Monitoring a discharge in a plasma process
Devices and methods for monitoring a discharge in a plasma process are provided. An example method includes detecting at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, detecting at least a second signal path of the at least one plasma supply signal within at least a second time range which is at the point corresponding to the first time range in at least one other period of the plasma supply signal, and generating an identification signal if the second signal path deviates by at least a distance from the first signal path. The distance has a minimum time difference and a minimum signal amplitude difference. The method enables to identify arcs in a very reliable and very rapid manner.
1. A method of monitoring a discharge in a plasma process, the method comprising:
detecting a first signal profile of a plasma supply signal in a first time range of a first time period of the plasma supply signal, the plasma supply signal being a periodically changing signal supplied to the plasma process;
detecting a second signal profile of the plasma supply signal in a second time range of a second time period of the plasma supply signal, points that the second time range is located in the second time period corresponding to points that the first time range is located in the first time period;
determining a threshold by carrying out a calculation from the first signal profile, a minimum time difference, and a minimum signal amplitude difference, such that the threshold has the minimum time difference in a time direction and the minimum signal amplitude difference in a signal amplitude direction; and
in response to determining that a difference between the first signal profile and the second signal profile is beyond the threshold, generating an identification signal that indicates a state or error in the plasma process.
2. The method of claim 1 , wherein at least one of the minimum time difference or the minimum signal amplitude difference is predetermined by a user.
3. The method of claim 1 , further comprising:
establishing a reference profile from the first signal profile based on the threshold; and
in response to determining that the second signal profile reaches the reference profile, determining that the difference is beyond the threshold.
4. The method of claim 3 , wherein establishing the reference profile comprises one of:
adding the minimum time difference and the minimum signal amplitude difference to the first signal profile, and
subtracting the minimum time difference and the minimum signal amplitude difference from the first signal profile.
5. The method of claim 3 , wherein establishing the reference profile comprises:
carrying out a calculation from the first signal profile, the minimum time difference, and the minimum signal amplitude difference, such that the reference profile has the minimum time difference as a first minimum difference from the first signal profile in a time direction and the minimum signal amplitude difference as a second minimum difference from the first signal profile in a signal amplitude direction.
6. The method of claim 3 , wherein establishing the reference profile comprises:
selecting a plurality of selection points from the first signal profile;
for each of the selection points, determining a respective reference point of the reference profile by
placing a geometric shape around the selection point, the geometric shape having a center at the selection point and a predetermined value associated with at least one of the minimum time difference or the minimum signal amplitude difference,
inserting a vector having a length of the predetermined value from the selection point to an edge of the geometric shape, the vector being perpendicular to a gradient of the first signal profile, and
determining an intersection point between the geometric shape and a vector as the respective reference point; and
obtaining the reference profile based on the determined respective reference points.
7. The method of claim 1 , further comprising:
selecting a plurality of selection points of the second signal profile;
for each of the selection points, placing a respective geometric shape around the selection point, the respective geometric shape having a first dimension representing the minimum time difference in a time direction and a second dimension representing the minimum signal amplitude difference in a signal amplitude direction;
comparing the second signal profile with the respective geometric shapes with the first signal profile; and
in response to determining that a portion of the first signal profile is outside of one of the respective geometric shapes, determining that the difference between the first signal profile and the second signal profile is beyond the threshold.
8. The method of claim 7 , wherein the first dimension is identical to twice of the minimum time difference, and the second dimension is identical to twice of the minimum signal amplitude difference.
9. The method of claim 1 , further comprising at least one of:
determining the minimum time difference based on a proportion of a duration of a period of the plasma supply signal, or
determining the minimum signal amplitude difference based on a proportion of an effective value or a peak value of the plasma supply signal in the period.
10. A plasma discharge monitor for monitoring a discharge in a plasma process, the monitor comprising:
a signal detector configured to receive a plasma supply signal that is a periodically changing signal supplied to the plasma process, the signal detector being operable to:
detect a first signal profile of the plasma supply signal in a first time range of a first time period of the plasma supply signal, and
detect a second signal profile of the plasma supply signal in a second time range of a second time period of the plasma supply signal, points that the second time range is located in the second time period corresponding to points that the first time range is located in the first time period; and
an identification signal generator configured to:
determine a threshold by carrying out a calculation from the first signal profile, a minimum time difference, and a minimum signal amplitude difference, such that the threshold has the minimum time difference in a time direction and the minimum signal amplitude difference in a signal amplitude direction, and
generate an identification signal in response to determining that a difference between the first signal profile and the second signal profile is beyond the threshold, the identification signal indicating a state or error in the plasma process.
11. The monitor of claim 10 , wherein the identification signal generator is configured such that the threshold includes
the minimum time difference as a first minimum difference from the first signal profile in the time direction, and
the minimum signal amplitude difference as a second minimum difference from the first signal profile in the signal amplitude direction.
12. The monitor of claim 10 , further comprising at least one of:
an input interface for specifying the minimum time difference and the minimum signal amplitude difference, or
an input interface for specifying a value for establishing a flowing interval associated with the threshold.
13. The monitor of claim 12 , wherein the value comprises a sum including a square of the minimum time difference and a square of the minimum signal amplitude difference, and
wherein the identification signal generator is configured to establish the flow interval by the value and a calculation rule.
14. The monitor of claim 10 , wherein the signal detector comprises an analog-digital converter (ADC) that has a temporal resolution no less than 10 megasamples per second and an amplitude resolution no less than 8 bit.
15. The monitor of claim 10 , wherein the identification signal generator is accommodated in a programmable logic device (PLD).
16. The monitor of claim 10 , wherein the identification signal generator is configured to:
establish a reference profile from the first signal profile based on the threshold, and
in response to determining that the second signal profile reaches the reference profile, determining that the difference between the first signal profile and the second signal profile is beyond the threshold.
17. The monitor of claim 16 , wherein the identification signal generator is configured to establish the reference profile such that the reference profile has
the minimum time difference as a first minimum difference from the first signal profile in the time direction, and
the minimum signal amplitude difference as a second minimum difference from the first signal profile in the signal amplitude direction.
18. The monitor of claim 16 , wherein the identification signal generator is configured to establish the reference profile by one of:
adding the minimum time difference and the minimum signal amplitude difference to the first signal profile, and
subtracting the minimum time difference and the minimum signal amplitude difference from the first signal profile.
19. A plasma process system comprising:
a power generator configured to supply power to a plasma process with a periodically changing output signal of the power generator as a plasma supply signal; and
a plasma discharge monitor for monitoring a discharge in the plasma process, comprising:
a signal detector operable to:
detect a first signal profile of the plasma supply signal in a first time range of a first time period of the plasma supply signal, and
detect a second signal profile of the plasma supply signal in a second time range of a second time period of the plasma supply signal, points that the second time range is located in the second time period corresponding to points that the first time range is located in the first time period; and
an identification signal generator operable to:
determine a threshold by carrying out a calculation from the first signal profile, a minimum time difference, and a minimum signal amplitude difference, such that the threshold has the minimum time difference in a time direction and the minimum signal amplitude difference in a signal amplitude direction, and
generate an identification signal in response to determining that a difference between the first signal profile and the second signal profile is beyond the threshold, wherein the identification signal indicates a state or error in the plasma process.
20. The plasma process system of claim 19 , wherein the power generator comprises one of
a free-running mid-frequency generator and
a bridge circuit for producing an alternating voltage.
21. The plasma process system of claim 19 , wherein the signal detector is configured to measure a voltage at each of electrodes of the plasma process with a respective measurement data detector with respect to a reference earth.
22. A method of monitoring a discharge in a plasma process, the method comprising:
detecting a first signal profile of a plasma supply signal in a first time range of a first time period of the plasma supply signal, the plasma supply signal being a periodically changing signal supplied to the plasma process;
detecting a second signal profile of the plasma supply signal in a second time range of a second time period of the plasma supply signal, points that the second time range is located in the second time period corresponding to points that the first time range is located in the first time period;
establishing a reference profile from the first signal profile based on a threshold by carrying out a calculation from the first signal profile, a minimum time difference, and a minimum signal amplitude difference, such that the reference profile has the minimum time difference as a first minimum difference from the first signal profile in a time direction and the minimum signal amplitude difference as a second minimum difference from the first signal profile in a signal amplitude direction;
in response to determining that the second signal profile reaches the reference profile, determining that a difference between the first signal profile and the second signal profile is beyond the threshold; and
in response to determining that the difference between the first signal profile and the second signal profile is beyond the threshold, generating an identification signal that indicates a state or error in the plasma process.
23. A method of monitoring a discharge in a plasma process, the method comprising:
detecting a first signal profile of a plasma supply signal in a first time range of a first time period of the plasma supply signal, the plasma supply signal being a periodically changing signal supplied to the plasma process;
detecting a second signal profile of the plasma supply signal in a second time range of a second time period of the plasma supply signal, points that the second time range is located in the second time period corresponding to points that the first time range is located in the first time period;
selecting a plurality of selection points of the second signal profile;
for each of the selection points, placing a respective geometric shape around the selection point, the respective geometric shape having a first dimension representing a minimum time difference in a time direction and a second dimension representing a minimum signal amplitude difference in a signal amplitude direction;
comparing the second signal profile with the respective geometric shapes with the first signal profile;
in response to determining that a portion of the first signal profile is outside of one of the respective geometric shapes, determining that a difference between the first signal profile and the second signal profile is beyond a threshold; and
in response to determining that the difference between the first signal profile and the second signal profile is beyond the threshold, generating an identification signal that indicates a state or error in the plasma process.
24. A plasma discharge monitor for monitoring a discharge in a plasma process, the monitor comprising:
a signal detector configured to receive a plasma supply signal that is a periodically changing signal supplied to the plasma process, the signal detector being operable to:
detect a first signal profile of the plasma supply signal in a first time range of a first time period of the plasma supply signal, and
detect a second signal profile of the plasma supply signal in a second time range of a second time period of the plasma supply signal, points that the second time range is located in the second time period corresponding to points that the first time range is located in the first time period; and
an identification signal generator configured to:
establish a reference profile from the first signal profile based on a threshold by carrying out a calculation from the first signal profile, a minimum time difference, and a minimum signal amplitude difference, such that the reference profile has the minimum time difference as a first minimum difference from the first signal profile in a time direction and the minimum signal amplitude difference as a second minimum difference from the first signal profile in a signal amplitude direction;
determine that a difference between the first signal profile and the second signal profile is beyond the threshold in response to determining that the second signal profile reaches the reference profile; and
generate an identification signal in response to determining that the difference between the first signal profile and the second signal profile is beyond the threshold, the identification signal indicating a state or error in the plasma process.