directly contacts the plurality of fins, the second density is lesser than the first density; and
a plurality of gate structures, each of the plurality of gate structures located on the oxide material and surrounds a respective one of the plurality of fins.
8. The finFET of claim 7 , wherein the oxide material has a first ion concentration proximate to the plurality of gate structures that is greater than a second ion concentration proximate to the silicon substrate.
9. The finFET of claim 8 , wherein ions of the first ion concentration are one of a silicon ions, carbon ions, nitrogen ions, fluorine ions, or helium ions.
10. The finFET of claim 9 , further comprising:
a source proximate to the plurality of gate structures; and
a drain proximate to the plurality of gate structures opposite the source.
11. The finFET of claim 10 , wherein the finFET is incorporated into a device selected from a group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle, and further including the device.
12. A finFET comprising:
first means for conducting current;
second means for conducting current separated from the first means for conducting current to form a gap between the first means for conducting current and the second means for conducting current;
means for isolation located in the gap and on each side of both the first means for conducting current and the second means for conducting current, the means for isolation directly contacts the first means for conducting current and the second means for conducting current with a first density proximate to a top layer of the means for isolation and a second density proximate to a bottom layer of the means for isolation; and
wherein the first density is greater than the second density.
13. The finFET of claim 12 , wherein the means for isolation has a first ion concentration near the top layer of the means for isolation that is greater than a second ion concentration near the bottom layer of the means for isolation.
14. The finFET of claim 13 , wherein ions of the first ion concentration are one of a silicon ions, carbon ions, nitrogen ions, fluorine ions, or helium ions.
15. The finFET of claim 12 , further comprising a plurality of gate structures, one of the plurality of gate structures surrounding each of the first means for conducting current and the second means for conducting current, and wherein a portion of the means for isolation is located under each of the plurality of gate structures.
16. The finFET of claim 15 , further comprising:
a source proximate to the plurality of gate structures; and
a drain proximate to the plurality of gate structures opposite the source.
17. The finFET of claim 12 , wherein the finFET is incorporated into a device selected from a group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle, and further including the device.