IP Library Granted Patent US 10,170,731
Granted Patent B2
US 10,170,731 · App. 15/491,351 · Granted Jan 1, 2019

Mask and masking assembly

Inventors: Bum Mo Ahn (Suwon-si, KR); Seung Ho Park (Hwaseong-si, KR); Sung Hyun Byun (Hwaseong-si, KR)
Assignee: Point Engineering Co., Ltd.
H01L51/56H01L51/0011H01L51/5012
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Quick Facts
Patent No.
US 10,170,731
App. No.
15/491,351
Granted
Jan 1, 2019
Kind
B2
Abstract

A mask for forming a pattern on a substrate is provided. The mask includes an anodic oxide film formed by anodizing metal, at least one transmission hole configured to vertically penetrate the anodic oxide film and formed in a corresponding relationship with the pattern, a plurality of pores formed in the anodic oxide film so as to have a smaller diameter than the transmission hole, and a magnetic material provided in each of the pores.

Claims (18)

1. A mask for forming a pattern on a substrate, comprising:

an anodic oxide film formed by anodizing metal;

at least one transmission hole configured to vertically penetrate the anodic oxide film and formed in a corresponding relationship with the pattern, the at least one transmission hole having a diameter;

a plurality of pores formed in the anodic oxide film so as to have a smaller diameter than the at least one transmission hole; and

a magnetic material provided in each of the pores such that each of the pores is at least partially filled with the magnetic material.

2. The mask of claim 1 , wherein the anodic oxide film includes a porous layer and a barrier layer.

3. The mask of claim 1 , wherein the diameter of the at least one transmission hole is uniform in a vertical direction.

4. The mask of claim 1 , wherein the magnetic material is made of nickel.

5. The mask of claim 1 , wherein the pattern is formed by depositing an organic light emitting material on the substrate covered with the mask.

6. A masking assembly for forming a pattern on a substrate, comprising:

a mask; and

a magnetic plate configured to bring the mask into close contact with the substrate, wherein the mask includes an anodic oxide film formed by anodizing metal, at least one transmission hole configured to vertically penetrate the anodic oxide film and formed in a corresponding relationship with the pattern and having a diameter, a plurality of pores formed in the anodic oxide film so as to have a smaller diameter than the at least one transmission hole, and a magnetic material provided in each of the pores such that each of the pores is at least partially filled with the magnetic material,

wherein the magnetic plate and the magnetic material have such a magnetic property that an attractive force is generated between the magnetic plate and the magnetic material.

7. The masking assembly of claim 6 , wherein the anodic oxide film includes a porous layer and a barrier layer.

8. The masking assembly of claim 6 , wherein the anodic oxide film includes a barrier layer configured to close one end of each of the pores.

9. The masking assembly of claim 6 , wherein the diameter of the at least one transmission hole is uniform in a vertical direction.

10. The masking assembly of claim 6 , wherein the magnetic material is made of nickel.

11. The masking assembly of claim 6 , wherein the pattern is formed by depositing an organic light emitting material on the substrate covered with the mask.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 19, 2017
From: AHN, BUM MO; PARK, SEUNG HO; BYUN, SUNG HYUN
To: POINT ENGINEERING CO., LTD.
Reel/Frame 042305/0984 →
Priority Claims (1)
KR 10-2016-0049146 · Apr 22, 2016 · national
Continuity (1)
Related Publication 20170309868A1 · Oct 26, 2017