Substrate equipped with a multilayer comprising a partial metal film, glazing unit, use and process
A substrate is coated on one face with a thin-film multilayer including at least one functional metal film based on silver or made of silver having a thickness e of between 7 nm and 20 nm inclusive of these values, and two antireflection coatings each including at least one antireflection film. The functional film is placed between the two antireflection coatings. The multilayer includes a lower discontinuous metal film having a thickness e′ of between 0.5 nm and 5 nm inclusive of these values. The lower discontinuous metal film is located between the face and the only or first functional metal film as counted starting from the face.
1. A substrate, comprising:
a thin-film multilayer coated on one face of the substrate, the thin-film multilayer comprising at least one functional metal film based on silver or male of silver having a thickness e of between 7 nm and 20 nm inclusive of these values, and two antireflection coatings, said antireflection coatings each comprising at least one antireflection film, said functional film being placed between the two antireflection coatings,
wherein said multilayer comprises a lower discontinuous metal film having a thickness e′ of between 0.5 nm and 5 nm inclusive of these values, said lower discontinuous metal film being located between said face and the only or first functional metal film as counted starting from said face,
wherein the lower discontinuous metal film is based on silver or made of silver, and
wherein the lower discontinuous metal film is a discontinuous layer having a surface area occupation factor in the range of 50% to 98% and in the form of interconnected islands with uncovered regions between the islands.
2. The substrate as claimed in claim 1 , wherein said multilayer comprises only one lower discontinuous metal film.
3. The substrate as claimed in claim 1 , wherein said multilayer further comprises an upper discontinuous metal film having a thickness e′ of between 0.5 nm and 5 nm inclusive of these values, said upper discontinuous metal film being located above the only or last functional metal film as counted starting from said face.
4. The substrate as claimed in claim 1 , wherein said discontinuous metal film is located directly on an antireflection film having a refractive index at 550 nm of at least 1.9, and directly under an antireflection film having a refractive index at 550 nm of at least 1.9, the refractive index of said antireflection film directly below being identical to the refractive index of said antireflection film directly above.
5. The substrate as claimed in claim 1 , wherein said discontinuous metal film is located directly on an antireflection film having an optical thickness at 550 nm of between 1 nm and 8 nm inclusive of these values and directly under an antireflection film having an optical thickness at 550 nm of between 1 nm and 8 nm inclusive of these values.
6. The substrate as claimed in claim 1 , wherein said discontinuous metal film is located directly on an antireflection film having an optical thickness at 550 nm of between 2 nm and 6 nm inclusive of these values and directly under an antireflection film having an optical thickness at 550 nm of between 2 nm and 6 nm inclusive of these values.
7. The substrate as claimed in claim 1 , wherein said antireflection coating placed under each metal functional film comprises an antireflection film of middling index made of a material having a refractive index of between 1.8 and 2.2 at 550 nm.
8. The substrate as claimed in claim 7 , wherein the antireflection film of middling index is oxide-based or the antireflection film of middling index has a physical thickness of between 5 and 35 nm.
9. The substrate as claimed in claim 1 , wherein said antireflection coating placed between the face and a first or the only metal functional film comprises an antireflection film of high index made of a material having a refractive index of between 2.3 and 2.7 at 550 nm.
10. The substrate as claimed in claim 9 , wherein the antireflection film of high index is oxide-based or the antireflection film of high index has a physical thickness of between 5 and 25 nm.
11. The substrate as claimed in claim 1 , wherein the antireflection coating placed above a first or the only metal functional film, on the side opposite the face, comprises an antireflection film of middling index made of a material having a refractive index of between 1.8 and 2.2 at 550 nm.
12. The substrate as claimed in claim 11 , wherein the antireflection film of middling index is oxide-based or the antireflection film of middling index has a physical thickness of between 5 and 35 nm.
13. A multiple glazing unit, comprising:
at least two substrates that are held together by a frame structure, said glazing unit separating an exterior space from an interior space, in which at least one intermediate gas-filled cavity is placed between the two substrates, at least one of the two substrates being the substrate as claimed in claim 1 .
14. A process, comprising:
depositing at least one discontinuous metal film in a thin-film multilayer that is deposited on the substrate as claimed in claim 1 .
15. The process as claimed in claim 14 , wherein two of the discontinuous metal films are deposited in the thin-film multilayer.
16. The substrate as claimed in claim 1 , wherein the surface area occupation factor of the lower discontinuous metal film is in the range of 53% to 83%.