Redundant Power Supply System for a plasma process
A power supply system for a plasma process includes two separate power supplies of essentially identical performance characteristics, including a first power supply and a second power supply, and a data transfer connection operably coupling the two power supplies for data communication between the two power supplies. The first power supply is configured to: receive, in a standby mode, data via the data transfer connection from the second power supply supplying power to a plasma process in a normal operating mode, and supply, in an active backup mode, power to the plasma process in place of the second power supply, as a function of the received data. The first power supply can supply in the active backup mode to the plasma process the power having one or more characteristics that are substantially the same as those of the power provided by the second power supply in the normal operating mode.
1. A power supply system for a plasma process, comprising:
two separate power supplies of essentially identical performance characteristics, including a first power supply and a second power supply; and
a data transfer connection operably coupling the two power supplies for data communication between the two power supplies;
wherein the first power supply is configured to:
receive, in a standby mode, data via the data transfer connection from the second power supply supplying power to a plasma process in a normal operating mode, and
supply, in an active backup mode, power to the plasma process in place of the second power supply, as a function of the received data.
2. The power supply system of claim 1 , wherein the first power supply is configured to supply in the active backup mode to the plasma process the power having one or more characteristics that are the same as those of the power provided by the second power supply in the normal operating mode.
3. The power supply system of claim 1 , wherein the first power supply is configured to:
generate, in the standby mode, a lower power than in the active backup mode, and
generate, in the active backup mode, an adjustable power for supplying the plasma process.
4. The power supply system of claim 1 , wherein a frequency of an output signal from one of the first power supply and the second power supply is adjustable, and
wherein the first power supply is configured to provide, after switching over from the standby mode into the active backup mode, an output signal having the same frequency as an output signal from the second power supply.
5. The power supply system of claim 1 , wherein the first power supply and the second power supply are configured to work in a pulsed operating mode having a pulse frequency and a pulse length and pulse between power levels in the pulsed operating mode, and
wherein the first power supply is configured to provide, after switching over from the standby mode into the active backup mode, the same pulse frequency, pulse length and power levels as the second power supply.
6. The power supply system of claim 1 , wherein the first power supply is configured to be switched over from the standby mode into the active backup mode within an interruption period less than 10 μs.
7. The power supply system of claim 1 , wherein at least one of the two power supplies comprises a plurality of amplifiers and a combiner, and
wherein the combiner is configured to be connected to the plurality of amplifiers and combine powers from the plurality of amplifiers.
8. The power supply system of claim 1 , wherein each of the two power supplies comprises a power output connected to a connector that is further coupled to a plasma chamber where the plasma process occurs.
9. The power supply system of claim 1 , wherein each of the two power supplies comprises an arc management system.
10. A method of operating a plasma process in a plasma chamber, comprising:
operating a first power supply in a standby mode;
operating a second power supply in a normal operating mode to supply power to the plasma process in the plasma chamber;
monitoring at least one parameter of the second power supply; and
if the monitoring of the parameter of the second power supply detects a predetermined event, changing the first power supply over from the standby mode into an active backup mode to supply the plasma process in the plasma chamber with power having one or more characteristics that are the same as those of the power provided by the second power supply to the plasma process in the normal operating mode.
11. The method of claim 10 , further comprising:
continuously exchanging data between the first power supply and the second power supply.
12. The method of claim 11 , further comprising:
providing, by the second power supply, as the data to the first power supply, at least one of settings, arc detection thresholds, a frequency of an output signal, a pulse frequency of the output signal, a pulse rate of the output signal, a setpoint power, a setpoint current, and a setpoint voltage; and
updating, by the first power supply, its corresponding values based on the data provided by the second power supply.
13. The method of claim 12 , wherein monitoring at least one parameter of the second power supply comprises:
monitoring one or more values of the data at one or more components or locations of the second power supply.
14. The method of claim 10 , wherein the predetermined event indicates one of an expected failure, an imminent failure, and a failure of the second power supply.
15. The method of claim 10 , further comprising:
matching and calibrating the first power supply and the second power supply to each other.
16. The method of claim 10 , wherein changing the first power supply over from the standby mode into the active backup mode comprises:
updating DC link voltages of the first power supply operated in the standby mode to match DC link voltages of the second power supply operated in the normal operating mode.
17. The method of claim 10 , wherein operating the first power supply in the standby mode comprises:
supplying one or more chokes of the first power supply in advance with a current.
18. The method of claim 10 , further comprising:
precharging an energy storage device of the first power supply, the energy storage device configured for arc processing in the plasma chamber.
19. The method of claim 10 , further comprising:
synchronizing respective AC current sources of the first and second power supplies.
20. A power supply for supplying plasma processes with power, comprising:
an interface connectable to an additional power supply for data communication via a data transfer connection;
a power output for outputting a power signal; and
a power generator configured to:
generate, in a standby mode, a lower power at the power output than in an active backup mode, and
generate, in the active backup mode, an adjustable power at the power output for supplying the plasma processes,
wherein the power supply is configured to:
receive, in the standby mode, data at the interface via the data transfer connection from the additional power supply working in a normal operating mode to supply power to a plasma process,
generate by the power generator in the active backup mode, power to the plasma process as a function of the received data, and
supply, at the power output, the generated power to the plasma process in place of the additional power supply.