Stacked semiconductor chip RGBZ sensor
An apparatus is described that includes a first semiconductor chip having a first pixel array. The first pixel array has visible light sensitive pixels. The apparatus includes a second semiconductor chip having a second pixel array. The first semiconductor chip is stacked on the second semiconductor chip such that the second pixel array resides beneath the first pixel array. The second pixel array has IR light sensitive pixels for time-of-flight based depth detection.
1. A method comprising:
forming a backside illumination pixel array including (i) pixels of a first type, and, (ii) for each pixel, a light guide structure between the pixel and a front side surface of the backside illumination pixel array;
forming a front side illumination pixel array including (i) pixels of a second type, and, (ii) for each pixel, a light guide structure between the pixel and a front side surface of the front side pixel array; and
stacking the backside illumination pixel array on the front side illumination pixel array.
2. The method of claim 1 , wherein:
the pixels of the first type comprise visible light sensitive pixels, and
the pixels of the second type comprise infrared light sensitive pixels.
3. The method of claim 1 , wherein the pixels of the second type are larger than the pixels of the first type.
4. The method of claim 1 , comprising coupling corresponding light guide structures of the backside illumination pixel array and the front side illumination pixel array to allow incident light that passes through the pixels of the first type in the backside illumination pixel array to flow to the pixels of the second type in the front side pixel array.
5. The method of claim 1 , wherein the pixels of the first type absorb light of the first type and allow light of the second type to pass through.
6. The method of claim 1 , wherein the front side illumination pixel array is formed to be thicker than the backside illumination pixel array.
7. The method of claim 1 , wherein forming the backside illumination pixel array comprises:
forming a semiconductor die layer; and
forming a front side metallization layer.
8. The method of claim 1 , wherein forming the front side illumination pixel array comprises:
forming a semiconductor die layer; and
forming an interconnect metallization layer.
9. The method of claim 1 , wherein forming the backside illumination pixel array comprises:
depositing conductive traces in an area around the pixels rather than over the pixels themselves.
10. The method of claim 1 , wherein forming the backside illumination pixel array comprises etching the light guide structure through stacked dielectric layers dispose over the pixels to form trenches.
11. The method of claim 10 , wherein forming the backside illumination pixel array comprises filling the trenches with a material that includes a high index of refraction and that is transparent to infrared light.
12. The method of claim 1 , wherein forming the backside illumination pixel array comprises etching an annulus structure around a periphery of the light guide structure to form an etched region or air gap.
13. The method of claim 12 , wherein forming the backside illumination pixel array comprises filling the etched region with metal.
14. The method of claim 1 , wherein stacking the backside illumination pixel array on the front side illumination pixel array comprises affixing the backside illumination pixel array to the front side illumination pixel array using a wafer-on-wafer semiconductor chip attach process.
15. The method of claim 1 , wherein stacking the backside illumination pixel array on the front side illumination pixel array comprises affixing the backside illumination pixel array to the front side illumination pixel array using a die-on-die semiconductor chip attach process.
16. The method of claim 1 , comprising, after the backside illumination pixel array is stacked on the front side illumination pixel array, etching the stacked pixel arrays at different depths, to form etched regions.
17. The method of claim 16 , wherein the stacked pixel arrays are etched using a reactive iron etch.
18. The method of claim 16 , wherein the stacked pixel arrays are etched using a deep reactive iron etch.
19. The method of claim 16 , comprising filling the etched regions with a conductive materials.
20. The method of claim 1 , comprising, after the backside illumination pixel array is stacked on the front side illumination pixel array, forming a filtering layer over the backside illumination pixel array.