IP Library › Granted Patent US 10,157,722
Granted Patent B2
US 10,157,722 · App. 15/195,665 · Granted Dec 18, 2018

Inspection device

Inventors: Masahiro Hatakeyama (Tokyo, JP); Shoji Yoshikawa (Tokyo, JP); Takeshi Murakami (Tokyo, JP); Kenji Watanabe (Tokyo, JP); Yoshihiko Naito (Tokyo, JP); Yasushi Toma (Tokyo, JP); Tsutomu Karimata (Tokyo, JP); Takehide Hayashi (Tokyo, JP); Kiwamu Tsukamoto (Tokyo, JP); Tatsuya Kohama (Tokyo, JP); Noboru Kobayashi (Tokyo, JP)
Assignee: EBARA CORPORATION
H01J37/073G01N23/22G01N23/223G01N23/2251H01J37/09H01J37/10H01J37/20H01J37/222H01J37/265H01J37/28H01J37/29G01N2223/611H01J2237/0048H01J2237/022H01J2237/032H01J2237/038H01J2237/045H01J2237/0458H01J2237/0473H01J2237/0492H01J2237/061H01J2237/06333H01J2237/166H01J2237/186H01J2237/2002H01J2237/2007H01J2237/2008H01J2237/2448H01J2237/2482H01J2237/2485H01J2237/2817H01J2237/2855H01J2237/2857
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Quick Facts
Patent No.
US 10,157,722
App. No.
15/195,665
Granted
Dec 18, 2018
Kind
B2
Abstract

An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Claims (52)

1. A photoelectron generation device comprising:

a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;

a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;

a numerical aperture being passed through by the accelerated photoelectrons;

a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube; wherein the potential of the first tube is a high voltage; and

a second tube covering the first tube and set to the potential as ground;

wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam; and

wherein the numerical aperture has a hole formed therein which is passed through by the accelerated photoelectrons, and the first tube is arranged inside of the hole.

2. The photoelectron generation device according to claim 1 wherein

the lens extracts the photoelectrons generated from the photoelectron surface in the opposite direction from the light source.

3. The photoelectron generation device according to claim 2 further comprising:

a field aperture arranged between the light source and the photoelectron surface, and the field aperture being passed through by the light.

4. The photoelectron generation device according to claim 1 wherein

the light is irradiated to the photoelectron surface from the lens side.

5. The photoelectron generation device according to claim 4 further comprising:

a masking material including a hole part, and coated onto the lens side of the photoelectron surface.

6. The photoelectron generation device according to claim 5 further comprising:

a reflection surface structure reflecting the light passing through the hole part and the photoelectron surface, and arranged so that the reflected light passes through the hole part and the photoelectron surface.

7. The photoelectron generation device according to claim 4 further comprising:

a mirror arranged between the light source and the photoelectron surface, reflecting the light, and including a hole, the photoelectrons passing through the hole.

8. The photoelectron generation device according to claim 1 further comprising:

an aligner arranged between the lens and the numerical aperture.

9. The photoelectron generation device according to claim 1 wherein

the second tube is set to the potential as a potential of the inspection object.

10. The photoelectron generation device according to claim 1 wherein

the light source is arranged on an atmosphere side, and

the photoelectron surface, the lens and the numerical aperture are arranged on a vacuum side.

11. The photoelectron generation device according to claim 1 wherein

the light is a laser.

12. A primary optical system comprising:

the photoelectron generation device according to claim 1 ; and

a lens controlling a size of the primary beam.

13. An inspection device comprising:

a primary optical system including the photoelectron generation device according to claim 1 ;

a secondary optical system including a detector detecting a secondary beam generated from the inspection object irradiated with the primary beam; and

an image processing system forming an image based on the secondary beam detected by the detector.

14. A photoelectron generation device comprising:

a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;

a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;

a numerical aperture being passed through by the accelerated photoelectrons;

a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube; wherein the potential of the first tube is a high voltage; and

a second tube covering the first tube and set to the potential as ground;

wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam;

wherein the lens has a hole formed therein which is passed through by the accelerated photoelectrons, and the first tube is arranged inside of the hole.

15. A photoelectron generation device comprising:

a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;

a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;

a numerical aperture being passed through by the accelerated photoelectrons;

a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube; wherein the potential of the first tube is a high voltage;

a second tube covering the first tube and set to the potential as ground;

wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam; and

a cathode lens arranged between the numerical aperture and the inspection object, wherein the cathode lens is arranged inside of the first tube.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 29, 2016
From: HATAKEYAMA, MASAHIRO; YOSHIKAWA, SHOJI; MURAKAMI, TAKESHI; WATANABE, KENJI; NAITO, YOSHIHIKO; TOMA, YASUSHI; KARIMATA, TSUTOMU; HAYASHI, TAKEHIDE; TSUKAMOTO, KIWAMU; KOHAMA, TATSUYA; KOBAYASHI, NOBORU
To: EBARA CORPORATION
Reel/Frame 039046/0108 →
Priority Claims (3)
JP 2011-057312 · Mar 15, 2011 · national
JP 2011-105751 · May 10, 2011 · national
JP 2012-015875 · Jan 27, 2012 · national
Continuity (3)
Continuation 13946198 · Jul 19, 2013
Continuation 13420731 · Mar 15, 2012
Related Publication 20160307726A1 · Oct 20, 2016