Inductively coupled plasma source
Embodiments of methods and apparatus for plasma processing are provided herein. In some embodiments, an inductively coupled plasma apparatus may include a bottom wall comprising a hub and a ring coupled to the hub by a capacitor, wherein the hub and the ring are each electrically conductive, and where the hub has a central opening aligned with a central axis of the inductively coupled plasma apparatus; a top wall spaced apart from and above the bottom wall, wherein the top wall has a central opening aligned with the central axis, and wherein the tope wall is electrically conductive; a sidewall electrically connecting the ring to the top wall; and a tube electrically connecting the hub to the top wall, the tube having a central opening aligned with the central axis.
1. An inductively coupled plasma apparatus, comprising:
a bottom wall comprising a hub having a plurality of radially outwardly directed spokes and a ring having a corresponding plurality of radially inwardly directed spokes, wherein each radially inwardly directed spoke lies along a common radius as a corresponding one of the plurality of radially outwardly directed spokes, wherein the hub and the ring are each electrically conductive, and wherein the hub has a central opening aligned with a central axis of the inductively coupled plasma apparatus;
a plurality of capacitors, one each disposed between and coupling respective ends of each radially outwardly directed spoke and corresponding radially inwardly directed spoke;
a top wall spaced apart from and above the bottom wall, wherein the top wall has a central opening aligned with the central axis, and wherein the top wall is electrically conductive;
a sidewall electrically connecting the ring to the top wall; and
a tube electrically connecting the hub to the top wall, the tube having a central opening aligned with the central axis.
2. The apparatus of claim 1 , further comprising:
a dielectric plate disposed below the bottom wall and comprising a gas distribution device axially aligned with the tube.
3. The apparatus of claim 2 , further comprising:
a gas conduit fluidly coupled to the gas distribution device and extending through the central openings of the tube and the top wall.
4. The apparatus of claim 1 , wherein at least one of the hub or the ring comprises a heater.
5. The apparatus of claim 1 , further comprising a ferrite core encircling a portion of the tube.
6. The apparatus of claim 1 , further comprising a conductive coil wound about a portion of the tube and coupled to a ground through an electrically conductive portion of the apparatus.
7. The apparatus of claim 6 , wherein the conductive coil is helically wound about a toroidal path encircling the tube.
8. The apparatus of claim 7 , wherein the conductive coil is electrically coupled to ground.
9. The apparatus of claim 7 , wherein the conductive coil is wound about a ferrite core.
10. The apparatus of claim 1 , further comprising:
a primary energy input, a first end of which is electrically bonded to an electrically conductive portion of the apparatus.
11. The apparatus of claim 10 , wherein the primary energy input is electrically bonded to at least one of the tube or the top wall.
12. The apparatus of claim 10 , further comprising:
a conductive coil wound about a portion of the tube and having a first end coupled to the ring or the sidewall, wherein the primary energy input is electrically bonded to a second end of the conductive coil opposite the first end.
13. The apparatus of claim 10 , wherein a second end of the primary energy input is coupled to a power source.
14. An inductively coupled plasma reactor, comprising:
a chamber body having a processing volume; and
an inductively coupled plasma apparatus supported by the chamber body to couple RF energy into the processing volume, comprising:
a bottom wall comprising a hub having a plurality of radially outwardly directed spokes and a ring having a corresponding plurality of radially inwardly directed spokes, wherein each radially inwardly directed spoke lies along a common radius as a corresponding one of the plurality of radially outwardly directed spokes, wherein the hub and the ring are each electrically conductive, and wherein the hub has a central opening aligned with a central axis of the inductively coupled plasma apparatus;
a plurality of capacitors, one each disposed between and coupling respective ends of each radially outwardly directed spoke and corresponding radially inwardly directed spoke;
a top wall spaced apart from and above the bottom wall, wherein the top wall has a central opening aligned with the central axis, and wherein the top wall is electrically conductive;
a sidewall electrically connecting the ring to the top wall;
a tube electrically connecting the hub to the top wall, the tube having a central opening aligned with the central axis;
a dielectric plate disposed below the bottom wall and comprising a gas distribution device axially aligned with the tube;
a gas conduit fluidly coupled to the gas distribution device and extending through the central openings of the tube and the top wall; and
a conductive coil wound about a portion of the tube and coupled to an electrically conductive portion of the apparatus.