IP Library › Granted Patent US 10,177,732
Granted Patent B2
US 10,177,732 · App. 15/214,786 · Granted Jan 8, 2019

Piezoelectric thin film resonator, filter, and duplexer

Inventor: Tsuyoshi Yokoyama (Tokyo, JP)
Assignee: TAIYO YUDEN CO., LTD.
H03H9/02015H03H9/13H03H9/173H03H9/174H03H9/175H03H9/02118
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Quick Facts
Patent No.
US 10,177,732
App. No.
15/214,786
Filed
Jul 20, 2016
Granted
Jan 8, 2019
Kind
B2
Art Unit
2842
USPC
333/187
Abstract

A piezoelectric thin film resonator includes: a substrate; a piezoelectric film located on the substrate and having a Poisson's ratio of 0.33 or less; a lower electrode and an upper electrode facing each other across the piezoelectric film; and an insertion film that is located in the piezoelectric film or on a lower surface or an upper surface of the piezoelectric film in an outer peripheral region within a resonance region, in which the lower electrode and the upper electrode face each other across the piezoelectric film, and is not located in a center region of the resonance region, wherein at least one of the lower electrode, the piezoelectric film, and the upper electrode in the outer peripheral region within the resonance region is thinner than the at least one of the lower electrode, the piezoelectric film, and the upper electrode in the center region of the resonance region.

Claims (56)

1. A piezoelectric thin film resonator comprising:

a substrate;

a piezoelectric film that is located on the substrate and has a Poisson's ratio of 0.33 or less;

a lower electrode and an upper electrode that face each other across the piezoelectric film; and

an insertion film that is located in the piezoelectric film or on a lower surface or an upper surface of the piezoelectric film in an outer peripheral region within a resonance region, in which the lower electrode and the upper electrode face each other across the piezoelectric film, and is not located in a center region of the resonance region,

wherein at least one of the lower electrode, the piezoelectric film, and the upper electrode in the outer peripheral region within the resonance region is thinner than the at least one of the lower electrode, the piezoelectric film, and the upper electrode in the center region of the resonance region, and

wherein a cutoff frequency in the outer peripheral region within the resonance region is approximately equal to a cutoff frequency in the center region of the resonance region.

2. The piezoelectric thin film resonator according to claim 1 , wherein

an air gap is formed between the substrate and the lower electrode in the resonance region.

3. The piezoelectric thin film resonator according to claim 1 , wherein

a difference between a cutoff frequency and a minimum frequency of a dispersion curve of a thickness extension mode in the outer peripheral region within the resonance region is less than a difference between a cutoff frequency and a minimum frequency of a dispersion curve of a thickness extension mode in the center region of the resonance region.

4. The piezoelectric thin film resonator according to claim 1 , wherein

a multilayered film including the lower electrode, the piezoelectric film, and the upper electrode in the outer peripheral region within the resonance region is thinner than a multilayered film including the lower electrode, the piezoelectric film, and the upper electrode in the center region of the resonance region.

5. The piezoelectric thin film resonator according to claim 1 , wherein

the insertion film has an acoustic impedance less than an acoustic impedance of the piezoelectric film.

6. The piezoelectric thin film resonator according to claim 1 , wherein

the insertion film has a Poisson's ratio less than a Poisson's ratio of the piezoelectric film.

7. The piezoelectric thin film resonator according to claim 1 , wherein

the insertion film is a silicon oxide film or a silicon oxide film containing another element.

8. The piezoelectric thin film resonator according to claim 1 , wherein

the piezoelectric film is an aluminum nitride film or an aluminum nitride film containing another element.

9. A filter comprising the piezoelectric thin film resonator according to claim 1 .

10. A piezoelectric thin film resonator comprising:

a substrate;

a piezoelectric film that is located on the substrate and has a Poisson's ratio of 0.33 or less;

a lower electrode and an upper electrode that face each other across the piezoelectric film; and

an insertion film that is located in the piezoelectric film or on a lower surface or an upper surface of the piezoelectric film in an outer peripheral region within a resonance region, in which the lower electrode and the upper electrode face each other across the piezoelectric film, and is not located in a center region of the resonance region,

wherein a cutoff frequency in the outer peripheral region within the resonance region is approximately equal to a cutoff frequency in the center region of the resonance region, and

a difference between the cutoff frequency and a minimum frequency of a dispersion curve of a thickness extension mode in the outer peripheral region within the resonance region is less than a difference between the cutoff frequency and a minimum frequency of a dispersion curve of a thickness extension mode in the center region of the resonance region.

11. The piezoelectric thin film resonator according to claim 10 , wherein

the insertion film has an acoustic impedance less than an acoustic impedance of the piezoelectric film.

12. The piezoelectric thin film resonator according to claim 10 , wherein

the insertion film is a silicon oxide film or a silicon oxide film containing another element.

13. The piezoelectric thin film resonator according to claim 10 , wherein

the insertion film has a Poisson's ratio less than a Poisson's ratio of the piezoelectric film.

14. The piezoelectric thin film resonator according to claim 10 , wherein

the piezoelectric film is an aluminum nitride film or an aluminum nitride film containing another element.

15. A filter comprising the piezoelectric thin film resonator according to claim 10 .

16. The piezoelectric thin film resonator according to claim 10 , wherein

an air gap is formed between the substrate and the lower electrode in the resonance region.

17. A piezoelectric thin film resonator comprising:

a substrate;

a piezoelectric film that is located on the substrate and has a Poisson's ratio of 0.33 or less;

a lower electrode and an upper electrode that face each other across the piezoelectric film; and

an insertion film that is located in the piezoelectric film or on a lower surface or an upper surface of the piezoelectric film in an outer peripheral region within a resonance region, in which the lower electrode and the upper electrode face each other across the piezoelectric film, and is not located in a center region of the resonance region,

wherein at least one of the lower electrode, the piezoelectric film, and the upper electrode in the outer peripheral region within the resonance region is thinner than the at least one of the lower electrode, the piezoelectric film, and the upper electrode in the center region of the resonance region, and

wherein at least one of the lower electrode and the upper electrode in the outer peripheral region within the resonance region has a smaller number of metal layers than the at least one of the lower electrode and the upper electrode in the center region of the resonance region.

18. A piezoelectric thin film resonator comprising:

a substrate;

a piezoelectric film that is located on the substrate and is an aluminum nitride film or an aluminum nitride film containing another element;

a lower electrode and an upper electrode that face each other across the piezoelectric film; and

an insertion film that is located in the piezoelectric film or on a lower surface or an upper surface of the piezoelectric film in an outer peripheral region within a resonance region, in which the lower electrode and the upper electrode face each other across the piezoelectric film, and is not located in a center region of the resonance region,

wherein at least one of the lower electrode, the piezoelectric film, and the upper electrode in the outer peripheral region within the resonance region is thinner than the at least one of the lower electrode, the piezoelectric film, and the upper electrode in the center region of the resonance region, and

wherein a laminated film included the lower electrode, the piezoelectric film, the upper electrode, and the insertion film in the outer peripheral region within the resonance region is thinner than a laminated film included the lower electrode, the piezoelectric film, and the upper electrode in the center region of the resonance region.

19. The piezoelectric thin film resonator according to claim 18 , wherein,

at least one of the lower electrode, the piezoelectric film, and the upper electrode in a region where the insertion film is provided in the outer peripheral region within the resonance region is thinner than the at least one of the lower electrode, the piezoelectric film, and the upper electrode in the center region of the resonance region.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 20, 2016
From: YOKOYAMA, TSUYOSHI
To: TAIYO YUDEN CO., LTD.
Reel/Frame 039413/0540 →
Priority Claims (1)
JP 2015-150045 · Jul 29, 2015 · national
Continuity (1)
Related Publication 20170033769A1 · Feb 2, 2017