IP Library › Granted Patent US 10,207,094
Granted Patent B2
US 10,207,094 · App. 15/595,891 · Granted Feb 19, 2019

Metallic microneedles

Inventors: Boris Stoeber (Vancouver, CA); Iman Mansoor (West Vancouver, CA); Urs Otto Häfeli (Vancouver, CA)
Assignee: Microdermics Inc.
A61M37/0015B05D1/36B21G1/00B81C1/00111A61M2037/003A61M2037/0023A61M2037/0053B05D2201/06
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Quick Facts
Patent No.
US 10,207,094
App. No.
15/595,891
Granted
Feb 19, 2019
Kind
B2
Abstract

Methods for fabricating metallic microneedles are disclosed. One method comprises providing a mold pillar; forming an apertured electrically-conductive layer over the mold pillar; and depositing a metal layer over the electrically-conductive layer to provide an apertured microneedle. Another method comprises providing a mold pillar; depositing a first metal layer over the mold pillar to provide a first microneedle; removing the first microneedle from the mold pillar; and depositing a second metal layer over the mold pillar to provide a second microneedle.

Claims (47)

1. A method for fabricating a first microneedle and a second microneedle, the method comprising:

providing a mold pillar;

forming an electrically-conductive layer over the mold pillar by:

applying a solution onto the mold pillar, the solution comprising a polymer and conductive particles dissolved in a solvent; and

evaporating the solvent from the mold pillar to leave behind the electrically-conductive layer on the mold pillar;

depositing a first metal layer over the electrically-conductive layer to provide a first microneedle;

removing the first microneedle from the mold pillar; and

depositing a second metal layer over the mold pillar to provide a second microneedle;

wherein depositing the first metal layer over the electrically-conductive layer comprises using the electrically-conductive layer as an electrode and electroplating the first metal layer onto the electrically-conductive layer.

2. The method of claim 1 wherein the mold pillar comprises a protective layer for protecting the mold pillar from subsequent processes and enabling use of the mold pillar for fabricating a plurality of microneedles.

3. The method of claim 1 wherein forming the electrically-conductive layer over the mold pillar comprises using a spray deposition process.

4. The method of claim 1 wherein the electrically-conductive layer comprises an apertured electrically-conductive layer.

5. The method of claim 4 comprising forming the apertured electrically-conductive layer by removing a portion of the electrically-conductive layer to form an aperture.

6. The method of claim 5 comprising removing the portion of the electrically-conductive layer by one or more of: dry etching, photolithography, mechanical grinding, and localized heating.

7. The method of claim 1 wherein removing the first microneedle from the mold pillar comprises at least partially dissolving the electrically-conductive layer.

8. The method of claim 1 comprising forming a sacrificial layer between the mold pillar and the electrically-conductive layer and wherein removing the first microneedle from the mold pillar comprises at least partially dissolving the sacrificial layer.

9. The method of claim 1 wherein depositing the second metal layer over the mold pillar to provide the second microneedle comprises depositing the second metal layer over the electrically-conductive layer to provide the second microneedle.

10. The method of claim 1 wherein depositing the second metal layer over the mold pillar to provide the second microneedle comprises:

forming a second electrically-conductive layer over the mold pillar; and

depositing the second metal layer over the second electrically-conductive layer to provide the second microneedle.

11. The method of claim 1 wherein removing the first microneedle from the mold pillar leaves the mold pillar substantially intact.

12. A method for fabricating a first microneedle and a second microneedle, the method comprising:

providing a mold pillar;

forming an electrically-conductive layer over the mold pillar by:

applying a solution onto the mold pillar, the solution comprising a polymer and conductive particles dissolved in a solvent; and

evaporating the solvent from the mold pillar to leave behind the electrically-conductive layer on the mold pillar;

depositing a first metal layer over the electrically-conductive layer to provide a first microneedle;

removing the first microneedle from the mold pillar; and

depositing a second metal layer over the mold pillar to provide a second microneedle;

wherein the electrically-conductive layer comprises an apertured electrically-conductive layer; and

forming the apertured electrically-conductive layer by:

applying a coating to a region of the mold pillar before forming the electrically-conductive layer over the mold pillar; and

choosing the solvent such that the solvent is repelled by the coating so that the electrically-conductive layer is created with an aperture located at the coated region.

13. The method of claim 12 wherein:

depositing the first metal layer over the electrically-conductive layer comprises sputtering the first metal layer over the electrically-conductive layer; and

removing the first microneedle from the mold pillar comprises at least partially dissolving the electrically-conductive layer.

14. A method for fabricating a first microneedle and a second microneedle, the method comprising:

providing a mold pillar;

forming an electrically-conductive layer over the mold pillar by:

applying a solution onto the mold pillar, the solution comprising a polymer and conductive particles dissolved in a solvent; and

evaporating the solvent from the mold pillar to leave behind the electrically-conductive layer on the mold pillar;

depositing a first metal layer over the electrically-conductive layer to provide a first microneedle;

removing the first microneedle from the mold pillar; and

depositing a second metal layer over the mold pillar to provide a second microneedle;

wherein the electrically-conductive layer comprises an apertured electrically-conductive layer; and

forming the apertured electrically-conductive layer by:

orienting the mold pillar so that a first region of the mold pillar is vertically higher than a second region of the mold pillar such that the force of gravity causes the electrically-conductive layer to form with an aperture at the first region.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 17, 2017
From: MANSOOR, IMAN; STOEBER, BORIS; HAFELI, URS OTTO
To: MICRODERMICS INC.
Reel/Frame 042417/0717 →
Continuity (4)
Continuation 14965536 · Dec 10, 2015
Continuation PCTCA2014050552 · Jun 12, 2014
Provisional Application 61834482 · Jun 13, 2013
Related Publication 20170312489A1 · Nov 2, 2017
Cited By (2)
US 12,186,515 US 12,714,838