IP Library › Granted Patent US 10,141,410
Granted Patent B2
US 10,141,410 · App. 15/387,149 · Granted Nov 27, 2018

Semiconductor device, method for manufacturing semiconductor device, inverter circuit, driving device, vehicle and elevator

Inventor: Tatsuo Shimizu (Shinagawa, JP)
Assignee: Kabushiki Kaisha Toshiba
H01L29/1608H01L21/02529H01L21/324H01L29/045H01L29/0619H01L29/167H01L29/36H01L29/47H01L29/6606H01L29/66143H01L29/872
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Quick Facts
Patent No.
US 10,141,410
App. No.
15/387,149
Granted
Nov 27, 2018
Kind
B2
Abstract

A semiconductor device according to an embodiment includes an n-type SiC region, an electrode in contact with the SiC region, and a region including oxygen, the region provided in the SiC region, the region being provided on an electrode side of the SiC region.

Claims (28)

1. A semiconductor device, comprising:

an n-type SiC region;

an electrode in contact with the n-type SiC region; and

a region including oxygen, the region provided in the n-type SiC region, the region being provided adjacent to the electrode, the region being SiC.

2. The device according to claim 1 ,

wherein an oxygen concentration of the region is equal to or greater than 1×10 16 cm −3 and equal to or less than 1×10 21 cm −3 .

3. The device according to claim 1 ,

wherein the electrode includes metal.

4. The device according to claim 3 ,

wherein the metal is nickel (Ni), titanium (Ti), or molybdenum (Mo).

5. The device according to claim 1 ,

wherein a distance between the electrode and a position of a vertex of a peak of a concentration distribution of oxygen in the region is equal to or less than 10 nm.

6. The device according to claim 1 ,

wherein a full width at half maximum of a peak of a concentration distribution of oxygen in the region is equal to or less than 10 nm.

7. The device according to claim 1 ,

wherein a Si—O—Si bond is present in the region.

8. The device according to claim 1 ,

wherein the region includes a pair of oxygen positioned in a carbon site of SiC lattice.

9. The device according to claim 1 ,

wherein an n-type impurity concentration of the n-type SiC region is equal to or greater than 1×10 15 cm −3 and equal to or less than 1×10 18 cm −3 .

10. An inverter circuit comprising:

the semiconductor device according to claim 1 .

11. A driving device comprising:

the semiconductor device according to claim 1 .

12. A vehicle comprising:

the semiconductor device according to claim 1 .

13. An elevator comprising:

the semiconductor device according to claim 1 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 7, 2017
From: SHIMIZU, TATSUO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 041188/0766 →
Priority Claims (1)
JP 2016-003643 · Jan 12, 2016 · national
Continuity (1)
Related Publication 20170200787A1 · Jul 13, 2017
Cited By (2)
US 12,527,056 US 12,701,770